Yezheng Tao

Person

San Diego, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Optical isolation module
- Patent number 12,245,350
- Issue date Mar 4, 2025
- ASML Netherlands B.V.
- Yezheng Tao
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Optical isolation module
- Patent number 11,553,582
- Issue date Jan 10, 2023
- ASML Netherlands, B.V.
- Yezheng Tao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wavelength-based optical filtering
- Patent number 10,663,866
- Issue date May 26, 2020
- ASML Netherlands B.V.
- Alexander Anthony Schafgans
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical isolation module
- Patent number 10,645,789
- Issue date May 5, 2020
- ASML Netherlands B.V.
- Yezheng Tao
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Extreme ultraviolet light source
- Patent number 10,064,261
- Issue date Aug 28, 2018
- ASML Netherlands B.V.
- Yezheng Tao
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Optical isolation module
- Patent number 9,832,855
- Issue date Nov 28, 2017
- ASML Netherlands B.V.
- Yezheng Tao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Extreme ultraviolet light source utilizing a target of finite extent
- Patent number 9,826,616
- Issue date Nov 21, 2017
- ASML Netherlands B.V.
- Yezheng Tao
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Target for extreme ultraviolet light source
- Patent number 9,462,668
- Issue date Oct 4, 2016
- ASML Netherlands B.V.
- Yezheng Tao
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Adaptive laser system for an extreme ultraviolet light source
- Patent number 9,380,691
- Issue date Jun 28, 2016
- ASML Netherlands B.V.
- Yezheng Tao
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Extreme ultraviolet light source
- Patent number 9,357,625
- Issue date May 31, 2016
- ASML Netherlands B.V.
- Yezheng Tao
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Extreme ultraviolet light source
- Patent number 9,338,870
- Issue date May 10, 2016
- ASML Netherlands B.V.
- Yezheng Tao
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Target for laser produced plasma extreme ultraviolet light source
- Patent number 9,232,624
- Issue date Jan 5, 2016
- ASML Netherlands B.V.
- Robert J. Rafac
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Target for extreme ultraviolet light source
- Patent number 9,155,179
- Issue date Oct 6, 2015
- ASML Netherlands B.V.
- Yezheng Tao
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Target for laser produced plasma extreme ultraviolet light source
- Patent number 9,107,279
- Issue date Aug 11, 2015
- ASML Netherlands B.V.
- Robert J. Rafac
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Target for laser produced plasma extreme ultraviolet light source
- Patent number 8,927,952
- Issue date Jan 6, 2015
- ASML Netherlands B.V.
- Robert J. Rafac
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Target for extreme ultraviolet light source
- Patent number 8,912,514
- Issue date Dec 16, 2014
- ASML Netherlands B.V.
- Yezheng Tao
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Target for laser produced plasma extreme ultraviolet light source
- Patent number 8,872,143
- Issue date Oct 28, 2014
- ASML Netherlands B.V.
- Robert J. Rafac
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Extreme ultraviolet light source
- Patent number 8,866,110
- Issue date Oct 21, 2014
- ASML Netherlands B.V.
- Yezheng Tao
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Target for extreme ultraviolet light source
- Patent number 8,791,440
- Issue date Jul 29, 2014
- ASML Netherlands B.V.
- Yezheng Tao
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Extreme ultraviolet light source
- Patent number 8,680,495
- Issue date Mar 25, 2014
- Cymer, LLC
- Yezheng Tao
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Target for laser produced plasma extreme ultraviolet light source
- Patent number 8,653,492
- Issue date Feb 18, 2014
- Cymer, LLC
- Robert J. Rafac
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Light source employing laser-produced plasma
- Patent number 8,536,549
- Issue date Sep 17, 2013
- The Regents of the University of California
- Yezheng Tao
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents

Information Patent Application
OPTICAL ISOLATION MODULE
- Publication number 20230139746
- Publication date May 4, 2023
- ASML NETHERLANDS B.V.
- Yezheng Tao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LASER SYSTEM FOR SOURCE MATERIAL CONDITIONING IN AN EUV LIGHT SOURCE
- Publication number 20220192000
- Publication date Jun 16, 2022
- ASML NETHERLANDS B.V.
- Igor Vladimirovich Fomenkov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ISOLATION MODULE
- Publication number 20200305263
- Publication date Sep 24, 2020
- ASML NETHERLANDS B.V.
- Yezheng Tao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXTREME ULTRAVIOLET LIGHT SOURCE
- Publication number 20180124906
- Publication date May 3, 2018
- ASML NETHERLANDS B.V.
- Yezheng Tao
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
WAVELENGTH-BASED OPTICAL FILTERING
- Publication number 20180081280
- Publication date Mar 22, 2018
- ASML NETHERLANDS B.V.
- Alexander Anthony Schafgans
- G02 - OPTICS
Information Patent Application
OPTICAL ISOLATION MODULE
- Publication number 20180063935
- Publication date Mar 1, 2018
- ASML NETHERLANDS B.V.
- Yezheng Tao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL ISOLATION MODULE
- Publication number 20170099721
- Publication date Apr 6, 2017
- ASML NETHERLANDS B.V.
- Yezheng Tao
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
EXTREME ULTRAVIOLET LIGHT SOURCE
- Publication number 20160255708
- Publication date Sep 1, 2016
- ASML NETHERLANDS B.V.
- Yezheng Tao
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
System and Method for Isolating Gain Elements in a Laser System
- Publication number 20160165709
- Publication date Jun 9, 2016
- ASML NETHERLANDS B.V.
- Yezheng Tao
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
TARGET FOR EXTREME ULTRAVIOLET LIGHT SOURCE
- Publication number 20160029471
- Publication date Jan 28, 2016
- ASML NETHERLANDS B.V.
- Yezheng Tao
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
EXTREME ULTRAVIOLET LIGHT SOURCE
- Publication number 20160007434
- Publication date Jan 7, 2016
- ASML NETHERLANDS B.V.
- Yezheng Tao
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
TARGET FOR LASER PRODUCED PLASMA EXTREME ULTRAVIOLET LIGHT SOURCE
- Publication number 20150342016
- Publication date Nov 26, 2015
- ASML NETHERLANDS B.V.
- Robert J. Rafac
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
ADAPTIVE LASER SYSTEM FOR AN EXTREME ULTRAVIOLET LIGHT SOURCE
- Publication number 20150250045
- Publication date Sep 3, 2015
- ASML NETHERLANDS B.V.
- Yezheng Tao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Extreme Ultraviolet Light Source
- Publication number 20150189728
- Publication date Jul 2, 2015
- ASML NETHERLANDS B.V.
- Yezheng Tao
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
TARGET FOR LASER PRODUCED PLASMA EXTREME ULTRAVIOLET LIGHT SOURCE
- Publication number 20150189729
- Publication date Jul 2, 2015
- ASML NETHERLANDS B.V.
- Robert J. Rafac
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
TARGET FOR EXTREME ULTRAVIOLET LIGHT SOURCE
- Publication number 20150076374
- Publication date Mar 19, 2015
- ASML NETHERLANDS B.V.
- Yezheng Tao
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
TARGET FOR EXTREME ULTRAVIOLET LIGHT SOURCE
- Publication number 20140299791
- Publication date Oct 9, 2014
- Yezheng Tao
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
TARGET FOR LASER PRODUCED PLASMA EXTREME ULTRAVIOLET LIGHT SOURCE
- Publication number 20140264087
- Publication date Sep 18, 2014
- Robert J. Rafac
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
TARGET FOR LASER PRODUCED PLASMA EXTREME ULTRAVIOLET LIGHT SOURCE
- Publication number 20140264090
- Publication date Sep 18, 2014
- Robert J. Rafac
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
EXTREME ULTRAVIOLET LIGHT SOURCE
- Publication number 20140264092
- Publication date Sep 18, 2014
- Yezheng Tao
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
SYSTEM AND METHOD FOR LIGHT SOURCE EMPLOYING LASER-PRODUCED PLASMA
- Publication number 20110122387
- Publication date May 26, 2011
- The Regents of the University of California
- Yezheng Tao
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
LIGHT SOURCE EMPLOYING LASER-PRODUCED PLASMA
- Publication number 20100051831
- Publication date Mar 4, 2010
- The Regents of the University of California
- Yezheng Tao
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Yezheng Tao

Person

Patents Grantslast 30 patents

Optical isolation module

Optical isolation module

Wavelength-based optical filtering

Optical isolation module

Extreme ultraviolet light source

Optical isolation module

Extreme ultraviolet light source utilizing a target of finite extent

Target for extreme ultraviolet light source

Adaptive laser system for an extreme ultraviolet light source

Extreme ultraviolet light source

Extreme ultraviolet light source

Target for laser produced plasma extreme ultraviolet light source

Target for extreme ultraviolet light source

Target for laser produced plasma extreme ultraviolet light source

Target for laser produced plasma extreme ultraviolet light source

Target for extreme ultraviolet light source

Target for laser produced plasma extreme ultraviolet light source

Extreme ultraviolet light source

Target for extreme ultraviolet light source

Extreme ultraviolet light source

Target for laser produced plasma extreme ultraviolet light source

Light source employing laser-produced plasma

Patents Applicationslast 30 patents

OPTICAL ISOLATION MODULE

LASER SYSTEM FOR SOURCE MATERIAL CONDITIONING IN AN EUV LIGHT SOURCE

OPTICAL ISOLATION MODULE

EXTREME ULTRAVIOLET LIGHT SOURCE

WAVELENGTH-BASED OPTICAL FILTERING

OPTICAL ISOLATION MODULE

OPTICAL ISOLATION MODULE

EXTREME ULTRAVIOLET LIGHT SOURCE

System and Method for Isolating Gain Elements in a Laser System

TARGET FOR EXTREME ULTRAVIOLET LIGHT SOURCE

EXTREME ULTRAVIOLET LIGHT SOURCE

TARGET FOR LASER PRODUCED PLASMA EXTREME ULTRAVIOLET LIGHT SOURCE

ADAPTIVE LASER SYSTEM FOR AN EXTREME ULTRAVIOLET LIGHT SOURCE

Extreme Ultraviolet Light Source

TARGET FOR LASER PRODUCED PLASMA EXTREME ULTRAVIOLET LIGHT SOURCE

TARGET FOR EXTREME ULTRAVIOLET LIGHT SOURCE

TARGET FOR EXTREME ULTRAVIOLET LIGHT SOURCE

TARGET FOR LASER PRODUCED PLASMA EXTREME ULTRAVIOLET LIGHT SOURCE

TARGET FOR LASER PRODUCED PLASMA EXTREME ULTRAVIOLET LIGHT SOURCE

EXTREME ULTRAVIOLET LIGHT SOURCE

SYSTEM AND METHOD FOR LIGHT SOURCE EMPLOYING LASER-PRODUCED PLASMA

LIGHT SOURCE EMPLOYING LASER-PRODUCED PLASMA