Yasuo Masuda

Person

Kawasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Chemically amplified positive-type photosensitive resin composition
- Patent number 10,599,036
- Issue date Mar 24, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Yasushi Kuroiwa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming plated product using negative photoresist composi...
- Patent number 8,105,763
- Issue date Jan 31, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Yasuo Masuda
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Positive photoresist composition and method of forming resist pattern
- Patent number 7,462,436
- Issue date Dec 9, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Yasuo Masuda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive photoresist composition and method of forming resist pattern
- Patent number 7,132,213
- Issue date Nov 7, 2006
- Tokyo Ohka Kogyo Co., Ltd.
- Yasuo Masuda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive photoresist compositions and a process for producing the same
- Patent number 6,083,657
- Issue date Jul 4, 2000
- Tokyo Ohka Kogyo Co., Ltd.
- Shinichi Kono
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE COMPOSITION, PHOT...
- Publication number 20230106185
- Publication date Apr 6, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Yasuo MASUDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION...
- Publication number 20200142307
- Publication date May 7, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Aya MOMOZAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION
- Publication number 20170285476
- Publication date Oct 5, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Yasushi KUROIWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Method of Forming Plated Product Using Negative Photoresist Composi...
- Publication number 20080032242
- Publication date Feb 7, 2008
- Yasuo Masuda
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Positive photoresist composition and method of forming resist pattern
- Publication number 20060210914
- Publication date Sep 21, 2006
- TOKYO OHKA KOGYO., LTD.
- Yasuo Masuda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Positive photoresist composition and resist pattern formation
- Publication number 20060183048
- Publication date Aug 17, 2006
- Yasuo Masuda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive photoresist composition and method of forming resist pattern
- Publication number 20060166131
- Publication date Jul 27, 2006
- Tokyo Ohka Kogyo, Co., LTD.
- Yasuo Masuda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Yasuo Masuda

Person

Patents Grantslast 30 patents

Chemically amplified positive-type photosensitive resin composition

Method of forming plated product using negative photoresist composi...

Positive photoresist composition and method of forming resist pattern

Positive photoresist composition and method of forming resist pattern

Positive photoresist compositions and a process for producing the same

Patents Applicationslast 30 patents

CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE COMPOSITION, PHOT...

CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION...

CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION

Method of Forming Plated Product Using Negative Photoresist Composi...

Positive photoresist composition and method of forming resist pattern

Positive photoresist composition and resist pattern formation

Positive photoresist composition and method of forming resist pattern