Yasushi Kuroiwa

Person

Kanagawa, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Chemical amplification-type photosensitive composition, photosensit...
- Patent number 11,803,122
- Issue date Oct 31, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Yasushi Kuroiwa
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Chemically amplified photosensitive composition, photosensitive dry...
- Patent number 11,474,432
- Issue date Oct 18, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Chemically amplified positive-type photosensitive resin composition...
- Patent number 11,402,755
- Issue date Aug 2, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Yasushi Kuroiwa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Chemical amplification type positive photosensitive resin compositi...
- Patent number 11,061,326
- Issue date Jul 13, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Chemically amplified positive-type photosensitive resin composition...
- Patent number 11,022,880
- Issue date Jun 1, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Chemically amplified positive-type photosensitive resin composition
- Patent number 10,599,036
- Issue date Mar 24, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Yasushi Kuroiwa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified positive-type photosensitive resin composition...
- Patent number 9,977,328
- Issue date May 22, 2018
- Tokyo Ohka Kogyo Co., Ltd.
- Yuta Yamamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-type photoresist composition, photoresist laminate, method...
- Patent number 9,091,916
- Issue date Jul 28, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Shimizu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
CHEMICAL AMPLIFICATION-TYPE PHOTOSENSITIVE COMPOSITION, PHOTOSENSIT...
- Publication number 20210356863
- Publication date Nov 18, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Yasushi KUROIWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MANUFACTURING PLATED MOLDED ARTICLE
- Publication number 20210055655
- Publication date Feb 25, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Aya MOMOZAWA
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
CHEMICALLY AMPLIFIED PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE DRY...
- Publication number 20200209739
- Publication date Jul 2, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya KAWAUE
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION...
- Publication number 20200142307
- Publication date May 7, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Aya MOMOZAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION...
- Publication number 20190278178
- Publication date Sep 12, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Yasushi KUROIWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION...
- Publication number 20190121233
- Publication date Apr 25, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya KAWAUE
- C07 - ORGANIC CHEMISTRY
Information Patent Application
CHEMICAL AMPLIFICATION TYPE POSITIVE PHOTOSENSITIVE RESIN COMPOSITI...
- Publication number 20190101825
- Publication date Apr 4, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya KAWAUE
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION
- Publication number 20170285476
- Publication date Oct 5, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Yasushi KUROIWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION...
- Publication number 20160231651
- Publication date Aug 11, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Yuta Yamamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE-TYPE PHOTORESIST COMPOSITION, PHOTORESIST LAMINATE, METHOD...
- Publication number 20130230801
- Publication date Sep 5, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Shimizu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Yasushi Kuroiwa

Person

Patents Grantslast 30 patents

Chemical amplification-type photosensitive composition, photosensit...

Chemically amplified photosensitive composition, photosensitive dry...

Chemically amplified positive-type photosensitive resin composition...

Chemical amplification type positive photosensitive resin compositi...

Chemically amplified positive-type photosensitive resin composition...

Chemically amplified positive-type photosensitive resin composition

Chemically amplified positive-type photosensitive resin composition...

Positive-type photoresist composition, photoresist laminate, method...

Patents Applicationslast 30 patents

CHEMICAL AMPLIFICATION-TYPE PHOTOSENSITIVE COMPOSITION, PHOTOSENSIT...

METHOD FOR MANUFACTURING PLATED MOLDED ARTICLE

CHEMICALLY AMPLIFIED PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE DRY...

CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION...

CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION...

CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION...

CHEMICAL AMPLIFICATION TYPE POSITIVE PHOTOSENSITIVE RESIN COMPOSITI...

CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION

CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION...

POSITIVE-TYPE PHOTORESIST COMPOSITION, PHOTORESIST LAMINATE, METHOD...