Yasuo Kohsaka

Person

Yokohama-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Sputtering target
- Patent number 9,437,486
- Issue date Sep 6, 2016
- Kabushiki Kaisha Toshiba
- Koichi Watanabe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Tungsten sputtering target and method of manufacturing the target
- Patent number 7,718,117
- Issue date May 18, 2010
- Kabushiki Kaisha Toshiba
- Koichi Watanabe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Mo-W material for formation of wiring, Mo-W target and method for p...
- Patent number 7,153,589
- Issue date Dec 26, 2006
- Kabushiki Kaisha Toshiba
- Yasuo Kohsaka
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Sputter target, barrier film and electronic component
- Patent number 6,750,542
- Issue date Jun 15, 2004
- Kabushiki Kaisha Toshiba
- Yukinobu Suzuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Mo-W material for formation of wiring, Mo-W target and method for p...
- Patent number 6,200,694
- Issue date Mar 13, 2001
- Kabushiki Kaisha Toshiba
- Yasuo Kohsaka
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Mo-W material for formation of wiring, Mo-W target and method for p...
- Patent number 5,913,100
- Issue date Jun 15, 1999
- Kabushiki Kaisha Toshiba
- Yasuo Kohsaka
- B22 - CASTING POWDER METALLURGY

Patents Applicationslast 30 patents

Information Patent Application
SPUTTERING TARGET
- Publication number 20120038050
- Publication date Feb 16, 2012
- Kabushiki Kaisha Toshiba
- Koichi WATANABE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SPUTTERING TARGET AND PROCESS FOR PRODUCING THE SAME
- Publication number 20090134020
- Publication date May 28, 2009
- KABUSHIKI KAISHA TOSHIBA
- Yukinobu Suzuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Tungsten sputtering target and method of manufacturing the target
- Publication number 20050029094
- Publication date Feb 10, 2005
- Koichi Watanabe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Sputter target, barrier film and electronic component
- Publication number 20030116849
- Publication date Jun 26, 2003
- Yukinobu Suzuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Yasuo Kohsaka

Person

Patents Grantslast 30 patents

Sputtering target

Tungsten sputtering target and method of manufacturing the target

Mo-W material for formation of wiring, Mo-W target and method for p...

Sputter target, barrier film and electronic component

Mo-W material for formation of wiring, Mo-W target and method for p...

Mo-W material for formation of wiring, Mo-W target and method for p...

Patents Applicationslast 30 patents

SPUTTERING TARGET

SPUTTERING TARGET AND PROCESS FOR PRODUCING THE SAME

Tungsten sputtering target and method of manufacturing the target

Sputter target, barrier film and electronic component