Yasuo OHGOSHI

Person

Kudamatsu, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,559,481
- Issue date Feb 11, 2020
- Hitachi High-Technologies Corporation
- Michikazu Morimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 10,522,331
- Issue date Dec 31, 2019
- Hitachi High-Technologies Corporation
- Yasuo Ohgoshi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,192,718
- Issue date Jan 29, 2019
- Hitachi High-Technologies Corporation
- Michikazu Morimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for plasma processing
- Patent number 10,121,640
- Issue date Nov 6, 2018
- Hitachi High-Technologies Corporation
- Satoru Muto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 9,514,967
- Issue date Dec 6, 2016
- Hitachi High-Technologies Corporation
- Yasuo Ohgoshi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 9,502,217
- Issue date Nov 22, 2016
- Hitachi High-Technologies Corporation
- Shunsuke Kanazawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 9,336,999
- Issue date May 10, 2016
- Hitachi High-Technologies Corporation
- Michikazu Morimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 9,305,803
- Issue date Apr 5, 2016
- Hitachi High-Technologies Corporation
- Michikazu Morimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 8,992,724
- Issue date Mar 31, 2015
- Hitachi High-Technologies Corporation
- Shunsuke Kanazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for plasma processing
- Patent number 8,969,211
- Issue date Mar 3, 2015
- Hitachi High-Technologies Corporation
- Satoru Muto
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20180337022
- Publication date Nov 22, 2018
- Hitachi High-Technologies Corporation
- Michikazu Morimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20170040143
- Publication date Feb 9, 2017
- Hitachi High-Technologies Corporation
- Yasuo OHGOSHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20170025289
- Publication date Jan 26, 2017
- Hitachi High-Technologies Corporation
- Michikazu Morimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20160233057
- Publication date Aug 11, 2016
- Hitachi High-Technologies Corporation
- Michikazu Morimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20160181131
- Publication date Jun 23, 2016
- Hitachi High-Technologies Corporation
- Michikazu Morimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR PLASMA PROCESSING
- Publication number 20150170880
- Publication date Jun 18, 2015
- Hitachi High-Technologies Corporation
- Satoru MUTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20150170886
- Publication date Jun 18, 2015
- Hitachi High-Technologies Corporation
- Michikazu MORIMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus and Plasma Processing Method
- Publication number 20150144594
- Publication date May 28, 2015
- Hitachi High-Technologies Corporation
- Shunsuke Kanazawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20140363977
- Publication date Dec 11, 2014
- Hitachi High-Technologies Corporation
- Michikazu Morimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR PLASMA PROCESSING
- Publication number 20140302682
- Publication date Oct 9, 2014
- Hitachi High-Technologies Corporation
- Satoru MUTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20140148016
- Publication date May 29, 2014
- Hitachi High-Technologies Corporation
- Shunsuke Kanazawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20140057445
- Publication date Feb 27, 2014
- Hitachi High-Technologies Corporation
- Michikazu MORIMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20140020831
- Publication date Jan 23, 2014
- Hitachi High-Technologies Corporation
- Yasuo OHGOSHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20120252219
- Publication date Oct 4, 2012
- Hitachi High-Technologies Corporation
- Michikazu MORIMOTO
- H01 - BASIC ELECTRIC ELEMENTS

Yasuo OHGOSHI

Person

Patents Grantslast 30 patents

Plasma processing apparatus and plasma processing method

Plasma processing apparatus

Plasma processing apparatus and plasma processing method

Method and apparatus for plasma processing

Plasma processing apparatus

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method

Method and apparatus for plasma processing

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

METHOD AND APPARATUS FOR PLASMA PROCESSING

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

Plasma Processing Apparatus and Plasma Processing Method

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

METHOD AND APPARATUS FOR PLASMA PROCESSING

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD