Yasuhiro Oshima

Person

Hosaka-cho Nirasaki-shi Yamanashi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma process device and plasma process method
- Patent number 8,394,231
- Issue date Mar 12, 2013
- Tokyo Electron Limited
- Koichi Takatsuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing unit, method of detecting end point of cleanin...
- Patent number 8,075,698
- Issue date Dec 13, 2011
- Tokyo Electron Limited
- Hiroshi Kannan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas switching mechanism for plasma processing apparatus
- Patent number 7,717,061
- Issue date May 18, 2010
- Tokyo Electron Limited
- Tadahiro Ishizaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing method
- Patent number 7,662,728
- Issue date Feb 16, 2010
- Tokyo Electron Limited
- Yusaku Kashiwagi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cleaning method of treatment equipment and treatment equipment
- Patent number 7,172,657
- Issue date Feb 6, 2007
- Tokyo Electron Limited
- Yasuhiko Kojima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cleaning method for substrate treatment device and substrate treatm...
- Patent number 6,893,964
- Issue date May 17, 2005
- Tokyo Electron Limited
- Yasuhiro Oshima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR EVALUATING STATE OF CELL DIFFERENTIATION
- Publication number 20220260580
- Publication date Aug 18, 2022
- TOKYO ELECTRON LIMITED
- Keisuke HARA
- G01 - MEASURING TESTING
Information Patent Application
EVALUATION METHOD FOR GENOMIC ABNORMALITIES IN CELLS
- Publication number 20210278413
- Publication date Sep 9, 2021
- Shimadzu Corporation
- Takashi SUZUKI
- G01 - MEASURING TESTING
Information Patent Application
A PROCESSING METHOD FOR PROCESSING A SUBSTRATE PLACED ON A PLACEMEN...
- Publication number 20090214758
- Publication date Aug 27, 2009
- TOKYO ELECTRON LIMITED
- Hiroshi KANNAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20090011149
- Publication date Jan 8, 2009
- TOKYO ELECTRON LIMITED
- Yusaku Kashiwagi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of Forming Thin Film, Thin Film Forming Apparatus, Program a...
- Publication number 20080241385
- Publication date Oct 2, 2008
- TOKYO ELECTRON LIMITED
- Yasuhiro Oshima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Processing method
- Publication number 20070160757
- Publication date Jul 12, 2007
- TOKYO ELECTRON LIMITED
- Tadahiro Ishizaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma process device and plasma process method
- Publication number 20070131171
- Publication date Jun 14, 2007
- TOKYO ELECTRON LIMITED
- Koichi Takatsuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Cleaning method of treatment equipment and treatment equipment
- Publication number 20070074739
- Publication date Apr 5, 2007
- TOKYO ELECTRON LIMITED
- Yasuhiko Kojima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Substrate processing method
- Publication number 20060205191
- Publication date Sep 14, 2006
- TOKYO ELECTRON LIMITED
- Yusaku Kashiwagi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Processing apparatus and processing method
- Publication number 20060154383
- Publication date Jul 13, 2006
- TOKYO ELECTRON LIMITED
- Hiroshi Kannan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Thin-film formation in semiconductor device fabrication process and...
- Publication number 20060068104
- Publication date Mar 30, 2006
- TOKYO ELECTRON LIMITED
- Tadahiro Ishizaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Processing apparatus and processing method
- Publication number 20060027167
- Publication date Feb 9, 2006
- TOKYO ELECTRON LIMITED
- Tadahiro Ishizaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Substrate processing unit, method of detecting end point of cleanin...
- Publication number 20050241761
- Publication date Nov 3, 2005
- TOKYO ELECTRON LIMITED
- Hiroshi Kannan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of cleaning substrate processing apparatus and computer-read...
- Publication number 20050139234
- Publication date Jun 30, 2005
- TOKYO ELECTRON LIMITED
- Kazuya Dobashi
- B08 - CLEANING
Information Patent Application
Processing apparatus
- Publication number 20040250765
- Publication date Dec 16, 2004
- TOKYO ELECTRON LIMITED
- Tadahiro Ishizaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing device and plasma processing method
- Publication number 20040127033
- Publication date Jul 1, 2004
- Koichi Takatsuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Cleaning method for substrate treatment device and substrate treatm...
- Publication number 20040115951
- Publication date Jun 17, 2004
- Yasuhiro Oshima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Substrate treatment device, substrate treatment method, and cleanin...
- Publication number 20040081757
- Publication date Apr 29, 2004
- TOKYO ELECTRON LIMITED
- Tadahiro Ishizaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Processing apparatus having a support member made of metal matrix c...
- Publication number 20040042152
- Publication date Mar 4, 2004
- TOKYO ELECTRON LIMITED
- Tadahiro Ishizaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CVD method
- Publication number 20010021414
- Publication date Sep 13, 2001
- Masato Morishima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Cleaning method of tratment equipment and treatment equipment
- Publication number 20010020478
- Publication date Sep 13, 2001
- Yasuhiko Kojima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Yasuhiro Oshima

Person

Patents Grantslast 30 patents

Plasma process device and plasma process method

Substrate processing unit, method of detecting end point of cleanin...

Gas switching mechanism for plasma processing apparatus

Substrate processing method

Cleaning method of treatment equipment and treatment equipment

Cleaning method for substrate treatment device and substrate treatm...

Patents Applicationslast 30 patents

METHOD FOR EVALUATING STATE OF CELL DIFFERENTIATION

EVALUATION METHOD FOR GENOMIC ABNORMALITIES IN CELLS

A PROCESSING METHOD FOR PROCESSING A SUBSTRATE PLACED ON A PLACEMEN...

SUBSTRATE PROCESSING METHOD

Method of Forming Thin Film, Thin Film Forming Apparatus, Program a...

Processing method

Plasma process device and plasma process method

Cleaning method of treatment equipment and treatment equipment

Substrate processing method

Processing apparatus and processing method

Thin-film formation in semiconductor device fabrication process and...

Processing apparatus and processing method

Substrate processing unit, method of detecting end point of cleanin...

Method of cleaning substrate processing apparatus and computer-read...

Processing apparatus

Plasma processing device and plasma processing method

Cleaning method for substrate treatment device and substrate treatm...

Substrate treatment device, substrate treatment method, and cleanin...

Processing apparatus having a support member made of metal matrix c...

CVD method

Cleaning method of tratment equipment and treatment equipment