YI ZHOU

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Chamber processes for reducing backside particles
- Patent number 11,702,738
- Issue date Jul 18, 2023
- Applied Materials, Inc.
- Yi Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated cleaning process for substrate etching
- Patent number 11,521,838
- Issue date Dec 6, 2022
- Applied Materials, Inc.
- Yi Zhou
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of non-destructive post tungsten etch residue removal
- Patent number 10,217,627
- Issue date Feb 26, 2019
- Applied Materials, Inc.
- Danny Chien Lu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate placement detection in semiconductor equipment using ther...
- Patent number 9,885,567
- Issue date Feb 6, 2018
- Applied Materials, Inc.
- Jared Ahmad Lee
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
INTEGRATED CLEANING PROCESS FOR SUBSTRATE ETCHING
- Publication number 20230086917
- Publication date Mar 23, 2023
- Applied Materials, Inc.
- Yi Zhou
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHAMBER PROCESSES FOR REDUCING BACKSIDE PARTICLES
- Publication number 20220364227
- Publication date Nov 17, 2022
- Applied Materials, Inc.
- Yi Zhou
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTEGRATED CLEANING PROCESS FOR SUBSTRATE ETCHING
- Publication number 20200194242
- Publication date Jun 18, 2020
- Applied Materials, Inc.
- Yi Zhou
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF NON-DESTRUCTIVE POST TUNGSTEN ETCH RESIDUE REMOVAL
- Publication number 20150096589
- Publication date Apr 9, 2015
- Applied Materials, Inc.
- Danny Chien LU
- B08 - CLEANING
Information Patent Application
SUBSTRATE PLACEMENT DETECTION IN SEMICONDUCTOR EQUIPMENT USING THER...
- Publication number 20150063405
- Publication date Mar 5, 2015
- Applied Materials, Inc.
- JARED AHMAD LEE
- G01 - MEASURING TESTING
Information Patent Application
POST ETCH TREATMENT TECHNOLOGY FOR ENHANCING PLASMA-ETCHED SILICON...
- Publication number 20150064880
- Publication date Mar 5, 2015
- Applied Materials, Inc.
- Jun Wan KIM
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Chamber processes for reducing backside particles

Integrated cleaning process for substrate etching

Methods of non-destructive post tungsten etch residue removal

Substrate placement detection in semiconductor equipment using ther...

Patents Applicationslast 30 patents

INTEGRATED CLEANING PROCESS FOR SUBSTRATE ETCHING

CHAMBER PROCESSES FOR REDUCING BACKSIDE PARTICLES

INTEGRATED CLEANING PROCESS FOR SUBSTRATE ETCHING

METHOD OF NON-DESTRUCTIVE POST TUNGSTEN ETCH RESIDUE REMOVAL

SUBSTRATE PLACEMENT DETECTION IN SEMICONDUCTOR EQUIPMENT USING THER...

POST ETCH TREATMENT TECHNOLOGY FOR ENHANCING PLASMA-ETCHED SILICON...