Yasuhiro Koizumi

Person

Tokyo-to, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Fabrication method of semiconductor integrated circuit device and m...
- Patent number 7,252,910
- Issue date Aug 7, 2007
- Renesas Technology Corp.
- Norio Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Defect inspection apparatus for phase shift mask
- Patent number 6,879,393
- Issue date Apr 12, 2005
- Dai Nippon Printing Co., Ltd.
- Yasuhiro Koizumi
- G01 - MEASURING TESTING
Information Patent Grant
Method of manufacturing mask and method of manufacturing semiconduc...
- Patent number 6,841,399
- Issue date Jan 11, 2005
- Renesas Technology Corp.
- Norio Hasegawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method and apparatus for observing or processing and analyzing usin...
- Patent number 6,476,387
- Issue date Nov 5, 2002
- Hitachi, Ltd.
- Norimasa Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and its apparatus for detecting a secondary electron beam im...
- Patent number 6,303,932
- Issue date Oct 16, 2001
- Hitachi, Ltd.
- Yuichi Hamamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photomask manufacturing process and semiconductor integrated circui...
- Patent number 5,786,112
- Issue date Jul 28, 1998
- Hitachi, Ltd.
- Yoshihiko Okamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of processing a sample using a charged beam and reactive gas...
- Patent number 5,447,614
- Issue date Sep 5, 1995
- Hitachi, Ltd.
- Yuuichi Hamamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical mask and method of correcting the same
- Patent number 5,439,763
- Issue date Aug 8, 1995
- Hitachi, Ltd.
- Akira Shimase
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask, method of correcting the same and apparatus for c...
- Patent number 5,358,806
- Issue date Oct 25, 1994
- Hitachi, Ltd.
- Satoshi Haraichi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus for processing a sample using a charged beam and reactive...
- Patent number 5,342,448
- Issue date Aug 30, 1994
- Hitachi, Ltd.
- Yuuichi Hamamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exposure of uniform fine pattern on photoresist
- Patent number 4,704,348
- Issue date Nov 3, 1987
- Hitachi, Ltd.
- Yasuhiro Koizumi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for repairing defects on a photo-mask pattern
- Patent number 4,609,566
- Issue date Sep 2, 1986
- Hitachi, Ltd.
- Mikio Hongo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Fabrication method of semiconductor integrated circuit device and m...
- Publication number 20040151993
- Publication date Aug 5, 2004
- Norio Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Manufacturing method of photomask
- Publication number 20030143472
- Publication date Jul 31, 2003
- Yasuhiro Koizumi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of manufacturing mask and method of manufacturing semiconduc...
- Publication number 20030139055
- Publication date Jul 24, 2003
- Norio Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Defect inspection apparatus for phase shift mask
- Publication number 20020036772
- Publication date Mar 28, 2002
- Yasuhiro Koizumi
- G01 - MEASURING TESTING

Yasuhiro Koizumi

Person

Patents Grantslast 30 patents

Fabrication method of semiconductor integrated circuit device and m...

Defect inspection apparatus for phase shift mask

Method of manufacturing mask and method of manufacturing semiconduc...

Method and apparatus for observing or processing and analyzing usin...

Method and its apparatus for detecting a secondary electron beam im...

Photomask manufacturing process and semiconductor integrated circui...

Method of processing a sample using a charged beam and reactive gas...

Optical mask and method of correcting the same

Phase shift mask, method of correcting the same and apparatus for c...

Apparatus for processing a sample using a charged beam and reactive...

Exposure of uniform fine pattern on photoresist

Method and apparatus for repairing defects on a photo-mask pattern

Patents Applicationslast 30 patents

Fabrication method of semiconductor integrated circuit device and m...

Manufacturing method of photomask

Method of manufacturing mask and method of manufacturing semiconduc...

Defect inspection apparatus for phase shift mask