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Yasuyuki Seino
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Soka-shi, Saitama, JP
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last 30 patents
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Patent Grant
Composition for removing photoresist residue and/or polymer residue
Patent number
11,091,726
Issue date
Aug 17, 2021
Kanto Kagaku Kabushiki Kaisha
Yasuyuki Seino
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
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Patent Application
COMPOSITION FOR REMOVING PHOTORESIST RESIDUE AND/OR POLYMER RESIDUE
Publication number
20180051237
Publication date
Feb 22, 2018
Kanto Kagaku Kabushiki Kaisha
Yasuyuki Seino
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...