Yasuhiro Tobe

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and plasma control method
- Patent number 10,840,069
- Issue date Nov 17, 2020
- Tokyo Electron Limited
- Yasuhiro Tobe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, and operation method for substrate...
- Patent number 10,804,082
- Issue date Oct 13, 2020
- Tokyo Electron Limited
- Yasuhiro Tobe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate removing method
- Patent number 10,651,071
- Issue date May 12, 2020
- Tokyo Electron Limited
- Yasuhiro Tobe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum processing apparatus
- Patent number 8,522,958
- Issue date Sep 3, 2013
- Tokyo Electron Limited
- Yasuhiro Tobe
- B65 - CONVEYING PACKING STORING HANDLING THIN OR FILAMENTARY MATERIAL
Information Patent Grant
Substrate processing apparatus
- Patent number 8,337,621
- Issue date Dec 25, 2012
- Tokyo Electron Limited
- Yasuhiro Tobe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus, plasma processing method and storage m...
- Patent number 8,262,844
- Issue date Sep 11, 2012
- Tokyo Electron Limited
- Hiraku Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dual-chamber plasma processing apparatus
- Patent number 7,381,291
- Issue date Jun 3, 2008
- ASM Japan K.K.
- Yasuhiro Tobe
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING APPARATUS, AND OPERATION METHOD FOR SUBSTRATE...
- Publication number 20190035609
- Publication date Jan 31, 2019
- TOKYO ELECTRON LIMITED
- Yasuhiro Tobe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA CONTROL METHOD
- Publication number 20180350566
- Publication date Dec 6, 2018
- TOKYO ELECTRON LIMITED
- Yasuhiro TOBE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE REMOVING METHOD
- Publication number 20180308738
- Publication date Oct 25, 2018
- TOKYO ELECTRON LIMITED
- Yasuhiro TOBE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM
- Publication number 20110240223
- Publication date Oct 6, 2011
- Tokyo Electron Limited
- Shinji Matsubayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM PROCESSING APPARATUS
- Publication number 20110076119
- Publication date Mar 31, 2011
- Yasuhiro Tobe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD AND STORAGE M...
- Publication number 20100089871
- Publication date Apr 15, 2010
- TOKYO ELECTRON LIMITED
- Hiraku Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20100043712
- Publication date Feb 25, 2010
- TOKYO ELECTRON LIMITED
- Yasuhiro Tobe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20100032095
- Publication date Feb 11, 2010
- TOKYO ELECTRON LIMITED
- Yasuhiro TOBE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPOSITION APPARATUS, DEPOSITION SYSTEM AND DEPOSITION METHOD
- Publication number 20090246941
- Publication date Oct 1, 2009
- TOKYO ELECTRON LIMITED
- Shinji Matsubayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Dual-chamber plasma processing apparatus
- Publication number 20060021701
- Publication date Feb 2, 2006
- ASM JAPAN K.K.
- Yasuhiro Tobe
- H01 - BASIC ELECTRIC ELEMENTS

Yasuhiro Tobe

Person

Patents Grantslast 30 patents

Plasma processing apparatus and plasma control method

Substrate processing apparatus, and operation method for substrate...

Substrate processing apparatus and substrate removing method

Vacuum processing apparatus

Substrate processing apparatus

Plasma processing apparatus, plasma processing method and storage m...

Dual-chamber plasma processing apparatus

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING APPARATUS, AND OPERATION METHOD FOR SUBSTRATE...

PLASMA PROCESSING APPARATUS AND PLASMA CONTROL METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE REMOVING METHOD

SUBSTRATE PROCESSING SYSTEM

VACUUM PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD AND STORAGE M...

SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS

DEPOSITION APPARATUS, DEPOSITION SYSTEM AND DEPOSITION METHOD

Dual-chamber plasma processing apparatus