Yasuhiro Yamakoshi

Person

Ibaraki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Sputtering target
- Patent number 10,984,992
- Issue date Apr 20, 2021
- JX Nippon Mining & Metals Corporation
- Shuhei Murata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process for producing a target formed of a sintering-resistant mate...
- Patent number 10,344,373
- Issue date Jul 9, 2019
- JX Nippon Mining & Metals Corporation
- Yasuhiro Yamakoshi
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Target formed of sintering-resistant material of high-melting point...
- Patent number 9,677,170
- Issue date Jun 13, 2017
- JX Nippon Mining & Metals Corporation
- Yasuhiro Yamakoshi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for connecting magnetic substance target to backing plate, a...
- Patent number 9,653,270
- Issue date May 16, 2017
- JX Nippon Mining & Metals Corporation
- Yasuhiro Yamakoshi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ni alloy sputtering target, Ni alloy thin film and Ni silicide film
- Patent number 9,249,497
- Issue date Feb 2, 2016
- JX Nippon Mining & Metals Corporation
- Yasuhiro Yamakoshi
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Barrier film for semiconductor wiring, sintered compact sputtering...
- Patent number 9,051,645
- Issue date Jun 9, 2015
- JX Nippon Mining & Metals Corporation
- Shinichiro Senda
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
High-purity Ni-V alloy target therefrom high-purity Ni-V alloy thin...
- Patent number 8,871,144
- Issue date Oct 28, 2014
- JX Nippon Mining & Metals Corporation
- Yuichiro Shindo
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Barrier film for flexible copper substrate and sputtering target fo...
- Patent number 8,318,314
- Issue date Nov 27, 2012
- JX Nippon Mining & Metals Corporation
- Shuichi Irumata
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Plated product having copper thin film formed thereon by electroles...
- Patent number 8,283,051
- Issue date Oct 9, 2012
- JX Nippon Mining & Metals Corporation
- Junichi Ito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Hafnium alloy target
- Patent number 8,262,816
- Issue date Sep 11, 2012
- JX Nippon Mining & Metals Corporation
- Takeo Okabe
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Hafnium alloy target
- Patent number 8,241,438
- Issue date Aug 14, 2012
- JX Nippon Mining & Metals Corporation
- Takeo Okabe
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Nickel alloy sputtering target and nickel silicide film
- Patent number 8,114,341
- Issue date Feb 14, 2012
- JX Nippon Mining & Metals Corporation
- Yasuhiro Yamakoshi
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Hafnium alloy target and process for producing the same
- Patent number 8,062,440
- Issue date Nov 22, 2011
- JX Nippon Mining & Metals Corporation
- Takeo Okabe
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
High-purity Ni-V alloy, target therefrom, high-purity Ni-V alloy th...
- Patent number 7,938,918
- Issue date May 10, 2011
- JX Nippon Mining & Metals Corporation
- Yuichiro Shindo
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Target of high-purity nickel or nickel alloy and its producing method
- Patent number 7,740,718
- Issue date Jun 22, 2010
- Nippon Mining & Metals Co., Ltd.
- Yasuhiro Yamakoshi
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Target of high-purity nickel or nickel alloy and its producing method
- Patent number 7,618,505
- Issue date Nov 17, 2009
- Nippon Mining & Metals Co., Ltd.
- Yasuhiro Yamakoshi
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Nickel alloy sputtering target and nickel alloy thin film
- Patent number 7,605,481
- Issue date Oct 20, 2009
- Nippon Mining & Metals Co., Ltd.
- Yasuhiro Yamakoshi
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Hafnium alloy target and process for producing the same
- Patent number 7,459,036
- Issue date Dec 2, 2008
- Nippon Mining & Metals Co., Ltd.
- Takeo Okabe
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Method for connecting magnetic substance target to backing plate, a...
- Patent number 7,347,353
- Issue date Mar 25, 2008
- Nippon Mining & Metals Co., Ltd.
- Yasuhiro Yamakoshi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering target producing few particles, backing plate or sputter...
- Patent number 6,858,116
- Issue date Feb 22, 2005
- Nikko Materials Company, Limited
- Takeo Okabe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering target and method for manufacturing thereof
- Patent number 6,153,315
- Issue date Nov 28, 2000
- Japan Energy Corporation
- Yasuhiro Yamakoshi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Silicide targets for sputtering
- Patent number 5,618,397
- Issue date Apr 8, 1997
- Japan Energy Corporation
- Osamu Kano
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Silicide targets for sputtering and method of manufacturing the same
- Patent number 5,464,520
- Issue date Nov 7, 1995
- Japan Energy Corporation
- Osamu Kano
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Silicide targets for sputtering and method of manufacturing the same
- Patent number 5,460,793
- Issue date Oct 24, 1995
- Japan Energy Corporation
- Osamu Kano
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SINTERED COMPACT TARGET AND METHOD OF PRODUCING SINTERED COMPACT
- Publication number 20210237153
- Publication date Aug 5, 2021
- JX NIPPON MINING & METALS CORPORATION
- Hideaki Fukuyo
- B22 - CASTING POWDER METALLURGY
Information Patent Application
SPUTTERING TARGET
- Publication number 20180144912
- Publication date May 24, 2018
- JX NIPPON MINING & METALS CORPORATION
- Shuhei Murata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SINTERED COMPACT TARGET AND METHOD OF PRODUCING SINTERED COMPACT
- Publication number 20180085828
- Publication date Mar 29, 2018
- JX NIPPON MINING & METALS CORPORATION
- Hideaki Fukuyo
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
PROCESS FOR PRODUCING A TARGET FORMED OF A SINTERING-RESISTANT MATE...
- Publication number 20170009335
- Publication date Jan 12, 2017
- JX NIPPON MINING & METALS CORPORATION
- Yasuhiro Yamakoshi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Ni ALLOY SPUTTERING TARGET, Ni ALLOY THIN FILM AND Ni SILICIDE FILM
- Publication number 20130032477
- Publication date Feb 7, 2013
- JX NIPPON MINING & METALS CORPORATION
- Yasuhiro Yamakoshi
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
Nickel Silicide Film
- Publication number 20120098131
- Publication date Apr 26, 2012
- JX NIPPON MINING & METALS CORPORATION
- Yasuhiro Yamakoshi
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
Barrier Film for Semiconductor Wiring, Sintered Compact Sputtering...
- Publication number 20110155570
- Publication date Jun 30, 2011
- JX NIPPON MINING & METALS CORPORATION
- Shinichiro Senda
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
Nickel Alloy Sputtering Target and Nickel Silicide Film
- Publication number 20110135942
- Publication date Jun 9, 2011
- JX NIPPON MINING & METALS CORPORATION
- Yasuhiro Yamakoshi
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
PLATED PRODUCT HAVING COPPER THIN FILM FORMED THEREON BY ELECTROLES...
- Publication number 20110129688
- Publication date Jun 2, 2011
- Junichi Ito
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Sintered Compact Target and Method of Producing Sintered Compact
- Publication number 20110017590
- Publication date Jan 27, 2011
- JX NIPPON MINING & METALS CORPORATION
- Hideaki Fukuyo
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
High-Purity Ni-V Alloy, Target therefrom, High-Purity Ni-V Alloy Th...
- Publication number 20100242674
- Publication date Sep 30, 2010
- Nippon Mining & Metals Co., Ltd.
- Yuichiro Shindo
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
Barrier Film for Flexible Copper Substrate and Sputtering Target fo...
- Publication number 20100089622
- Publication date Apr 15, 2010
- Nippon Mining & Metals Co., Ltd.
- Shuichi Irumata
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
Target formed of Sintering-Resistant Material of High-Melting Point...
- Publication number 20090229975
- Publication date Sep 17, 2009
- Nippon Mining & Metals Co., Ltd.
- Yasuhiro Yamakoshi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Hafnium Alloy Target and Process for Producing the Same
- Publication number 20090057142
- Publication date Mar 5, 2009
- Nippon Mining & Metals Co., Ltd.
- Takeo Okabe
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
Hafnium Alloy Target and Process for Producing the Same
- Publication number 20090050475
- Publication date Feb 26, 2009
- Nippon Mining & Metals Co., Ltd.
- Takeo Okabe
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
Method for Connecting Magnetic Substance Target to Backing Plate, a...
- Publication number 20090008245
- Publication date Jan 8, 2009
- Nippon Mining & Metals Co., Ltd.
- Yasuhiro Yamakoshi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Hafnium Alloy Target and Process for Producing the Same
- Publication number 20090000704
- Publication date Jan 1, 2009
- Nippon Mining & Metals Co., Ltd.
- Takeo Okabe
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
Barrier Film For Flexible Copper Substrate And Sputtering Target Fo...
- Publication number 20070209547
- Publication date Sep 13, 2007
- Nippon Mining & Metals Co., Ltd.
- Shuichi Irumata
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
Nickel alloy sputtering target and nickel alloy thin film
- Publication number 20070074790
- Publication date Apr 5, 2007
- Nikko Materials Co., Ltd.
- Yasuhiro Yamakoshi
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
High-purity ni-v alloy target therefrom high-purity ni-v alloy thin...
- Publication number 20060292028
- Publication date Dec 28, 2006
- Nikko Materials Co., Ltd.
- Yuichiro Shindo
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
Hafnium alloy target and process for producing the same
- Publication number 20060189164
- Publication date Aug 24, 2006
- Nikko Materials Co., Ltd.
- Takeo Okabe
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
Target of high-purity nickel or nickel alloy and its producing method
- Publication number 20060137782
- Publication date Jun 29, 2006
- Nikko Materials Co., Ltd.
- Yasuhiro Yamakoshi
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
Nickel alloy sputtering target
- Publication number 20060037680
- Publication date Feb 23, 2006
- Nikko Materials Co., Ltd.
- Yasuhiro Yamakoshi
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
Method for connecting magnetic substance target to backing plate, a...
- Publication number 20040265616
- Publication date Dec 30, 2004
- Yasuhiro Yamakoshi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Target of high-purity nickel or nickel alloy and its producing method
- Publication number 20040256035
- Publication date Dec 23, 2004
- Yasuhiro Yamakoshi
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
Sputtering target producing few particles, backing plate or sputter...
- Publication number 20030116425
- Publication date Jun 26, 2003
- Takeo Okabe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Yasuhiro Yamakoshi

Person

Patents Grantslast 30 patents

Sputtering target

Process for producing a target formed of a sintering-resistant mate...

Target formed of sintering-resistant material of high-melting point...

Method for connecting magnetic substance target to backing plate, a...

Ni alloy sputtering target, Ni alloy thin film and Ni silicide film

Barrier film for semiconductor wiring, sintered compact sputtering...

High-purity Ni-V alloy target therefrom high-purity Ni-V alloy thin...

Barrier film for flexible copper substrate and sputtering target fo...

Plated product having copper thin film formed thereon by electroles...

Hafnium alloy target

Hafnium alloy target

Nickel alloy sputtering target and nickel silicide film

Hafnium alloy target and process for producing the same

High-purity Ni-V alloy, target therefrom, high-purity Ni-V alloy th...

Target of high-purity nickel or nickel alloy and its producing method

Target of high-purity nickel or nickel alloy and its producing method

Nickel alloy sputtering target and nickel alloy thin film

Hafnium alloy target and process for producing the same

Method for connecting magnetic substance target to backing plate, a...

Sputtering target producing few particles, backing plate or sputter...

Sputtering target and method for manufacturing thereof

Silicide targets for sputtering

Silicide targets for sputtering and method of manufacturing the same

Silicide targets for sputtering and method of manufacturing the same

Patents Applicationslast 30 patents

SINTERED COMPACT TARGET AND METHOD OF PRODUCING SINTERED COMPACT

SPUTTERING TARGET

SINTERED COMPACT TARGET AND METHOD OF PRODUCING SINTERED COMPACT

PROCESS FOR PRODUCING A TARGET FORMED OF A SINTERING-RESISTANT MATE...

Ni ALLOY SPUTTERING TARGET, Ni ALLOY THIN FILM AND Ni SILICIDE FILM

Nickel Silicide Film

Barrier Film for Semiconductor Wiring, Sintered Compact Sputtering...

Nickel Alloy Sputtering Target and Nickel Silicide Film

PLATED PRODUCT HAVING COPPER THIN FILM FORMED THEREON BY ELECTROLES...

Sintered Compact Target and Method of Producing Sintered Compact

High-Purity Ni-V Alloy, Target therefrom, High-Purity Ni-V Alloy Th...

Barrier Film for Flexible Copper Substrate and Sputtering Target fo...

Target formed of Sintering-Resistant Material of High-Melting Point...

Hafnium Alloy Target and Process for Producing the Same

Hafnium Alloy Target and Process for Producing the Same

Method for Connecting Magnetic Substance Target to Backing Plate, a...

Hafnium Alloy Target and Process for Producing the Same

Barrier Film For Flexible Copper Substrate And Sputtering Target Fo...

Nickel alloy sputtering target and nickel alloy thin film

High-purity ni-v alloy target therefrom high-purity ni-v alloy thin...

Hafnium alloy target and process for producing the same

Target of high-purity nickel or nickel alloy and its producing method

Nickel alloy sputtering target

Method for connecting magnetic substance target to backing plate, a...

Target of high-purity nickel or nickel alloy and its producing method

Sputtering target producing few particles, backing plate or sputter...