Yasunobu Someya

Person

Toyama-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Composition for forming coating film and method for manufacturing s...
- Patent number 12,087,576
- Issue date Sep 10, 2024
- NISSAN CHEMICAL CORPORATION
- Tokio Nishita
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist underlayer film-forming composition and method for forming r...
- Patent number 12,072,631
- Issue date Aug 27, 2024
- NISSAN CHEMICAL CORPORATION
- Shou Shimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition for forming block copolymer layer for formation of micr...
- Patent number 12,030,974
- Issue date Jul 9, 2024
- NISSAN CHEMICAL CORPORATION
- Ryuta Mizuochi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Protective film forming composition having a diol structure
- Patent number 11,768,436
- Issue date Sep 26, 2023
- NISSAN CHEMICAL CORPORATION
- Takafumi Endo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Composition for forming underlayer film of self-assembled film incl...
- Patent number 11,674,053
- Issue date Jun 13, 2023
- Nissan Chemical Industries, Ltd.
- Takafumi Endo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist underlayer film-forming composition comprising carbonyl-cont...
- Patent number 11,592,747
- Issue date Feb 28, 2023
- Nissan Chemical Industries, Ltd.
- Yasunobu Someya
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Protective film forming composition having an acetal structure
- Patent number 11,460,771
- Issue date Oct 4, 2022
- NISSAN CHEMICAL CORPORATION
- Takafumi Endo
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Underlayer film-forming composition for use in forming a microphase...
- Patent number 11,440,985
- Issue date Sep 13, 2022
- NISSAN CHEMICAL CORPORATION
- Ryuta Mizuochi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for manufacturing semiconductor substrate having group-III n...
- Patent number 11,339,242
- Issue date May 24, 2022
- NISSAN CHEMICAL CORPORATION
- Keisuke Hashimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist underlayer film-forming composition for lithography containi...
- Patent number 11,194,251
- Issue date Dec 7, 2021
- Nissan Chemical Industries, Ltd.
- Ryo Karasawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-organized film-forming composition for use in forming a micro-...
- Patent number 10,995,172
- Issue date May 4, 2021
- NISSAN CHEMICAL CORPORATION
- Ryuta Mizuochi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Upper-layer film forming composition and method for producing a pha...
- Patent number 10,865,262
- Issue date Dec 15, 2020
- NISSAN CHEMICAL CORPORATION
- Ryuta Mizuochi
- B32 - LAYERED PRODUCTS
Information Patent Grant
Method for roughening surface using wet treatment
- Patent number 10,804,111
- Issue date Oct 13, 2020
- Nissan Chemical Industries, Ltd.
- Keisuke Hashimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bottom layer film-formation composition of self-organizing film con...
- Patent number 10,508,181
- Issue date Dec 17, 2019
- Nissan Chemical Industries, Ltd.
- Yasunobu Someya
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Resist underlayer film-forming composition for lithography containi...
- Patent number 10,295,907
- Issue date May 21, 2019
- Nissan Chemical Industries, Ltd.
- Ryo Karasawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Bottom layer film-forming composition of self-organizing film conta...
- Patent number 10,280,328
- Issue date May 7, 2019
- Nissan Chemical Industries, Ltd.
- Yasunobu Someya
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist underlayer film forming composition for lithography containi...
- Patent number 9,746,772
- Issue date Aug 29, 2017
- Nissan Chemical Industries, Ltd.
- Hiroaki Okuyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming organic hard mask layer for use in lithogra...
- Patent number 9,514,949
- Issue date Dec 6, 2016
- Nissan Chemical Industries, Ltd.
- Yasunobu Someya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist underlayer film forming composition that contains novolac re...
- Patent number 9,469,777
- Issue date Oct 18, 2016
- Nissan Chemical Industries, Ltd.
- Takafumi Endo
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method of manufacturing semiconductor device using organic underlay...
- Patent number 9,384,977
- Issue date Jul 5, 2016
- Nissan Chemical Industries, Ltd.
- Yasunobu Someya
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Resist underlayer film-forming composition which contains alicyclic...
- Patent number 9,343,324
- Issue date May 17, 2016
- Nissan Chemical Industries, Ltd.
- Tetsuya Shinjo
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition for forming a resist underlayer film including hydroxyl...
- Patent number 9,263,285
- Issue date Feb 16, 2016
- Nissan Chemical Industries, Ltd.
- Tetsuya Shinjo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Diarylamine novolac resin
- Patent number 9,263,286
- Issue date Feb 16, 2016
- Nissan Chemical Industries, Ltd.
- Rikimaru Sakamoto
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist underlayer film-forming composition containing copolymer res...
- Patent number 9,261,790
- Issue date Feb 16, 2016
- Nissan Chemical Industries, Ltd.
- Yasunobu Someya
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist underlayer film forming composition containing phenylindole-...
- Patent number 8,993,215
- Issue date Mar 31, 2015
- Nissan Chemical Industries, Ltd.
- Hirokazu Nishimaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR PRODUCING POLYMER
- Publication number 20230103242
- Publication date Mar 30, 2023
- NISSAN CHEMICAL CORPORATION
- Yuto HASHIMOTO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOSITION FOR FORMING RESIST UNDERLAYER FILM
- Publication number 20230029997
- Publication date Feb 2, 2023
- NISSAN CHEMICAL CORPORATION
- Yuto HASHIMOTO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING ALICYCLIC COM...
- Publication number 20220187707
- Publication date Jun 16, 2022
- NISSAN CHEMICAL CORPORATION
- Hiroyuki WAKAYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION AND METHOD FOR FORMING R...
- Publication number 20210397090
- Publication date Dec 23, 2021
- NISSAN CHEMICAL CORPORATION
- Shou SHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR FORMING BLOCK COPOLYMER LAYER FOR FORMATION OF MICR...
- Publication number 20210284782
- Publication date Sep 16, 2021
- NISSAN CHEMICAL CORPORATION
- Ryuta MIZUOCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR FORMING COATING FILM AND METHOD FOR MANUFACTURING S...
- Publication number 20210151318
- Publication date May 20, 2021
- NISSAN CHEMICAL CORPORATION
- Tokio NISHITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER FILM FORMING COMPOSITION HAVING A DISULFIDE STRUC...
- Publication number 20210063881
- Publication date Mar 4, 2021
- NISSAN CHEMICAL CORPORATION
- Takafumi ENDO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PROTECTIVE FILM FORMING COMPOSITION HAVING AN ACETAL STRUCTURE
- Publication number 20200409260
- Publication date Dec 31, 2020
- NISSAN CHEMICAL CORPORATION
- Takafumi ENDO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PROTECTIVE FILM FORMING COMPOSITION HAVING A DIOL STRUCTURE
- Publication number 20200319561
- Publication date Oct 8, 2020
- NISSAN CHEMICAL CORPORATION
- Takafumi ENDO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SELF-ORGANIZED FILM-FORMING COMPOSITION FOR USE IN FORMING A MICRO-...
- Publication number 20200123298
- Publication date Apr 23, 2020
- NISSAN CHEMICAL CORPORATION
- Ryuta MIZUOCHI
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
UNDERLAYER FILM-FORMING COMPOSITION FOR USE IN FORMING A MICROPHASE...
- Publication number 20190359749
- Publication date Nov 28, 2019
- NISSAN CHEMICAL CORPORATION
- Ryuta MIZUOCHI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
UPPER-LAYER FILM FORMING COMPOSITION AND METHOD FOR PRODUCING A PHA...
- Publication number 20190233559
- Publication date Aug 1, 2019
- NISSAN CHEMICAL CORPORATION
- Ryuta MIZUOCHI
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE HAVING GROUP-III N...
- Publication number 20190225731
- Publication date Jul 25, 2019
- NISSAN CHEMICAL CORPORATION
- Keisuke HASHIMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR ROUGHENING SURFACE USING WET TREATMENT
- Publication number 20190092681
- Publication date Mar 28, 2019
- Nissan Chemical Industries, Ltd.
- Keisuke HASHIMOTO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION FOR LITHOGRAPHY CONTAINI...
- Publication number 20170045818
- Publication date Feb 16, 2017
- Nissan Chemical Industries, Ltd.
- Ryo KARASAWA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION FOR LITHOGRAPHY CONTAINI...
- Publication number 20170045819
- Publication date Feb 16, 2017
- Nissan Chemical Industries, Ltd.
- Ryo KARASAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY CONTAINI...
- Publication number 20160320704
- Publication date Nov 3, 2016
- Nissan Chemical Industries, Ltd.
- Hiroaki OKUYAMA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
FORMING UNDERLAYER FILM OF SELF-ASSEMBLED FILM INCLUDING ALIPHATIC...
- Publication number 20160222248
- Publication date Aug 4, 2016
- Nissan Chemical Industries, Ltd.
- Takafumi ENDO
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTANING PYRROLE NOVOLA...
- Publication number 20160147151
- Publication date May 26, 2016
- Nissan Chemical Industries, Ltd.
- Tetsuya SHINJO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
BOTTOM LAYER FILM-FORMATION COMPOSITION OF SELF-ORGANIZING FILM CON...
- Publication number 20150322219
- Publication date Nov 12, 2015
- Nissan Chemical Industries, Ltd.
- Yasunobu SOMEYA
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
BOTTOM LAYER FILM-FORMING COMPOSITION OF SELF-ORGANIZING FILM CONTA...
- Publication number 20150315402
- Publication date Nov 5, 2015
- Nissan Chemical Industries, Ltd.
- Yasunobu SOMEYA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION COMPRISING CARBONYL-CONT...
- Publication number 20150316850
- Publication date Nov 5, 2015
- Nissan Chemical Industries, Ltd.
- Yasunobu SOMEYA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING ORGANIC UNDERLAY...
- Publication number 20150194312
- Publication date Jul 9, 2015
- Nissan Chemical Industries, Ltd.
- Yasunobu Someya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER FILM FORMING COMPOSITION THAT CONTAINS NOVOLAC RE...
- Publication number 20150184018
- Publication date Jul 2, 2015
- Takafumi Endo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING PHENYLINDOLE-...
- Publication number 20150044876
- Publication date Feb 12, 2015
- Nissan Chemical Industries, Ltd.
- Hirokazu Nishimaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING COPOLYMER RES...
- Publication number 20150011092
- Publication date Jan 8, 2015
- Nissan Chemical Industries, Ltd.
- Yasunobu Someya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIARYLAMINE NOVOLAC RESIN
- Publication number 20140235059
- Publication date Aug 21, 2014
- Nissan Chemical Industries, Ltd.
- Rikimaru Sakamoto
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION WHICH CONTAINS ALICYCLIC...
- Publication number 20140235060
- Publication date Aug 21, 2014
- Nissan Chemical Industries, Ltd.
- Tetsuya Shinjo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR FORMING ORGANIC HARD MASK LAYER FOR USE IN LITHOGRA...
- Publication number 20140106570
- Publication date Apr 17, 2014
- Nissan Chemical Industries, Ltd.
- Yasunobu Someya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR FORMING A RESIST UNDERLAYER FILM INCLUDING HYDROXYL...
- Publication number 20130280913
- Publication date Oct 24, 2013
- Nissan Chemical Industries, Ltd.
- Tetsuya Shinjo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Yasunobu Someya

Person

Patents Grantslast 30 patents

Composition for forming coating film and method for manufacturing s...

Resist underlayer film-forming composition and method for forming r...

Composition for forming block copolymer layer for formation of micr...

Protective film forming composition having a diol structure

Composition for forming underlayer film of self-assembled film incl...

Resist underlayer film-forming composition comprising carbonyl-cont...

Protective film forming composition having an acetal structure

Underlayer film-forming composition for use in forming a microphase...

Method for manufacturing semiconductor substrate having group-III n...

Resist underlayer film-forming composition for lithography containi...

Self-organized film-forming composition for use in forming a micro-...

Upper-layer film forming composition and method for producing a pha...

Method for roughening surface using wet treatment

Bottom layer film-formation composition of self-organizing film con...

Resist underlayer film-forming composition for lithography containi...

Bottom layer film-forming composition of self-organizing film conta...

Resist underlayer film forming composition for lithography containi...

Composition for forming organic hard mask layer for use in lithogra...

Resist underlayer film forming composition that contains novolac re...

Method of manufacturing semiconductor device using organic underlay...

Resist underlayer film-forming composition which contains alicyclic...

Composition for forming a resist underlayer film including hydroxyl...

Diarylamine novolac resin

Resist underlayer film-forming composition containing copolymer res...

Resist underlayer film forming composition containing phenylindole-...

Patents Applicationslast 30 patents

METHOD FOR PRODUCING POLYMER

COMPOSITION FOR FORMING RESIST UNDERLAYER FILM

RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING ALICYCLIC COM...

RESIST UNDERLAYER FILM-FORMING COMPOSITION AND METHOD FOR FORMING R...

COMPOSITION FOR FORMING BLOCK COPOLYMER LAYER FOR FORMATION OF MICR...

COMPOSITION FOR FORMING COATING FILM AND METHOD FOR MANUFACTURING S...

RESIST UNDERLAYER FILM FORMING COMPOSITION HAVING A DISULFIDE STRUC...

PROTECTIVE FILM FORMING COMPOSITION HAVING AN ACETAL STRUCTURE

PROTECTIVE FILM FORMING COMPOSITION HAVING A DIOL STRUCTURE

SELF-ORGANIZED FILM-FORMING COMPOSITION FOR USE IN FORMING A MICRO-...

UNDERLAYER FILM-FORMING COMPOSITION FOR USE IN FORMING A MICROPHASE...

UPPER-LAYER FILM FORMING COMPOSITION AND METHOD FOR PRODUCING A PHA...

METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE HAVING GROUP-III N...

METHOD FOR ROUGHENING SURFACE USING WET TREATMENT

RESIST UNDERLAYER FILM-FORMING COMPOSITION FOR LITHOGRAPHY CONTAINI...

RESIST UNDERLAYER FILM-FORMING COMPOSITION FOR LITHOGRAPHY CONTAINI...

RESIST UNDERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY CONTAINI...

FORMING UNDERLAYER FILM OF SELF-ASSEMBLED FILM INCLUDING ALIPHATIC...

RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTANING PYRROLE NOVOLA...

BOTTOM LAYER FILM-FORMATION COMPOSITION OF SELF-ORGANIZING FILM CON...

BOTTOM LAYER FILM-FORMING COMPOSITION OF SELF-ORGANIZING FILM CONTA...

RESIST UNDERLAYER FILM-FORMING COMPOSITION COMPRISING CARBONYL-CONT...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING ORGANIC UNDERLAY...

RESIST UNDERLAYER FILM FORMING COMPOSITION THAT CONTAINS NOVOLAC RE...

RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING PHENYLINDOLE-...

RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING COPOLYMER RES...

DIARYLAMINE NOVOLAC RESIN

RESIST UNDERLAYER FILM-FORMING COMPOSITION WHICH CONTAINS ALICYCLIC...

COMPOSITION FOR FORMING ORGANIC HARD MASK LAYER FOR USE IN LITHOGRA...

COMPOSITION FOR FORMING A RESIST UNDERLAYER FILM INCLUDING HYDROXYL...