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Yasunori Ohno

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Patents Grantslast 30 patents

  • Information Patent Grant

    Microwave-powered plasma-generating apparatus and method
    • Patent number 5,266,146
    • Issue date Nov 30, 1993
    • Hitachi, Ltd.
    • Yasunori Ohno
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma generating apparatus
    • Patent number 5,133,825
    • Issue date Jul 28, 1992
    • Hi Tachi, Ltd.
    • Yoshimi Hakamata
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Sputtering apparatus for forming thin films
    • Patent number 5,085,755
    • Issue date Feb 4, 1992
    • Hitachi, Ltd.
    • Eiji Setoyama
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Method and apparatus for forming a film
    • Patent number 5,064,520
    • Issue date Nov 12, 1991
    • Hitachi, Ltd.
    • Kiyoshi Miyake
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Ion source device
    • Patent number 4,847,476
    • Issue date Jul 11, 1989
    • Hitachi, Ltd.
    • Tadashi Sato
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Ion source
    • Patent number 4,739,169
    • Issue date Apr 19, 1988
    • Hitachi, Ltd.
    • Yukio Kurosawa
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    High frequency plasma generation apparatus
    • Patent number 4,716,491
    • Issue date Dec 29, 1987
    • Hitachi, Ltd.
    • Yasunori Ohno
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Ion source
    • Patent number 4,713,585
    • Issue date Dec 15, 1987
    • Hitachi, Ltd.
    • Yasunori Ohno
    • H01 - BASIC ELECTRIC ELEMENTS