Yen Kun Wang

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Leak detection for gas sticks
- Patent number 12,031,885
- Issue date Jul 9, 2024
- Applied Materials, Inc.
- Yen-Kun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support providing gap height and planarization adjustment...
- Patent number RE47275
- Issue date Mar 5, 2019
- Lam Research Corporation
- Jerrell Kent Antolik
Information Patent Grant
Showerhead electrode assembly with gas flow modification for extend...
- Patent number 9,093,483
- Issue date Jul 28, 2015
- Lam Research Corporation
- Jason Augustino
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate support providing gap height and planarization adjustment...
- Patent number 8,895,452
- Issue date Nov 25, 2014
- Lam Research Corporation
- Jerrel Kent Antolik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Upper electrode backing member with particle reducing features
- Patent number 8,709,202
- Issue date Apr 29, 2014
- Lam Research Corporation
- Anthony De La Llera
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Showerhead electrode assembly with gas flow modification for extend...
- Patent number 8,702,866
- Issue date Apr 22, 2014
- Lam Research Corporation
- Jason Augustino
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for reduction of voltage potential spike during dechucking
- Patent number 8,628,675
- Issue date Jan 14, 2014
- Lam Research Corporation
- Brian McMillin
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Ozone plenum as UV shutter or tunable UV filter for cleaning semico...
- Patent number 8,624,210
- Issue date Jan 7, 2014
- Lam Research Corporation
- Yen-Kun Victor Wang
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Ozone plenum as UV shutter or tunable UV filter for cleaning semico...
- Patent number 8,492,736
- Issue date Jul 23, 2013
- Lam Research Corporation
- Yen-Kun Victor Wang
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Method and apparatus for reduction of voltage potential spike durin...
- Patent number 8,313,612
- Issue date Nov 20, 2012
- Lam Research Corporation
- Brian McMillin
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Upper electrode backing member with particle reducing features
- Patent number 7,854,820
- Issue date Dec 21, 2010
- Lam Research Corporation
- Anthony De La Llera
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Variable seal pressure slit valve doors for semiconductor manufactu...
- Patent number 7,841,582
- Issue date Nov 30, 2010
- Applied Materials, Inc.
- Won B. Bang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adjusting a spacing between a gas distribution member and a substra...
- Patent number 7,754,282
- Issue date Jul 13, 2010
- Applied Materials, Inc.
- Kirby Floyd
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas baffle and distributor for semiconductor processing chamber
- Patent number 7,722,719
- Issue date May 25, 2010
- Applied Materials, Inc.
- Lawrence Chung-Lai Lei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gap-fill depositions in the formation of silicon containing dielect...
- Patent number 7,456,116
- Issue date Nov 25, 2008
- Applied Materials, Inc.
- Nitin K. Ingle
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gap-fill depositions introducing hydroxyl-containing precursors in...
- Patent number 7,335,609
- Issue date Feb 26, 2008
- Applied Materials, Inc.
- Nitin K. Ingle
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Lift pin assembly for substrate processing
- Patent number 7,204,888
- Issue date Apr 17, 2007
- Applied Materials, Inc.
- Toan Q. Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ramp temperature techniques for improved mean wafer before clean
- Patent number 7,205,205
- Issue date Apr 17, 2007
- Applied Materials
- Won B. Bang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Clog-resistant gas delivery system
- Patent number 7,192,486
- Issue date Mar 20, 2007
- Applied Materials, Inc.
- Won Bang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Concentration profile on demand gas delivery system (individual div...
- Patent number 7,011,710
- Issue date Mar 14, 2006
- Applied Materials Inc.
- Won Bang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low profile thick film heaters in multi-slot bake chamber
- Patent number 6,506,994
- Issue date Jan 14, 2003
- Applied Materials, Inc.
- Yen-Kun Victor Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for depositing low K dielectric materials
- Patent number 6,176,198
- Issue date Jan 23, 2001
- Applied Materials, Inc.
- Yeh-Jen Kao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dual channel gas distribution plate
- Patent number 6,148,761
- Issue date Nov 21, 2000
- Applied Materials, Inc.
- Robert Majewski
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
In-situ liquid flow rate estimation and verification by sonic flow...
- Patent number 5,968,588
- Issue date Oct 19, 1999
- Applied Materials, Inc.
- Visweswaren Sivaramakrishnan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Liquid flow rate estimation and verification by direct liquid measu...
- Patent number 5,866,795
- Issue date Feb 2, 1999
- Applied Materials, Inc.
- Yen-Kun Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
FAST GAS SWITCHING
- Publication number 20240203695
- Publication date Jun 20, 2024
- Applied Materials, Inc.
- Toan Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LEAK DETECTION FOR GAS STICKS
- Publication number 20230314269
- Publication date Oct 5, 2023
- Applied Materials, Inc.
- Yen-Kun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHOWERHEAD ELECTRODE ASSEMBLY WITH GAS FLOW MODIFICATION FOR EXTEND...
- Publication number 20140187049
- Publication date Jul 3, 2014
- LAM RESEARCH CORPORATION
- Jason Augustino
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE SUPPORT PROVIDING GAP HEIGHT AND PLANARIZATION ADJUSTMENT...
- Publication number 20130323860
- Publication date Dec 5, 2013
- LAM RESEARCH CORPORATION
- Jerrel Kent Antolik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OZONE PLENUM AS UV SHUTTER OR TUNABLE UV FILTER FOR CLEANING SEMICO...
- Publication number 20130288488
- Publication date Oct 31, 2013
- Yen-Kun Victor Wang
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
METHOD AND APPARATUS FOR REDUCTION OF VOLTAGE POTENTIAL SPIKE DURIN...
- Publication number 20130059447
- Publication date Mar 7, 2013
- LAM RESEARCH CORPORATION
- Brian McMillin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OZONE PLENUM AS UV SHUTTER OR TUNABLE UV FILTER FOR CLEANING SEMICO...
- Publication number 20110306213
- Publication date Dec 15, 2011
- LAM RESEARCH CORPORATION
- Yen-Kun Victor Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VARIABLE SEAL PRESSURE SLIT VALVE DOORS FOR SEMICONDUCTOR MANUFACTU...
- Publication number 20110120017
- Publication date May 26, 2011
- Applied Materials, Inc.
- Won B. Bang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UPPER ELECTRODE BACKING MEMBER WITH PARTICLE REDUCING FEATURES
- Publication number 20110086513
- Publication date Apr 14, 2011
- LAM RESEARCH CORPORATION
- Anthony De La Llera
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR REDUCTION OF VOLTAGE POTENTIAL SPIKE DURIN...
- Publication number 20100248490
- Publication date Sep 30, 2010
- LAM RESEARCH CORPORATION
- Brian McMillin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate positioning on a vacuum chuck
- Publication number 20090197356
- Publication date Aug 6, 2009
- APPLIED MATERIALS, INC.
- Won B. Bang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Uniformly Compressed Process Chamber Gate Seal for Semiconductor Pr...
- Publication number 20090113684
- Publication date May 7, 2009
- Applied Materials, Inc.
- Won B. Bang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Showerhead electrode assembly with gas flow modification for extend...
- Publication number 20080141941
- Publication date Jun 19, 2008
- LAM RESEARCH CORPORATION
- Jason Augustino
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAP-FILL DEPOSITIONS INTRODUCING HYDROXYL-CONTAINING PRECURSORS IN...
- Publication number 20080115726
- Publication date May 22, 2008
- Applied Materials, Inc.
- Nitin K. Ingle
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Upper electrode backing member with particle reducing features
- Publication number 20080090417
- Publication date Apr 17, 2008
- LAM RESEARCH CORPORATION
- Anthony De La Llera
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate placement determination using substrate backside pressure...
- Publication number 20070076345
- Publication date Apr 5, 2007
- Won B. Bang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Gap-fill depositions introducing hydroxyl-containing precursors in...
- Publication number 20060046427
- Publication date Mar 2, 2006
- APPLIED MATERIALS, INC., A Delaware corporation
- Nitin K. Ingle
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Uniformly compressed process chamber gate seal for semiconductor pr...
- Publication number 20050268857
- Publication date Dec 8, 2005
- APPLIED MATERIALS, INC.
- Won B. Bang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Variable seal pressure slit valve doors for semiconductor manufactu...
- Publication number 20050269334
- Publication date Dec 8, 2005
- Applied Materials, Inc.
- Won B. Bang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Gap-fill depositions in the formation of silicon containing dielect...
- Publication number 20050142895
- Publication date Jun 30, 2005
- Applied Materials, Inc.
- Nitin K. Ingle
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Ramp temperature techniques for improved mean wafer before clean
- Publication number 20050101155
- Publication date May 12, 2005
- APPLIED MATERIALS, INC., A Delaware corporation
- Won B. Bang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Lift pin assembly for substrate processing
- Publication number 20040219006
- Publication date Nov 4, 2004
- Applied Materials, Inc.
- Toan Q. Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
In-situ health check of liquid injection vaporizer
- Publication number 20040163590
- Publication date Aug 26, 2004
- Applied Materials, Inc.
- Toan Tran
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Bypass set up for integration of remote optical endpoint for CVD ch...
- Publication number 20040089420
- Publication date May 13, 2004
- Applied Materials, Inc.
- Wendy Ng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Clog-resistant gas delivery system
- Publication number 20040083962
- Publication date May 6, 2004
- Applied Materials, Inc.
- Won Bang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Bypass set up for integration of remote optical endpoint for CVD ch...
- Publication number 20030027428
- Publication date Feb 6, 2003
- APPLIED MATERIALS, INC.
- Wendy Ng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW PROFILE THICK FILM HEATERS IN MULTI-SLOT BAKE CHAMBER
- Publication number 20020190051
- Publication date Dec 19, 2002
- APPLIED MATERIALS, INC.
- Yen-Kun Victor Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Concentration profile on demand gas delivery system (individual div...
- Publication number 20020000195
- Publication date Jan 3, 2002
- Won Bang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Yen Kun Wang

Person

Patents Grantslast 30 patents

Leak detection for gas sticks

Substrate support providing gap height and planarization adjustment...

Showerhead electrode assembly with gas flow modification for extend...

Substrate support providing gap height and planarization adjustment...

Upper electrode backing member with particle reducing features

Showerhead electrode assembly with gas flow modification for extend...

Method for reduction of voltage potential spike during dechucking

Ozone plenum as UV shutter or tunable UV filter for cleaning semico...

Ozone plenum as UV shutter or tunable UV filter for cleaning semico...

Method and apparatus for reduction of voltage potential spike durin...

Upper electrode backing member with particle reducing features

Variable seal pressure slit valve doors for semiconductor manufactu...

Adjusting a spacing between a gas distribution member and a substra...

Gas baffle and distributor for semiconductor processing chamber

Gap-fill depositions in the formation of silicon containing dielect...

Gap-fill depositions introducing hydroxyl-containing precursors in...

Lift pin assembly for substrate processing

Ramp temperature techniques for improved mean wafer before clean

Clog-resistant gas delivery system

Concentration profile on demand gas delivery system (individual div...

Low profile thick film heaters in multi-slot bake chamber

Apparatus and method for depositing low K dielectric materials

Dual channel gas distribution plate

In-situ liquid flow rate estimation and verification by sonic flow...

Liquid flow rate estimation and verification by direct liquid measu...

Patents Applicationslast 30 patents

FAST GAS SWITCHING

LEAK DETECTION FOR GAS STICKS

SHOWERHEAD ELECTRODE ASSEMBLY WITH GAS FLOW MODIFICATION FOR EXTEND...

SUBSTRATE SUPPORT PROVIDING GAP HEIGHT AND PLANARIZATION ADJUSTMENT...

OZONE PLENUM AS UV SHUTTER OR TUNABLE UV FILTER FOR CLEANING SEMICO...

METHOD AND APPARATUS FOR REDUCTION OF VOLTAGE POTENTIAL SPIKE DURIN...

OZONE PLENUM AS UV SHUTTER OR TUNABLE UV FILTER FOR CLEANING SEMICO...

VARIABLE SEAL PRESSURE SLIT VALVE DOORS FOR SEMICONDUCTOR MANUFACTU...

UPPER ELECTRODE BACKING MEMBER WITH PARTICLE REDUCING FEATURES

METHOD AND APPARATUS FOR REDUCTION OF VOLTAGE POTENTIAL SPIKE DURIN...

Substrate positioning on a vacuum chuck

Uniformly Compressed Process Chamber Gate Seal for Semiconductor Pr...

Showerhead electrode assembly with gas flow modification for extend...

GAP-FILL DEPOSITIONS INTRODUCING HYDROXYL-CONTAINING PRECURSORS IN...

Upper electrode backing member with particle reducing features

Substrate placement determination using substrate backside pressure...

Gap-fill depositions introducing hydroxyl-containing precursors in...

Uniformly compressed process chamber gate seal for semiconductor pr...

Variable seal pressure slit valve doors for semiconductor manufactu...

Gap-fill depositions in the formation of silicon containing dielect...

Ramp temperature techniques for improved mean wafer before clean

Lift pin assembly for substrate processing

In-situ health check of liquid injection vaporizer

Bypass set up for integration of remote optical endpoint for CVD ch...

Clog-resistant gas delivery system

Bypass set up for integration of remote optical endpoint for CVD ch...

LOW PROFILE THICK FILM HEATERS IN MULTI-SLOT BAKE CHAMBER

Concentration profile on demand gas delivery system (individual div...