Yasushi Kurata

Person

Tsukuba-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Composition for forming passivation layer, semiconductor substrate...
- Patent number 9,714,262
- Issue date Jul 25, 2017
- Hitachi Chemical Company, Ltd.
- Shuichiro Adachi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Cmp polishing slurry and method of polishing substrate
- Patent number 9,293,344
- Issue date Mar 22, 2016
- Hitachi Chemical Company, Ltd.
- Masato Fukasawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Scintillator single crystal, heat treatment method for production o...
- Patent number 8,999,281
- Issue date Apr 7, 2015
- Hitachi Chemical Company, Ltd.
- Yasushi Kurata
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Single crystal heat treatment method
- Patent number 8,728,232
- Issue date May 20, 2014
- Hitachi Chemical Co., Ltd.
- Tatsuya Usui
- C30 - CRYSTAL GROWTH
Information Patent Grant
Polishing slurry and polishing method
- Patent number 8,696,929
- Issue date Apr 15, 2014
- Hitachi Chemical Co., Ltd.
- Yasushi Kurata
- B24 - GRINDING POLISHING
Information Patent Grant
Abrasive, method of polishing target member and process for produci...
- Patent number 8,616,936
- Issue date Dec 31, 2013
- Hitachi Chemical Company, Ltd.
- Masato Yoshida
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polishing slurry for chemical mechanical polishing and method for p...
- Patent number 8,231,735
- Issue date Jul 31, 2012
- Hitachi Chemical Co., Ltd.
- Kouji Haga
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
CMP polishing slurry and polishing method
- Patent number 8,168,541
- Issue date May 1, 2012
- Hitachi Chemical Co., Ltd.
- Masato Fukasawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Abrasive, method of polishing target member and process for produci...
- Patent number 8,162,725
- Issue date Apr 24, 2012
- Hitachi Chemical Company, Ltd.
- Masato Yoshida
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Abrasive, method of polishing target member and process for produci...
- Patent number 8,137,159
- Issue date Mar 20, 2012
- Hitachi Chemical Company, Ltd.
- Masato Yoshida
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Abrasive, method of polishing target member and process for produci...
- Patent number 7,963,825
- Issue date Jun 21, 2011
- Hitachi Chemical Company, Ltd.
- Masato Yoshida
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Abrasive, method of polishing target member and process for produci...
- Patent number 7,871,308
- Issue date Jan 18, 2011
- Hitachi Chemical Company, Ltd.
- Masato Yoshida
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Cerium oxide abrasive and method of polishing substrates
- Patent number 7,867,303
- Issue date Jan 11, 2011
- Hitachi Chemical Co., Ltd.
- Masato Yoshida
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
CMP polishing compound and polishing method
- Patent number 7,838,482
- Issue date Nov 23, 2010
- Hitachi Chemical Co. Ltd.
- Masato Fukasawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
CMP polishing slurry and polishing method
- Patent number 7,837,800
- Issue date Nov 23, 2010
- Hitachi Chemical Co., Ltd.
- Masato Fukasawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polishing fluid and method of polishing
- Patent number 7,799,688
- Issue date Sep 21, 2010
- Hitachi Chemical Co., Ltd.
- Yasushi Kurata
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Single crystal for scintillator and method for manufacturing same
- Patent number 7,749,323
- Issue date Jul 6, 2010
- Hitachi Chemical Company, Ltd.
- Naoaki Shimura
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Polishing medium for chemical-mechanical polishing, and method of p...
- Patent number 7,744,666
- Issue date Jun 29, 2010
- Hitachi Chemical Company, Ltd.
- Yasushi Kurata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cerium oxide abrasive and method of polishing substrates
- Patent number 7,708,788
- Issue date May 4, 2010
- Hitachi Chemical Co, Ltd.
- Masato Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scintillator single crystal and production method of same
- Patent number 7,618,491
- Issue date Nov 17, 2009
- Hitachi Chemical Company, Ltd.
- Yasushi Kurata
- C30 - CRYSTAL GROWTH
Information Patent Grant
Single crystal heat treatment method
- Patent number 7,531,036
- Issue date May 12, 2009
- Hitachi Chemical Company, Ltd.
- Naoaki Shimura
- C30 - CRYSTAL GROWTH
Information Patent Grant
Polishing fluid and polishing method
- Patent number 7,367,870
- Issue date May 6, 2008
- Hitachi Chemical Co. Ltd.
- Yasushi Kurata
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing medium for chemical-mechanical polishing, and method of p...
- Patent number 7,319,072
- Issue date Jan 15, 2008
- Hitachi Chemical Company, Ltd.
- Yasushi Kurata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Polishing slurry for chemical mechanical polishing and method for p...
- Patent number 7,311,855
- Issue date Dec 25, 2007
- Hitachi Chemical Co., Ltd.
- Kouji Haga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing compound for chemimechanical polishing and polishing method
- Patent number 7,232,529
- Issue date Jun 19, 2007
- Hitachi Chemical Company, Ltd.
- Takeshi Uchida
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
CMP abrasive, liquid additive for CMP abrasive and method for polis...
- Patent number 7,163,644
- Issue date Jan 16, 2007
- Hitachi Chemical Company, Ltd.
- Toshihiko Akahori
- B24 - GRINDING POLISHING
Information Patent Grant
Abrasive, method of polishing target member and process for produci...
- Patent number 7,115,021
- Issue date Oct 3, 2006
- Hitachi Chemical Company, Ltd.
- Masato Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cerium oxide abrasive and method of polishing substrates
- Patent number 6,863,700
- Issue date Mar 8, 2005
- Hitachi Chemical Company, Ltd.
- Masato Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
CMP abrasive, liquid additive for CMP abrasive and method for polis...
- Patent number 6,783,434
- Issue date Aug 31, 2004
- Hitachi Chemical Company, Ltd.
- Toshihiko Akahori
- B24 - GRINDING POLISHING
Information Patent Grant
Cerium oxide abrasive for polishing insulating films formed on subs...
- Patent number 6,420,269
- Issue date Jul 16, 2002
- Hitachi Chemical Company, Ltd.
- Jun Matsuzawa
- C01 - INORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
POLISHING LIQUID FOR CMP, POLISHING LIQUID SET FOR CMP AND POLISHIN...
- Publication number 20240336810
- Publication date Oct 10, 2024
- Resonac Corporation
- Yasushi KURATA
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING LIQUID FOR CMP, POLISHING LIQUID SET FOR CMP, AND POLISHI...
- Publication number 20240336809
- Publication date Oct 10, 2024
- Resonac Corporation
- Yasushi KURATA
- B24 - GRINDING POLISHING
Information Patent Application
COMPOSITION FOR FORMING N-TYPE DIFFUSION LAYER, METHOD FOR FORMING...
- Publication number 20160359078
- Publication date Dec 8, 2016
- Hitachi Chemical Company, Ltd.
- Tetsuya SATO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION FOR FORMING PASSIVATION LAYER, SEMICONDUCTOR SUBSTRATE...
- Publication number 20160211389
- Publication date Jul 21, 2016
- Hitachi Chemical Company, Ltd.
- Tooru TANAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR FORMING ELECTRODE, PHOTOVOLTAIC CELL ELEMENT AND PH...
- Publication number 20160118513
- Publication date Apr 28, 2016
- Hitachi Chemical Company, Ltd.
- Shuichiro ADACHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR FORMING PASSIVATION LAYER, SEMICONDUCTOR SUBSTRATE...
- Publication number 20150228812
- Publication date Aug 13, 2015
- Hitachi Chemical Company, Ltd.
- Tooru Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR FORMING PASSIVATION LAYER, SEMICONDUCTOR SUBSTRATE...
- Publication number 20150179829
- Publication date Jun 25, 2015
- Hitachi Chemical Company, Ltd.
- Tooru Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR FORMING PASSIVATION LAYER, SEMICONDUCTOR SUBSTRATE...
- Publication number 20150166582
- Publication date Jun 18, 2015
- HITACHI CHEMICAL COMPANY, LTD. a corporation
- Shuichiro Adachi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SCINTILLATOR SINGLE CRYSTAL, HEAT TREATMENT PROCESS FOR PRODUCTION...
- Publication number 20150069298
- Publication date Mar 12, 2015
- Hitachi Chemical Company, Ltd.
- Yasushi KURATA
- C30 - CRYSTAL GROWTH
Information Patent Application
COMPOSITION FOR FORMING N-TYPE DIFFUSION LAYER, METHOD FOR PRODUCIN...
- Publication number 20150017754
- Publication date Jan 15, 2015
- HITACHI CHEMICAL COMPANY, LTD.
- Tetsuya Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELEMENT AND PHOTOVOLTAIC CELL
- Publication number 20140158196
- Publication date Jun 12, 2014
- Yoshiaki Kurihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SOLDER BONDED BODY, METHOD OF PRODUCING SOLDER BONDED BODY, ELEMENT...
- Publication number 20130042912
- Publication date Feb 21, 2013
- Hitachi Chemical Company, Ltd.
- Yoshiaki KURIHARA
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
ABRASIVE, METHOD OF POLISHING TARGET MEMBER AND PROCESS FOR PRODUCI...
- Publication number 20120227331
- Publication date Sep 13, 2012
- Masato Yoshida
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Abrasive, Method of Polishing Target Member and Process for Produci...
- Publication number 20110312251
- Publication date Dec 22, 2011
- Masato Yoshida
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CMP POLISHING SLURRY AND POLISHING METHOD
- Publication number 20110028073
- Publication date Feb 3, 2011
- HITACHI CHEMICAL CO., Ltd.
- Masato Fukasawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SCINTILLATOR SINGLE CRYSTAL, HEAT TREATMENT PROCESS FOR PRODUCTION...
- Publication number 20100327227
- Publication date Dec 30, 2010
- Hitachi Chemical Company, Ltd.
- Yasushi KURATA
- C30 - CRYSTAL GROWTH
Information Patent Application
POLISHING SLURRY AND METHOD OF POLISHING
- Publication number 20100301265
- Publication date Dec 2, 2010
- HITACHI CHEMICAL CO., Ltd.
- Yasushi KURATA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SCINTILLATOR SINGLE CRYSTAL, HEAT TREATMENT METHOD FOR PRODUCTION O...
- Publication number 20080299027
- Publication date Dec 4, 2008
- Hitachi Chemical Company, Ltd.
- Yasushi KURATA
- C30 - CRYSTAL GROWTH
Information Patent Application
ABRASIVE, METHOD OF POLISHING TARGET MEMBER AND PROCESS FOR PRODUCI...
- Publication number 20080271383
- Publication date Nov 6, 2008
- Masato Yoshida
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CMP polishing slurry and polishing method
- Publication number 20080214093
- Publication date Sep 4, 2008
- HITACHI CHEMICAL CO., Ltd.
- Masato Fukasawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Polishing slurry for chemical mechanical polishing and method for p...
- Publication number 20080176982
- Publication date Jul 24, 2008
- HITACHI CEHMICAL CO., LTD.
- Kouji Haga
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Single crystal for scintillator and method for manufacturing same
- Publication number 20080089824
- Publication date Apr 17, 2008
- Hitachi Chemical Company, Ltd.
- Naoaki Shimura
- C30 - CRYSTAL GROWTH
Information Patent Application
Polishing slurry and polishing method
- Publication number 20080003924
- Publication date Jan 3, 2008
- HITACHI CHEMICAL CO., LTD.
- Yasushi Kurata
- B24 - GRINDING POLISHING
Information Patent Application
Cmp Polishing Slurry and Method of Polishing Substrate
- Publication number 20080003925
- Publication date Jan 3, 2008
- HITACHI CHEMICAL CO., Ltd.
- Masato Fukasawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Polishing slurry and polishing method
- Publication number 20070295934
- Publication date Dec 27, 2007
- HITACHI CHEMICAL CO., LTD.
- Yasushi Kurata
- B24 - GRINDING POLISHING
Information Patent Application
Scintillator single crystal and process for its production
- Publication number 20070292330
- Publication date Dec 20, 2007
- Yasushi Kurata
- C30 - CRYSTAL GROWTH
Information Patent Application
METHOD FOR HEAT TREATING SINGLE CRYSTAL
- Publication number 20070277726
- Publication date Dec 6, 2007
- Tatsuya Usui
- C30 - CRYSTAL GROWTH
Information Patent Application
Abrasive, method of polishing target member and process for produci...
- Publication number 20070266642
- Publication date Nov 22, 2007
- Masato Yoshida
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CMP POLISHING SLURRY AND METHOD OF POLISHING SUBSTRATE
- Publication number 20070218811
- Publication date Sep 20, 2007
- HITACHI CHEMICAL CO., Ltd.
- Yasushi Kurata
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING MEDIUM FOR CHEMICAL-MECHANICAL POLISHING, AND POLISHING M...
- Publication number 20070190906
- Publication date Aug 16, 2007
- Takeshi Uchida
- B24 - GRINDING POLISHING

Yasushi Kurata

Person

Patents Grantslast 30 patents

Composition for forming passivation layer, semiconductor substrate...

Cmp polishing slurry and method of polishing substrate

Scintillator single crystal, heat treatment method for production o...

Single crystal heat treatment method

Polishing slurry and polishing method

Abrasive, method of polishing target member and process for produci...

Polishing slurry for chemical mechanical polishing and method for p...

CMP polishing slurry and polishing method

Abrasive, method of polishing target member and process for produci...

Abrasive, method of polishing target member and process for produci...

Abrasive, method of polishing target member and process for produci...

Abrasive, method of polishing target member and process for produci...

Cerium oxide abrasive and method of polishing substrates

CMP polishing compound and polishing method

CMP polishing slurry and polishing method

Polishing fluid and method of polishing

Single crystal for scintillator and method for manufacturing same

Polishing medium for chemical-mechanical polishing, and method of p...

Cerium oxide abrasive and method of polishing substrates

Scintillator single crystal and production method of same

Single crystal heat treatment method

Polishing fluid and polishing method

Polishing medium for chemical-mechanical polishing, and method of p...

Polishing slurry for chemical mechanical polishing and method for p...

Polishing compound for chemimechanical polishing and polishing method

CMP abrasive, liquid additive for CMP abrasive and method for polis...

Abrasive, method of polishing target member and process for produci...

Cerium oxide abrasive and method of polishing substrates

CMP abrasive, liquid additive for CMP abrasive and method for polis...

Cerium oxide abrasive for polishing insulating films formed on subs...

Patents Applicationslast 30 patents

POLISHING LIQUID FOR CMP, POLISHING LIQUID SET FOR CMP AND POLISHIN...

POLISHING LIQUID FOR CMP, POLISHING LIQUID SET FOR CMP, AND POLISHI...

COMPOSITION FOR FORMING N-TYPE DIFFUSION LAYER, METHOD FOR FORMING...

COMPOSITION FOR FORMING PASSIVATION LAYER, SEMICONDUCTOR SUBSTRATE...

COMPOSITION FOR FORMING ELECTRODE, PHOTOVOLTAIC CELL ELEMENT AND PH...

COMPOSITION FOR FORMING PASSIVATION LAYER, SEMICONDUCTOR SUBSTRATE...

COMPOSITION FOR FORMING PASSIVATION LAYER, SEMICONDUCTOR SUBSTRATE...

COMPOSITION FOR FORMING PASSIVATION LAYER, SEMICONDUCTOR SUBSTRATE...

SCINTILLATOR SINGLE CRYSTAL, HEAT TREATMENT PROCESS FOR PRODUCTION...

COMPOSITION FOR FORMING N-TYPE DIFFUSION LAYER, METHOD FOR PRODUCIN...

ELEMENT AND PHOTOVOLTAIC CELL

SOLDER BONDED BODY, METHOD OF PRODUCING SOLDER BONDED BODY, ELEMENT...

ABRASIVE, METHOD OF POLISHING TARGET MEMBER AND PROCESS FOR PRODUCI...

Abrasive, Method of Polishing Target Member and Process for Produci...

CMP POLISHING SLURRY AND POLISHING METHOD

SCINTILLATOR SINGLE CRYSTAL, HEAT TREATMENT PROCESS FOR PRODUCTION...

POLISHING SLURRY AND METHOD OF POLISHING

SCINTILLATOR SINGLE CRYSTAL, HEAT TREATMENT METHOD FOR PRODUCTION O...

ABRASIVE, METHOD OF POLISHING TARGET MEMBER AND PROCESS FOR PRODUCI...

CMP polishing slurry and polishing method

Polishing slurry for chemical mechanical polishing and method for p...

Single crystal for scintillator and method for manufacturing same

Polishing slurry and polishing method

Cmp Polishing Slurry and Method of Polishing Substrate

Polishing slurry and polishing method

Scintillator single crystal and process for its production

METHOD FOR HEAT TREATING SINGLE CRYSTAL

Abrasive, method of polishing target member and process for produci...

CMP POLISHING SLURRY AND METHOD OF POLISHING SUBSTRATE

POLISHING MEDIUM FOR CHEMICAL-MECHANICAL POLISHING, AND POLISHING M...