Yevgeniy Konstantinovich Shmarev

Person

Lagrangeville, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Optical designs of miniaturized overlay measurement system
- Patent number 12,140,872
- Issue date Nov 12, 2024
- ASML Holding N.V.
- Mohamed Swillam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Beam splitting prism systems
- Patent number 11,126,007
- Issue date Sep 21, 2021
- ASML Holding N.V.
- Douglas C. Cappelli
- G01 - MEASURING TESTING
Information Patent Grant
Metrology method and device
- Patent number 10,866,526
- Issue date Dec 15, 2020
- ASML Holding N.V.
- Yevgeniy Konstantinovich Shmarev
- G01 - MEASURING TESTING
Information Patent Grant
Method and device for pupil illumination in overlay and critical di...
- Patent number 10,754,259
- Issue date Aug 25, 2020
- ASML Holding N.V.
- Yevgeniy Konstantinovich Shmarev
- G01 - MEASURING TESTING
Information Patent Grant
Beam splitting prism systems
- Patent number 10,747,010
- Issue date Aug 18, 2020
- ASML Holding N.V.
- Douglas C. Cappelli
- G01 - MEASURING TESTING
Information Patent Grant
Method and device for focusing in an inspection system
- Patent number 10,724,961
- Issue date Jul 28, 2020
- ASML Holding N.V.
- Yevgeniy Konstantinovich Shmarev
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and device for focusing in an inspection system
- Patent number 10,107,761
- Issue date Oct 23, 2018
- ASML Netherlands B.V.
- Yevgeniy Konstantinovich Shmarev
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Catadioptric illumination system for metrology
- Patent number 10,048,591
- Issue date Aug 14, 2018
- ASML Holding N.V.
- Stanislav Y. Smirnov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatuses for optical pupil symmetrization
- Patent number 9,904,173
- Issue date Feb 27, 2018
- ASML Holding N.V.
- Yevgeniy Konstantinovich Shmarev
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inspection apparatus, lithographic apparatus, and device manufactur...
- Patent number 9,285,687
- Issue date Mar 15, 2016
- ASML Holding N.V.
- Stanislav Y Smirnov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Catadioptric illumination system for metrology
- Patent number 9,069,260
- Issue date Jun 30, 2015
- ASML Holding N.V.
- Stanislav Y. Smirnov
- G01 - MEASURING TESTING
Information Patent Grant
EUV mask inspection system
- Patent number 9,046,754
- Issue date Jun 2, 2015
- ASML Holding N.V.
- Harry Sewell
- G01 - MEASURING TESTING
Information Patent Grant
Catadioptric objective for scatterometry
- Patent number 8,982,481
- Issue date Mar 17, 2015
- ASML Holding N.V.
- Stanislav Y. Smirnov
- G02 - OPTICS
Information Patent Grant
System and method for printing interference patterns having a pitch...
- Patent number 8,934,084
- Issue date Jan 13, 2015
- ASML Holding N.V.
- Yevgeniy Konstantinovich Shmarev
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Time differential reticle inspection
- Patent number 8,623,576
- Issue date Jan 7, 2014
- ASML Holding N.V.
- Eric Brian Catey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle inspection systems and method
- Patent number 8,189,203
- Issue date May 29, 2012
- ASML Holding N.V.
- Yevgeniy Konstantinovich Shmarev
- G01 - MEASURING TESTING
Information Patent Grant
Illumination system coherence remover with two sets of stepped mirrors
- Patent number 8,164,740
- Issue date Apr 24, 2012
- ASML Holding N.V.
- Huibert Visser
- G02 - OPTICS
Information Patent Grant
Illumination system coherence remover with a series of partially re...
- Patent number 8,159,651
- Issue date Apr 17, 2012
- ASML Holding N.V.
- Huibert Visser
- G02 - OPTICS
Information Patent Grant
Inspection method and apparatus, lithographic apparatus, lithograph...
- Patent number 8,120,001
- Issue date Feb 21, 2012
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- G01 - MEASURING TESTING
Information Patent Grant
Catadioptric optical system for scatterometry
- Patent number 8,107,173
- Issue date Jan 31, 2012
- ASML Holding N.V.
- Yevgeniy Konstanitinovich Shmarev
- G01 - MEASURING TESTING
Information Patent Grant
Catadioptric optical system for scatterometry
- Patent number 7,633,689
- Issue date Dec 15, 2009
- ASML Holding N.V.
- Yevgeniy Konstantinovich Shmarev
- G01 - MEASURING TESTING
Information Patent Grant
Optical integrators for lithography systems and methods
- Patent number 7,630,136
- Issue date Dec 8, 2009
- ASML Holding N.V.
- Lev Ryzhikov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inspection method and apparatus, lithographic apparatus, lithograph...
- Patent number 7,589,832
- Issue date Sep 15, 2009
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
OPTICAL ELEMENT FOR USE IN METROLOGY SYSTEMS
- Publication number 20240302164
- Publication date Sep 12, 2024
- ASML NETHERLANDS B.V.
- Tzu-Yi YANG
- G01 - MEASURING TESTING
Information Patent Application
OPTICAL DESIGNS OF MINIATURIZED OVERLAY MEASUREMENT SYSTEM
- Publication number 20230059471
- Publication date Feb 23, 2023
- ASML Holding N.V.
- Mohamed SWILLAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Beam Splitting Prism Systems
- Publication number 20200326556
- Publication date Oct 15, 2020
- ASML Holding N.V.
- Douglas C. CAPPELLI
- G01 - MEASURING TESTING
Information Patent Application
Beam Splitting Prism Systems
- Publication number 20190179162
- Publication date Jun 13, 2019
- ASML Holding N.V.
- Douglas C. CAPPELLI
- G02 - OPTICS
Information Patent Application
Method and Device for Pupil Illumination in Overlay and Critical Di...
- Publication number 20190155172
- Publication date May 23, 2019
- ASML Holding N.V.
- Yevgeniy Konstantinovich SHMAREV
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD AND DEVICE
- Publication number 20190094702
- Publication date Mar 28, 2019
- ASML NETHERLANDS B.V.
- Yevgeniy Konstantinovich Shmarev
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND DEVICE FOR FOCUSING IN AN INSPECTION SYSTEM
- Publication number 20180067057
- Publication date Mar 8, 2018
- ASML Holding N.V.
- Yevgeniy Konstantinovich SHMAREV
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND DEVICE FOR FOCUSING IN AN INSPECTION SYSTEM
- Publication number 20170191944
- Publication date Jul 6, 2017
- ASML Holding N.V.
- Yevgeniy Konstantinovich SHMAREV
- G01 - MEASURING TESTING
Information Patent Application
Method and Apparatuses for Optical Pupil Symmetrization
- Publication number 20160209755
- Publication date Jul 21, 2016
- ASML Holding N.V.
- Yevgeniy Konstantinovich SHMAREV
- G02 - OPTICS
Information Patent Application
CATADIOPTRIC ILLUMINATION SYSTEM FOR METROLOGY
- Publication number 20150116719
- Publication date Apr 30, 2015
- Stanislav Y. SMIRNOV
- G02 - OPTICS
Information Patent Application
Catadioptric Objective for Scatterometry
- Publication number 20130170049
- Publication date Jul 4, 2013
- ASML Holding N.V.
- Stanislav Y. SMIRNOV
- G02 - OPTICS
Information Patent Application
Inspection Apparatus, Lithographic Apparatus, and Device Manufactur...
- Publication number 20130083306
- Publication date Apr 4, 2013
- ASML Holding N.V.
- Stanislav Y. Smirnov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Holographic Mask Inspection System with Spatial Filter
- Publication number 20120281197
- Publication date Nov 8, 2012
- ASML NETHERLANDS B.V.
- Robert Albert Tharaldsen
- G01 - MEASURING TESTING
Information Patent Application
Time Differential Reticle Inspection
- Publication number 20120171600
- Publication date Jul 5, 2012
- ASML Holding N.V.
- Eric Brian Catey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Object Inspection Systems and Methods
- Publication number 20120081684
- Publication date Apr 5, 2012
- ASML NETHERLANDS B.V.
- Arie Jeffrey Den Oef
- G01 - MEASURING TESTING
Information Patent Application
CATADIOPTRIC ILLUMINATION SYSTEM FOR METROLOGY
- Publication number 20110310393
- Publication date Dec 22, 2011
- ASML Holding N.V.
- Stanislav Y. SMIRNOV
- G02 - OPTICS
Information Patent Application
Reticle Inspection Systems and Method
- Publication number 20100149548
- Publication date Jun 17, 2010
- ASML Holding N.V.
- YEVGENIY KONSTANTINOVICH SHMAREV
- G01 - MEASURING TESTING
Information Patent Application
EUV Mask Inspection System
- Publication number 20100149505
- Publication date Jun 17, 2010
- ASML Holding N.V.
- Harry SEWELL
- G01 - MEASURING TESTING
Information Patent Application
Catadioptric Optical System for Scatterometry
- Publication number 20100046092
- Publication date Feb 25, 2010
- ASML Holding N.V.
- Yevgeniy Konstantinovich Shmarev
- G02 - OPTICS
Information Patent Application
Inspection Method and Apparatus, Lithographic Apparatus, Lithograph...
- Publication number 20090294635
- Publication date Dec 3, 2009
- ASML NETHERLANDS B.V.
- Arie Jeffrey DEN BOEF
- G02 - OPTICS
Information Patent Application
Illumination System
- Publication number 20090168072
- Publication date Jul 2, 2009
- ASML Netherlands B.V. and ASML Holding N.V.
- Huibert VISSER
- G02 - OPTICS
Information Patent Application
Illumination System
- Publication number 20090091734
- Publication date Apr 9, 2009
- ASML Netherlands B.V. and ASML Holding N.V.
- Huibert VISSER
- G02 - OPTICS
Information Patent Application
Catadioptric Optical System for Scatterometry
- Publication number 20090021845
- Publication date Jan 22, 2009
- ASML Holding N.V.
- Yevgeniy Konstantinovich Shmarev
- G02 - OPTICS
Information Patent Application
Inspection method and apparatus, lithographic apparatus, lithograph...
- Publication number 20080037134
- Publication date Feb 14, 2008
- ASML NETHERLANDS B.V.
- Arie Jeffrey Maria Den Boef
- G02 - OPTICS
Information Patent Application
Optical integrators for lithography systems and methods
- Publication number 20080019008
- Publication date Jan 24, 2008
- ASML Holding N.V.
- Lev Ryzhikov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and method for printing interference patterns having a pitch...
- Publication number 20070279642
- Publication date Dec 6, 2007
- ASML Holding N.V.
- Yevgeniy Konstantinovich Shmarev
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Illumination system
- Publication number 20070247606
- Publication date Oct 25, 2007
- ASML Holding N.V.
- Huibert Visser
- G02 - OPTICS
Information Patent Application
Illumination system
- Publication number 20070127005
- Publication date Jun 7, 2007
- ASML Holding N.V.
- Huibert Visser
- G02 - OPTICS

Yevgeniy Konstantinovich Shmarev

Person

Patents Grantslast 30 patents

Optical designs of miniaturized overlay measurement system

Beam splitting prism systems

Metrology method and device

Method and device for pupil illumination in overlay and critical di...

Beam splitting prism systems

Method and device for focusing in an inspection system

Method and device for focusing in an inspection system

Catadioptric illumination system for metrology

Method and apparatuses for optical pupil symmetrization

Inspection apparatus, lithographic apparatus, and device manufactur...

Catadioptric illumination system for metrology

EUV mask inspection system

Catadioptric objective for scatterometry

System and method for printing interference patterns having a pitch...

Time differential reticle inspection

Reticle inspection systems and method

Illumination system coherence remover with two sets of stepped mirrors

Illumination system coherence remover with a series of partially re...

Inspection method and apparatus, lithographic apparatus, lithograph...

Catadioptric optical system for scatterometry

Catadioptric optical system for scatterometry

Optical integrators for lithography systems and methods

Inspection method and apparatus, lithographic apparatus, lithograph...

Patents Applicationslast 30 patents

OPTICAL ELEMENT FOR USE IN METROLOGY SYSTEMS

OPTICAL DESIGNS OF MINIATURIZED OVERLAY MEASUREMENT SYSTEM

Beam Splitting Prism Systems

Beam Splitting Prism Systems

Method and Device for Pupil Illumination in Overlay and Critical Di...

METROLOGY METHOD AND DEVICE

METHOD AND DEVICE FOR FOCUSING IN AN INSPECTION SYSTEM

METHOD AND DEVICE FOR FOCUSING IN AN INSPECTION SYSTEM

Method and Apparatuses for Optical Pupil Symmetrization

CATADIOPTRIC ILLUMINATION SYSTEM FOR METROLOGY

Catadioptric Objective for Scatterometry

Inspection Apparatus, Lithographic Apparatus, and Device Manufactur...

Holographic Mask Inspection System with Spatial Filter

Time Differential Reticle Inspection

Object Inspection Systems and Methods

CATADIOPTRIC ILLUMINATION SYSTEM FOR METROLOGY

Reticle Inspection Systems and Method

EUV Mask Inspection System

Catadioptric Optical System for Scatterometry

Inspection Method and Apparatus, Lithographic Apparatus, Lithograph...

Illumination System

Illumination System

Catadioptric Optical System for Scatterometry

Inspection method and apparatus, lithographic apparatus, lithograph...

Optical integrators for lithography systems and methods

System and method for printing interference patterns having a pitch...

Illumination system

Illumination system