Yasunori Kawakami

Person

Kikuchi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Treatment apparatus and treatment method
- Patent number 6,368,776
- Issue date Apr 9, 2002
- Tokyo Electron Limited
- Koji Harada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of processing resist onto substrate and resist processing ap...
- Patent number 6,097,469
- Issue date Aug 1, 2000
- Tokyo Electron Limited
- Hidetami Yaegashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of substrate processing to form a film on multiple target ob...
- Patent number 6,054,181
- Issue date Apr 25, 2000
- Tokyo Electron Limited
- Mitsuhiro Nanbu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of processing resist utilizing alkaline component monitoring
- Patent number 6,017,663
- Issue date Jan 25, 2000
- Tokyo Electron Limited
- Hidetami Yaegashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of processing resist utilizing alkaline component monitoring
- Patent number 5,932,380
- Issue date Aug 3, 1999
- Tokyo Electron Limited
- Hidetami Yaegashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate treating system and substrate treating method
- Patent number 5,876,280
- Issue date Mar 2, 1999
- Tokyo Electron Limited
- Junichi Kitano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor wafer processing apparatus including localized humidi...
- Patent number 5,725,664
- Issue date Mar 10, 1998
- Tokyo Electron Limited
- Mitsuhiro Nanbu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for processing substrates having a film formed on a surfa...
- Patent number 5,565,034
- Issue date Oct 15, 1996
- Tokyo Electron Limited
- Mitsuhiro Nanbu
- H01 - BASIC ELECTRIC ELEMENTS

Yasunori Kawakami

Person

Patents Grantslast 30 patents

Treatment apparatus and treatment method

Method of processing resist onto substrate and resist processing ap...

Method of substrate processing to form a film on multiple target ob...

Method of processing resist utilizing alkaline component monitoring

Method of processing resist utilizing alkaline component monitoring

Substrate treating system and substrate treating method

Semiconductor wafer processing apparatus including localized humidi...

Apparatus for processing substrates having a film formed on a surfa...