Yeak-Chong Wong

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Methods for providing run to run process control using a dynamic tuner
- Patent number 9,213,322
- Issue date Dec 15, 2015
- Western Digital (Fremont), LLC
- Jian-Huei Feng
- G05 - CONTROLLING REGULATING
Information Patent Grant
Methods for providing asymmetric run to run control of process para...
- Patent number 9,110,465
- Issue date Aug 18, 2015
- Western Digital (Fremont), LLC
- Jian-Huei Feng
- G05 - CONTROLLING REGULATING
Information Patent Grant
Advanced-process-control system utilizing a lambda tuner
- Patent number 7,809,459
- Issue date Oct 5, 2010
- Hitachi Global Technologies Netherlands B.V.
- Toshihiro Morisawa
- G05 - CONTROLLING REGULATING
Information Patent Grant
Run-to-run control of backside pressure for CMP radial uniformity o...
- Patent number 7,722,436
- Issue date May 25, 2010
- Hitachi Global Storage Technologies Netherlands B.V.
- Hung-Chin Guthrie
- B24 - GRINDING POLISHING
Information Patent Grant
Aggregated run-to-run process control for wafer yield optimization
- Patent number 7,269,526
- Issue date Sep 11, 2007
- Hitachi Global Storage Technologies Netherlands B.V.
- Amelia Clara Muro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Run-to-run control of backside pressure for CMP radial uniformity o...
- Patent number 7,264,535
- Issue date Sep 4, 2007
- Hitachi Global Storage Technologies Netherlands, B.V.
- Hung- Chin Guthrie
- B24 - GRINDING POLISHING
Information Patent Grant
Method for fabricating a pole tip in a magnetic transducer using fe...
- Patent number 7,254,884
- Issue date Aug 14, 2007
- Hitachi Global Storage Technologies Netherlands B.V.
- Negar Karimi
- G11 - INFORMATION STORAGE

Patents Applicationslast 30 patents

Information Patent Application
Advanced-process-control system utilizing a lambda tuner
- Publication number 20090171638
- Publication date Jul 2, 2009
- Toshihiro Morisawa
- G05 - CONTROLLING REGULATING
Information Patent Application
Run-To-Run Control Of Backside Pressure For CMP Radial Uniformity O...
- Publication number 20080020676
- Publication date Jan 24, 2008
- Hitachi Global Technologies Netherlands, B.V.
- Hung-Chin Guthrie
- B24 - GRINDING POLISHING
Information Patent Application
Aggregated run-to-run process control for wafer yield optimization
- Publication number 20060265162
- Publication date Nov 23, 2006
- HITACHI GLOBAL STORAGE TECHNOLOGIES
- Amelia Clara Muro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for fabricating a pole tip in a magnetic transducer using fe...
- Publication number 20060059680
- Publication date Mar 23, 2006
- Negar Karimi
- G11 - INFORMATION STORAGE
Information Patent Application
Run-to-run control of backside pressure for CMP radial uniformity o...
- Publication number 20050239222
- Publication date Oct 27, 2005
- Hitachi Global Technologies Netherlands, B.V.
- Hung-Chin Guthrie
- B24 - GRINDING POLISHING

Yeak-Chong Wong

Person

Patents Grantslast 30 patents

Methods for providing run to run process control using a dynamic tuner

Methods for providing asymmetric run to run control of process para...

Advanced-process-control system utilizing a lambda tuner

Run-to-run control of backside pressure for CMP radial uniformity o...

Aggregated run-to-run process control for wafer yield optimization

Run-to-run control of backside pressure for CMP radial uniformity o...

Method for fabricating a pole tip in a magnetic transducer using fe...

Patents Applicationslast 30 patents

Advanced-process-control system utilizing a lambda tuner

Run-To-Run Control Of Backside Pressure For CMP Radial Uniformity O...

Aggregated run-to-run process control for wafer yield optimization

Method for fabricating a pole tip in a magnetic transducer using fe...

Run-to-run control of backside pressure for CMP radial uniformity o...