Yichuan Zhang

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Shanghai, CN

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Patents Grantslast 30 patents

Information Patent Grant
Plasma reactor for ultra-high aspect ratio etching and etching meth...
- Patent number 11,189,496
- Issue date Nov 30, 2021
- ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
- Gerald Zheyao Yin
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
LOWER ELECTRODE ASSEMBLY AND PLASMA PROCESSING DEVICE
- Publication number 20220246406
- Publication date Aug 4, 2022
- Advanced Micro-Fabrication Equipment Inc. China
- Yichuan ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA REACTOR FOR ULTRA-HIGH ASPECT RATIO ETCHING AND ETCHING METH...
- Publication number 20200251345
- Publication date Aug 6, 2020
- Advanced Micro-Fabrication Equipment Inc. China
- Gerald Zheyao Yin
- H01 - BASIC ELECTRIC ELEMENTS