Yei-Hsiung Lin

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Hsinchu, TW

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Patents Grantslast 30 patents

Information Patent Grant
Method of forming self-aligned silicides
- Patent number 7,432,181
- Issue date Oct 7, 2008
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yei-Hsiung Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing metallic interconnect
- Patent number 6,376,359
- Issue date Apr 23, 2002
- United Microelectronics Corp.
- Yei-Hsiung Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing mixed mode semiconductor device
- Patent number 6,242,315
- Issue date Jun 5, 2001
- United Microelectronics Corp.
- Chen-Bin Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating crack resistant inter-layer dielectric for a...
- Patent number 6,225,209
- Issue date May 1, 2001
- United Microelectronics Corp.
- Yei-Hsiung Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating metal-oxide semiconductor transistor
- Patent number 6,114,196
- Issue date Sep 5, 2000
- United Microelectronics Corp.
- Yei-Hsiung Lin
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Method of forming self-aligned silicides
- Publication number 20060121708
- Publication date Jun 8, 2006
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yei-Hsiung Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING A METALLIC INTERCONNECT STRUCTURE WITH A METALLIC...
- Publication number 20030038371
- Publication date Feb 27, 2003
- Chen-Chiu Hsue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Interconnects with dielectric spacers and method for forming the same
- Publication number 20020177299
- Publication date Nov 28, 2002
- Yei-Hsiung Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Interconnects with dual dielectric spacers and method for forming t...
- Publication number 20020177080
- Publication date Nov 28, 2002
- Cheng-Hui Chung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electrostatic discharge effect free mask
- Publication number 20020115001
- Publication date Aug 22, 2002
- Chen-Chiu Hsue
- B32 - LAYERED PRODUCTS
Information Patent Application
Method for forming shallow junctions by increasing width of photore...
- Publication number 20020102785
- Publication date Aug 1, 2002
- James Ho
- H01 - BASIC ELECTRIC ELEMENTS