Yasuhiro Yoshii

Person

Kawasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 11,822,240
- Issue date Nov 21, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Yasuhiro Yoshii
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 11,650,497
- Issue date May 16, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Yasuhiro Yoshii
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 11,586,111
- Issue date Feb 21, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Yasuhiro Yoshii
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 11,392,033
- Issue date Jul 19, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Hitoshi Yamano
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 11,275,306
- Issue date Mar 15, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Kojima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 11,187,981
- Issue date Nov 30, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Yoichi Hori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound and method of producing the same, acid generator, resist c...
- Patent number 9,040,220
- Issue date May 26, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound and method of producing the same, acid generator, resist c...
- Patent number 9,034,556
- Issue date May 19, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition for immersion exposure and method of forming res...
- Patent number 8,900,788
- Issue date Dec 2, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiyuki Utsumi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming resist pattern and resist composition
- Patent number 8,877,432
- Issue date Nov 4, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Jiro Yokoya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition for immersion exposure, method of forming resist...
- Patent number 8,530,598
- Issue date Sep 10, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 8,486,605
- Issue date Jul 16, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 8,338,075
- Issue date Dec 25, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition for immersion exposure, method of forming resist...
- Patent number 8,247,161
- Issue date Aug 21, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Compound, acid generator, resist composition, and method of forming...
- Patent number 8,227,169
- Issue date Jul 24, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 8,105,747
- Issue date Jan 31, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiyuki Utsumi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 8,012,669
- Issue date Sep 6, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroaki Shimizu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition for immersion lithography and method fo...
- Patent number 7,799,507
- Issue date Sep 21, 2010
- Tokyo Ohka Co., Ltd.
- Kotaro Endo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition for immersion lithography and method fo...
- Patent number 7,494,762
- Issue date Feb 24, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Makiko Irie
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20210200086
- Publication date Jul 1, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Mari MURATA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20210200087
- Publication date Jul 1, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Yoichi HORI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20210191262
- Publication date Jun 24, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Yasuhiro YOSHII
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20210165324
- Publication date Jun 3, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Yosuke SUZUKI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20200183275
- Publication date Jun 11, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro KOJIMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20200174369
- Publication date Jun 4, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Yasuhiro YOSHII
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20200166837
- Publication date May 28, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Yasuhiro YOSHII
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20200150531
- Publication date May 14, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Yoichi HORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20190204738
- Publication date Jul 4, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Hitoshi YAMANO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20190196330
- Publication date Jun 27, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Yoichi HORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NOVEL COMPOUND AND METHOD OF PRODUCING THE SAME, ACID GENERATOR, RE...
- Publication number 20120164580
- Publication date Jun 28, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION FOR IMMERSION EXPOSURE, METHOD OF FORMING RESIST...
- Publication number 20120116038
- Publication date May 10, 2012
- Masaru Takeshita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD OF FORMING RESIST PATTERN AND RESIST COMPOSITION
- Publication number 20110262872
- Publication date Oct 27, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Jiro Yokoya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20100190108
- Publication date Jul 29, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist composition for immersion exposure, method of forming resist...
- Publication number 20100143844
- Publication date Jun 10, 2010
- Masaru Takeshita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOUND, ACID GENERATOR, RESIST COMPOSITION, AND METHOD OF FORMING...
- Publication number 20100104973
- Publication date Apr 29, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20100075249
- Publication date Mar 25, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiyuki Utsumi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20100047724
- Publication date Feb 25, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20090226842
- Publication date Sep 10, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroaki Shimizu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NOVEL COMPOUND AND METHOD OF PRODUCING THE SAME, ACID GENERATOR, RE...
- Publication number 20090162788
- Publication date Jun 25, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITION FOR IMMERSION LITHOGRAPHY AND METHOD FO...
- Publication number 20090117490
- Publication date May 7, 2009
- Tokyo OhkaKogyo Co., Ltd.
- Kotaro Endo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION FOR IMMERSION LITHOGRAPHY AND METHOD FO...
- Publication number 20080090171
- Publication date Apr 17, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Makiko Irie
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Yasuhiro Yoshii

Person

Patents Grantslast 30 patents

Resist composition and method of forming resist pattern

Resist composition and method of forming resist pattern

Resist composition and method of forming resist pattern

Resist composition and method of forming resist pattern

Resist composition and method of forming resist pattern

Resist composition and method of forming resist pattern

Compound and method of producing the same, acid generator, resist c...

Compound and method of producing the same, acid generator, resist c...

Resist composition for immersion exposure and method of forming res...

Method of forming resist pattern and resist composition

Resist composition for immersion exposure, method of forming resist...

Positive resist composition and method of forming resist pattern

Positive resist composition and method of forming resist pattern

Resist composition for immersion exposure, method of forming resist...

Compound, acid generator, resist composition, and method of forming...

Positive resist composition and method of forming resist pattern

Resist composition and method of forming resist pattern

Positive resist composition for immersion lithography and method fo...

Positive resist composition for immersion lithography and method fo...

Patents Applicationslast 30 patents

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

NOVEL COMPOUND AND METHOD OF PRODUCING THE SAME, ACID GENERATOR, RE...

RESIST COMPOSITION FOR IMMERSION EXPOSURE, METHOD OF FORMING RESIST...

METHOD OF FORMING RESIST PATTERN AND RESIST COMPOSITION

POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

Resist composition for immersion exposure, method of forming resist...

COMPOUND, ACID GENERATOR, RESIST COMPOSITION, AND METHOD OF FORMING...

POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

NOVEL COMPOUND AND METHOD OF PRODUCING THE SAME, ACID GENERATOR, RE...

POSITIVE RESIST COMPOSITION FOR IMMERSION LITHOGRAPHY AND METHOD FO...

POSITIVE RESIST COMPOSITION FOR IMMERSION LITHOGRAPHY AND METHOD FO...