Yasushi Ishikawa

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Fremont, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Directional deposition in etch chamber
- Patent number 11,742,212
- Issue date Aug 29, 2023
- Lam Research Corporation
- Zhongkui Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching carbon layer using doped carbon as a hard mask
- Patent number 11,270,890
- Issue date Mar 8, 2022
- Lam Research Corporation
- Amit Jain
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Post etch treatment to prevent pattern collapse
- Patent number 9,941,123
- Issue date Apr 10, 2018
- Lam Research Corporation
- Mirzafer Abatchev
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
ETCH process for 3D flash structures
- Patent number 8,598,040
- Issue date Dec 3, 2013
- Lam Research Corporation
- Anne Le Gouil
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR ETCHING FEATURES USING A TARGETED DEPOSITION FOR SELECTI...
- Publication number 20220301853
- Publication date Sep 22, 2022
- LAM RESEARCH CORPORATION
- Wenchi LIU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DIRECTIONAL DEPOSITION IN ETCH CHAMBER
- Publication number 20220028697
- Publication date Jan 27, 2022
- LAM RESEARCH CORPORATION
- Zhongkui Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN SITU INVERSE MASK PATTERNING
- Publication number 20210020441
- Publication date Jan 21, 2021
- LAM RESEARCH CORPORATION
- Juan VALDIVIA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING CARBON LAYER USING DOPED CARBON AS A HARD MASK
- Publication number 20200194272
- Publication date Jun 18, 2020
- LAM RESEARCH CORPORATION
- Amit Jain
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCH PROCESS FOR 3D FLASH STRUCTURES
- Publication number 20130059450
- Publication date Mar 7, 2013
- LAM RESEARCH CORPORATION
- Anne Le Gouil
- H01 - BASIC ELECTRIC ELEMENTS