Yasushi SONODA

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Manufacturing method of three-dimensional semiconductor device
- Patent number 12,094,781
- Issue date Sep 17, 2024
- HITACHI HIGH-TECH CORPORATION
- Makoto Miura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion shield plate for plasma processing apparatus
- Patent number D1008986
- Issue date Dec 26, 2023
- HITACHI HIGH-TECH CORPORATION
- Yusuke Nakatani
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,776,792
- Issue date Oct 3, 2023
- HITACHI HIGH-TECH CORPORATION
- Shunsuke Tashiro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,387,110
- Issue date Jul 12, 2022
- HITACHI HIGH-TECH CORPORATION
- Yasushi Sonoda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,355,319
- Issue date Jun 7, 2022
- HITACHI HIGH-TECH CORPORATION
- Luke Joseph Himbele
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,232,932
- Issue date Jan 25, 2022
- HITACHI HIGH-TECH CORPORATION
- Masatoshi Kawakami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,699,909
- Issue date Jun 30, 2020
- HITACH HIGH-TECH CORPORATION
- Yasushi Sonoda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum processing apparatus
- Patent number 10,522,333
- Issue date Dec 31, 2019
- Hitachi High-Technologies Corporation
- Yusaku Sakka
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD
- Publication number 20240194450
- Publication date Jun 13, 2024
- Hitachi High-Tech Corporation
- Yasushi Sonoda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS SUPPLY APPARATUS, VACUUM PROCESSING APPARATUS, AND GAS SUPPLY M...
- Publication number 20240055278
- Publication date Feb 15, 2024
- Hitachi High-Tech Corporation
- Yoshifumi Ogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20220319809
- Publication date Oct 6, 2022
- Hitachi High-Tech Corporation
- Taku Iwase
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20220115212
- Publication date Apr 14, 2022
- Hitachi High-Tech Corporation
- Shunsuke Tashiro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE AND PLASMA PROCESSING...
- Publication number 20210082766
- Publication date Mar 18, 2021
- Hitachi High-Tech Corporation
- Makoto Miura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20200402809
- Publication date Dec 24, 2020
- Hitachi High-Technologies Corporation
- Yasushi SONODA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20190189403
- Publication date Jun 20, 2019
- Hitachi High-Technologies Corporation
- Luke Joseph HIMBELE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20190164725
- Publication date May 30, 2019
- Hitachi High-Technologies Corporation
- Masatoshi KAWAKAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20190088453
- Publication date Mar 21, 2019
- Hitachi High-Technologies Corporation
- Yasushi SONODA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20180277402
- Publication date Sep 27, 2018
- Hitachi High-Technologies Corporation
- Masatoshi KAWAKAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THE VACUUM PROCESSING APPARATUS
- Publication number 20180151336
- Publication date May 31, 2018
- Hitachi High-Technologies Corporation
- Yusaku SAKKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20160133530
- Publication date May 12, 2016
- Hitachi High-Technologies Corporation
- Yasushi SONODA
- H01 - BASIC ELECTRIC ELEMENTS

Yasushi SONODA

Person

Patents Grantslast 30 patents

Manufacturing method of three-dimensional semiconductor device

Ion shield plate for plasma processing apparatus

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method

Plasma processing apparatus

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method

Vacuum processing apparatus

Patents Applicationslast 30 patents

PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD

GAS SUPPLY APPARATUS, VACUUM PROCESSING APPARATUS, AND GAS SUPPLY M...

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE AND PLASMA PROCESSING...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

THE VACUUM PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD