Yi CAO

Person

Clinton, NJ, US

People

Patents Grantslast 30 patents

Information Patent Grant
Composition comprising a polymeric thermal acid generator and proce...
- Patent number 9,291,909
- Issue date Mar 22, 2016
- AZ Electronic Materials (Luxembourg) S.A.R.L.
- Hengpeng Wu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Compositions of neutral layer for directed self assembly block copo...
- Patent number 9,052,598
- Issue date Jun 9, 2015
- AZ Electronic Materials (Luxembourg) S.A.R.L.
- Hengpeng Wu
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Methods and materials for removing metals in block copolymers
- Patent number 9,040,659
- Issue date May 26, 2015
- AZ Electronic Materials (Luxembourg) S.A.R.L.
- Jian Yin
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Composition for coating over a photoresist pattern
- Patent number 8,852,848
- Issue date Oct 7, 2014
- Z Electronic Materials USA Corp.
- Hengpeng Wu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Neutral layer polymer composition for directed self assembly and pr...
- Patent number 8,835,581
- Issue date Sep 16, 2014
- AZ Electronic Materials (Luxembourg) S.A.R.L.
- Hengpeng Wu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compositions of neutral layer for directed self assembly block copo...
- Patent number 8,691,925
- Issue date Apr 8, 2014
- AZ Electronic Materials (Luxembourg) S.A.R.L.
- Hengpeng Wu
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Methods and materials for removing metals in block copolymers
- Patent number 8,686,109
- Issue date Apr 1, 2014
- AZ Electronic Materials (Luxembourg) S.A.R.L.
- Jian Yin
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Composition for coating over a photoresist pattern comprising a lactam
- Patent number 7,923,200
- Issue date Apr 12, 2011
- AZ Electronic Materials USA Corp.
- Muthiah Thiyagarajan
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition for coating over a photoresist pattern
- Patent number 7,745,077
- Issue date Jun 29, 2010
- AZ Electronic Materials USA Corp.
- Muthiah Thiyagarajan
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Patents Applicationslast 30 patents

Information Patent Application
COMPOSITION COMPRISING A POLYMERIC THERMAL ACID GENERATOR AND PROCE...
- Publication number 20140342290
- Publication date Nov 20, 2014
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
- Hengpeng WU
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITIONS OF NEUTRAL LAYER FOR DIRECTED SELF ASSEMBLY BLOCK COPO...
- Publication number 20140193754
- Publication date Jul 10, 2014
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
- Hengpeng WU
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHODS AND MATERIALS FOR REMOVING METALS IN BLOCK COPOLYMERS
- Publication number 20140151330
- Publication date Jun 5, 2014
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
- Jian YIN
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
NEUTRAL LAYER POLYMER COMPOSITION FOR DIRECTED SELF ASSEMBLY AND PR...
- Publication number 20130330668
- Publication date Dec 12, 2013
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
- Hengpeng WU
- C07 - ORGANIC CHEMISTRY
Information Patent Application
METHODS AND MATERIALS FOR REMOVING METALS IN BLOCK COPOLYMERS
- Publication number 20130233827
- Publication date Sep 12, 2013
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
- Jian YIN
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
COMPOSITIONS OF NEUTRAL LAYER FOR DIRECTED SELF ASSEMBLY BLOCK COPO...
- Publication number 20130078576
- Publication date Mar 28, 2013
- AZ Electronic Materials USA Corp.
- Hengpeng WU
- B82 - NANO-TECHNOLOGY
Information Patent Application
Composition for Coating over a Photoresist Pattern Comprising a Lactam
- Publication number 20120219919
- Publication date Aug 30, 2012
- Muthiah Thiyagarajan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Composition for Coating over a Photoresist Pattern
- Publication number 20120028195
- Publication date Feb 2, 2012
- Hengpeng Wu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Photoresist Image-forming Process Using Double Patterning
- Publication number 20100183851
- Publication date Jul 22, 2010
- Yi Cao
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Composition for Coating over a Photoresist Pattern
- Publication number 20090317739
- Publication date Dec 24, 2009
- Muthiah Thiyagarajan
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Composition for Coating over a Photoresist Pattern Comprising a Lactam
- Publication number 20080248427
- Publication date Oct 9, 2008
- Muthiah Thiyagarajan
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Person

Patents Grantslast 30 patents

Composition comprising a polymeric thermal acid generator and proce...

Compositions of neutral layer for directed self assembly block copo...

Methods and materials for removing metals in block copolymers

Composition for coating over a photoresist pattern

Neutral layer polymer composition for directed self assembly and pr...

Compositions of neutral layer for directed self assembly block copo...

Methods and materials for removing metals in block copolymers

Composition for coating over a photoresist pattern comprising a lactam

Composition for coating over a photoresist pattern

Patents Applicationslast 30 patents

COMPOSITION COMPRISING A POLYMERIC THERMAL ACID GENERATOR AND PROCE...

COMPOSITIONS OF NEUTRAL LAYER FOR DIRECTED SELF ASSEMBLY BLOCK COPO...

METHODS AND MATERIALS FOR REMOVING METALS IN BLOCK COPOLYMERS

NEUTRAL LAYER POLYMER COMPOSITION FOR DIRECTED SELF ASSEMBLY AND PR...

METHODS AND MATERIALS FOR REMOVING METALS IN BLOCK COPOLYMERS

COMPOSITIONS OF NEUTRAL LAYER FOR DIRECTED SELF ASSEMBLY BLOCK COPO...

Composition for Coating over a Photoresist Pattern Comprising a Lactam

Composition for Coating over a Photoresist Pattern

Photoresist Image-forming Process Using Double Patterning

Composition for Coating over a Photoresist Pattern

Composition for Coating over a Photoresist Pattern Comprising a Lactam