Yasunori Hatamura

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Kurokawa-gun, JP

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Patents Grantslast 30 patents

Information Patent Grant
Etching method and plasma processing apparatus
- Patent number 11,430,664
- Issue date Aug 30, 2022
- Tokyo Electron Limited
- Wakako Ishida
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
CLEANING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20220384183
- Publication date Dec 1, 2022
- TOKYO ELECTRON LIMITED
- Wakako ISHIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20210233776
- Publication date Jul 29, 2021
- TOKYO ELECTRON LIMITED
- Wakako Ishida
- H01 - BASIC ELECTRIC ELEMENTS