Yasuhiro Omura

Person

Kumagaya-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Projection optical system, exposure apparatus, and exposure method
- Patent number 10,156,792
- Issue date Dec 18, 2018
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Grant
Exposure apparatus, exposure method, and method for producing device
- Patent number 10,048,602
- Issue date Aug 14, 2018
- Nikon Corporation
- Naoyuki Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reduction projection optical system, exposure apparatus, and exposu...
- Patent number 9,933,705
- Issue date Apr 3, 2018
- Nikon Corporation
- Yasuhiro Omura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reduction projection optical system, exposure apparatus, and exposu...
- Patent number 9,904,174
- Issue date Feb 27, 2018
- Nikon Corporation
- Yasuhiro Omura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection optical system, exposure apparatus, and exposure method
- Patent number 9,891,539
- Issue date Feb 13, 2018
- Nikon Corporation
- Yasuhiro Omura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection optical system, exposure apparatus, and exposure method
- Patent number 9,846,366
- Issue date Dec 19, 2017
- Nikon Corporation
- Yasuhiro Omura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection optical system, exposure apparatus, and exposure method
- Patent number 9,823,588
- Issue date Nov 21, 2017
- Nikon Corporation
- Yasuhiro Omura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reduction projection optical system, exposure apparatus, and exposu...
- Patent number 9,791,781
- Issue date Oct 17, 2017
- Nikon Corporation
- Yasuhiro Omura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reducing immersion projection optical system
- Patent number 9,606,443
- Issue date Mar 28, 2017
- Nikon Corporation
- Yasuhiro Omura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reducing immersion projection optical system
- Patent number 9,568,834
- Issue date Feb 14, 2017
- Nikon Corporation
- Yasuhiro Omura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection optical system, exposure apparatus, and exposure method
- Patent number 9,500,943
- Issue date Nov 22, 2016
- Nikon Corporation
- Yasuhiro Omura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection optical system, exposure apparatus, and exposure method
- Patent number 9,470,968
- Issue date Oct 18, 2016
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Grant
Projection optical system, exposure apparatus, and exposure method
- Patent number 9,442,360
- Issue date Sep 13, 2016
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Grant
Projection optical system, exposure apparatus, and exposure method
- Patent number 9,429,851
- Issue date Aug 30, 2016
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Grant
Projection optical system, exposure apparatus, and exposure method
- Patent number 9,360,763
- Issue date Jun 7, 2016
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Grant
Exposure apparatus, exposure method, and method for producing device
- Patent number 9,316,921
- Issue date Apr 19, 2016
- Nikon Corporation
- Naoyuki Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection optical system, exposure apparatus, and exposure method
- Patent number 9,310,696
- Issue date Apr 12, 2016
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Grant
Projection optical system, exposure apparatus, and exposure method
- Patent number 9,086,635
- Issue date Jul 21, 2015
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Grant
Catadioptric projection optical system, exposure apparatus, and exp...
- Patent number 9,081,295
- Issue date Jul 14, 2015
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Grant
Projection optical system, exposure apparatus, and exposure method
- Patent number 8,854,601
- Issue date Oct 7, 2014
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Grant
Projection optical system, exposure apparatus, and device manufactu...
- Patent number 8,665,418
- Issue date Mar 4, 2014
- Nikon Corporation
- Yasuhiro Omura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus, exposure method, and method for producing device
- Patent number 8,605,252
- Issue date Dec 10, 2013
- Nikon Corporation
- Naoyuki Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system, exposure system, and exposure method
- Patent number 8,436,983
- Issue date May 7, 2013
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Grant
Optical system, exposure system, and exposure method
- Patent number 8,351,021
- Issue date Jan 8, 2013
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Grant
Optical system, exposure system, and exposure method
- Patent number 8,339,578
- Issue date Dec 25, 2012
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Grant
Exposure method, exposure apparatus and device manufacturing method
- Patent number 8,253,924
- Issue date Aug 28, 2012
- Nikon Corporation
- Yusaku Uehara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus, exposure method, and method for producing device
- Patent number 8,208,119
- Issue date Jun 26, 2012
- Nikon Corporation
- Naoyuki Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection optical system, exposure apparatus, and exposure method
- Patent number 8,102,508
- Issue date Jan 24, 2012
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Grant
Projection optical system, exposure apparatus, exposure system, and...
- Patent number 8,009,271
- Issue date Aug 30, 2011
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Grant
Catadioptric imaging system with prolate spheroidal-shaped mirrors
- Patent number 7,990,609
- Issue date Aug 2, 2011
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR PRODUCING DEVICE
- Publication number 20180348653
- Publication date Dec 6, 2018
- Nikon Corporation
- Naoyuki KOBAYASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD
- Publication number 20180299785
- Publication date Oct 18, 2018
- Nikon Corporation
- Yasuhiro OMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD
- Publication number 20180052398
- Publication date Feb 22, 2018
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Application
PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD
- Publication number 20160252825
- Publication date Sep 1, 2016
- Nikon Corporation
- Yasuhiro Omura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR PRODUCING DEVICE
- Publication number 20160252828
- Publication date Sep 1, 2016
- Nikon Corporation
- Naoyuki KOBAYASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD
- Publication number 20150029476
- Publication date Jan 29, 2015
- Nikon Corporation
- Yasuhiro Omura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD
- Publication number 20150029482
- Publication date Jan 29, 2015
- Nikon Corporation
- Yasuhiro Omura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD
- Publication number 20140211180
- Publication date Jul 31, 2014
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Application
PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD
- Publication number 20140211182
- Publication date Jul 31, 2014
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Application
PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD
- Publication number 20140211183
- Publication date Jul 31, 2014
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Application
EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR PRODUCING DEVICE
- Publication number 20140055763
- Publication date Feb 27, 2014
- Nikon Corporation
- Naoyuki KOBAYASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD
- Publication number 20130314679
- Publication date Nov 28, 2013
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Application
PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD
- Publication number 20130194560
- Publication date Aug 1, 2013
- Nikon Corporation
- Yasuhiro OMURA
- G02 - OPTICS
Information Patent Application
EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR PRODUCING DEVICE
- Publication number 20120224154
- Publication date Sep 6, 2012
- Nikon Corporation
- Naoyuki KOBAYASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD
- Publication number 20120092760
- Publication date Apr 19, 2012
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Application
PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD
- Publication number 20120002186
- Publication date Jan 5, 2012
- NIKON CORPORATION
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Application
PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD
- Publication number 20110002032
- Publication date Jan 6, 2011
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Application
PROJECTION OPTICAL SYSTEM, EXPOSURE SYSTEM, AND EXPOSURE METHOD
- Publication number 20100159401
- Publication date Jun 24, 2010
- Nikon Corporation
- Hironori Ikezawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optical system, exposure system, and exposure method
- Publication number 20100141921
- Publication date Jun 10, 2010
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Application
Optical system,exposure system, and exposure method
- Publication number 20100141926
- Publication date Jun 10, 2010
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Application
Optical system, exposure system, and exposure method
- Publication number 20100142051
- Publication date Jun 10, 2010
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Application
Projection optical system, exposure apparatus, and exposure method
- Publication number 20090168189
- Publication date Jul 2, 2009
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Application
Projection optical system, exposure apparatus, and exposure method
- Publication number 20090046268
- Publication date Feb 19, 2009
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Application
Catadioptric imaging system, exposure apparatus, and device manufac...
- Publication number 20090027768
- Publication date Jan 29, 2009
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Application
Optical System, Exposing Apparatus and Exposing Method
- Publication number 20080273185
- Publication date Nov 6, 2008
- Nikon Corporation
- Yasuhiro Omura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE MANUFACTU...
- Publication number 20080259440
- Publication date Oct 23, 2008
- NIKON CORPORATION
- Yasuhiro Omura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure Method, Exposure Apparatus and Device Manufacturing Method
- Publication number 20080218714
- Publication date Sep 11, 2008
- Nikon Corporation
- Yusaku Uehara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Projection Optical System, Exposure Apparatus, and Exposure Method
- Publication number 20080165336
- Publication date Jul 10, 2008
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Application
Exposure Apparatus, Exposure Method, and Method for Producing Device
- Publication number 20080106707
- Publication date May 8, 2008
- Nikon Corporation
- Naoyuki Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Projection optical system and method for photolithography and expos...
- Publication number 20080094696
- Publication date Apr 24, 2008
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS

Yasuhiro Omura

Person

Patents Grantslast 30 patents

Projection optical system, exposure apparatus, and exposure method

Exposure apparatus, exposure method, and method for producing device

Reduction projection optical system, exposure apparatus, and exposu...

Reduction projection optical system, exposure apparatus, and exposu...

Projection optical system, exposure apparatus, and exposure method

Projection optical system, exposure apparatus, and exposure method

Projection optical system, exposure apparatus, and exposure method

Reduction projection optical system, exposure apparatus, and exposu...

Reducing immersion projection optical system

Reducing immersion projection optical system

Projection optical system, exposure apparatus, and exposure method

Projection optical system, exposure apparatus, and exposure method

Projection optical system, exposure apparatus, and exposure method

Projection optical system, exposure apparatus, and exposure method

Projection optical system, exposure apparatus, and exposure method

Exposure apparatus, exposure method, and method for producing device

Projection optical system, exposure apparatus, and exposure method

Projection optical system, exposure apparatus, and exposure method

Catadioptric projection optical system, exposure apparatus, and exp...

Projection optical system, exposure apparatus, and exposure method

Projection optical system, exposure apparatus, and device manufactu...

Exposure apparatus, exposure method, and method for producing device

Optical system, exposure system, and exposure method

Optical system, exposure system, and exposure method

Optical system, exposure system, and exposure method

Exposure method, exposure apparatus and device manufacturing method

Exposure apparatus, exposure method, and method for producing device

Projection optical system, exposure apparatus, and exposure method

Projection optical system, exposure apparatus, exposure system, and...

Catadioptric imaging system with prolate spheroidal-shaped mirrors

Patents Applicationslast 30 patents

EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR PRODUCING DEVICE

PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD

PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD

PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD

EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR PRODUCING DEVICE

PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD

PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD

PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD

PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD

PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD

EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR PRODUCING DEVICE

PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD

PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD

EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR PRODUCING DEVICE

PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD

PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD

PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD

PROJECTION OPTICAL SYSTEM, EXPOSURE SYSTEM, AND EXPOSURE METHOD

Optical system, exposure system, and exposure method

Optical system,exposure system, and exposure method

Optical system, exposure system, and exposure method

Projection optical system, exposure apparatus, and exposure method

Projection optical system, exposure apparatus, and exposure method

Catadioptric imaging system, exposure apparatus, and device manufac...

Optical System, Exposing Apparatus and Exposing Method

PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE MANUFACTU...

Exposure Method, Exposure Apparatus and Device Manufacturing Method

Projection Optical System, Exposure Apparatus, and Exposure Method

Exposure Apparatus, Exposure Method, and Method for Producing Device

Projection optical system and method for photolithography and expos...