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Plasma processing method
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Patent number 8,486,291
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Issue date Jul 16, 2013
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Hitachi High-Technologies Corporation
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Takeshi Ohmori
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B08 - CLEANING
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Plasma processing method
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Patent number 8,277,563
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Issue date Oct 2, 2012
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Hitachi High-Technologies Corporation
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Masunori Ishihara
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H01 - BASIC ELECTRIC ELEMENTS
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Method for etching a sample
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Patent number 8,114,244
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Issue date Feb 14, 2012
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Hitachi High-Technologies Corporation
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Kousa Hirota
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H01 - BASIC ELECTRIC ELEMENTS
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Plasma processing apparatus
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Patent number 8,075,733
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Issue date Dec 13, 2011
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Hitachi High-Technologies Corporation
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Seiichi Watanabe
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H01 - BASIC ELECTRIC ELEMENTS
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Plasma processing method
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Patent number 7,909,933
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Issue date Mar 22, 2011
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Hitachi High-Technologies Corporation
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Masunori Ishihara
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H01 - BASIC ELECTRIC ELEMENTS
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