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Yasunori Hatamura
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Beverly, MA, US
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Patents Grants
last 30 patents
Information
Patent Grant
Method and apparatus for reducing substrate backside deposition dur...
Patent number
8,382,942
Issue date
Feb 26, 2013
Tokyo Electron Limited
Yasunori Hatamura
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Low-pressure removal of photoresist and etch residue
Patent number
7,344,993
Issue date
Mar 18, 2008
Tokyo Electron Limited, Inc.
Vaidyanathan Balasubramaniam
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method for removing photoresist and etch residues
Patent number
6,849,559
Issue date
Feb 1, 2005
Tokyo Electron Limited
Vaidyanathan Balasubramaniam
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
Information
Patent Application
Method and apparatus for reducing substrate backside deposition dur...
Publication number
20070000614
Publication date
Jan 4, 2007
TOKYO ELECTRON LIMITED
Yasunori Hatamura
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Low-pressure removal of photoresist and etch residue
Publication number
20060154486
Publication date
Jul 13, 2006
TOKYO ELECTRON LIMITED
Vaidyanathan Balasubramaniam
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Method for removing photoresist and etch residues
Publication number
20030194876
Publication date
Oct 16, 2003
TOKYO ELECTRON LIMITED
Vaidyanathan Balasubramaniam
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY