Yim-Bun Patrick Kwan

Person

Aalen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Compensation of creep effects in an imaging device
- Patent number 11,703,770
- Issue date Jul 18, 2023
- Carl Zeiss SMT GmbH
- Eylem Bektas Knauf
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical imaging arrangement with a piezoelectric device
- Patent number 11,656,453
- Issue date May 23, 2023
- Carl Zeiss SMT GmbH
- Yim-Bun Patrick Kwan
- G02 - OPTICS
Information Patent Grant
Optical imaging arrangement with a piezoelectric device
- Patent number 10,732,402
- Issue date Aug 4, 2020
- Carl Zeiss SMT GmbH
- Yim-Bun Patrick Kwan
- G02 - OPTICS
Information Patent Grant
EUV exposure apparatus with reflective elements having reduced infl...
- Patent number 10,684,551
- Issue date Jun 16, 2020
- Carl Zeiss SMT GmbH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
EUV exposure apparatus with reflective elements having reduced infl...
- Patent number 10,317,802
- Issue date Jun 11, 2019
- Carl Zeiss SMT GmbH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Optical module for a microlithography objective holding optical ele...
- Patent number 10,197,925
- Issue date Feb 5, 2019
- Carl Zeiss SMT GmbH
- Jens Kugler
- G02 - OPTICS
Information Patent Grant
Optical apparatus with adjustable action of force on an optical module
- Patent number 10,175,581
- Issue date Jan 8, 2019
- Carl Zeiss SMT GmbH
- Yim-Bun Patrick Kwan
- G02 - OPTICS
Information Patent Grant
Diaphragm changing device
- Patent number 10,139,733
- Issue date Nov 27, 2018
- Carl Zeiss SMT GmbH
- Hermann Bieg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus with near-field manipulator
- Patent number 10,108,094
- Issue date Oct 23, 2018
- Carl Zeiss SMT GmbH
- Peter Deufel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Vibration-compensated optical system, lithography apparatus and method
- Patent number 10,095,120
- Issue date Oct 9, 2018
- Carl Zeiss SMT GmbH
- Yim-Bun Patrick Kwan
- G02 - OPTICS
Information Patent Grant
EUV exposure apparatus with reflective elements having reduced infl...
- Patent number 10,031,423
- Issue date Jul 24, 2018
- Carl Zeiss SMT GmbH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Optical imaging arrangement with multiple metrology support units
- Patent number 9,976,931
- Issue date May 22, 2018
- Carl Zeiss SMT GmbH
- Yim-Bun Patrick Kwan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical module for a microlithography objective holding optical ele...
- Patent number 9,977,228
- Issue date May 22, 2018
- Carl Zeiss SMT GmbH
- Jens Kugler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical apparatus for use in photolithography
- Patent number 9,933,707
- Issue date Apr 3, 2018
- Carl Zeiss SMT AG
- Yim-Bun Patrick Kwan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and device for monitoring multiple mirror arrays in an illum...
- Patent number 9,897,925
- Issue date Feb 20, 2018
- Carl Zeiss SMT GmbH
- Stefan Xalter
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical imaging arrangement with multiple metrology support units
- Patent number 9,891,534
- Issue date Feb 13, 2018
- Carl Zeiss SMT GmbH
- Yim-Bun Patrick Kwan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for controlling a motion of optical elements in lithography...
- Patent number 9,829,808
- Issue date Nov 28, 2017
- Carl Zeiss SMT GmbH
- Yim-Bun Patrick Kwan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical apparatus with adjustable action of force on an optical module
- Patent number 9,766,549
- Issue date Sep 19, 2017
- Carl Zeiss SMT GmbH
- Yim-Bun Patrick Kwan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV exposure apparatus with reflective elements having reduced infl...
- Patent number 9,746,778
- Issue date Aug 29, 2017
- Carl Zeiss SMT GmbH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Lens comprising a plurality of optical element disposed in a housing
- Patent number 9,551,940
- Issue date Jan 24, 2017
- Carl Zeiss SMT GmbH
- Yim-Bun Patrick Kwan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microlithographic projection exposure apparatus
- Patent number 9,535,336
- Issue date Jan 3, 2017
- Carl Zeiss SMT GmbH
- Sascha Bleidistel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical imaging arrangement with individually actively supported co...
- Patent number 9,477,092
- Issue date Oct 25, 2016
- Carl Zeiss SMT GmbH
- Yim-Bun Patrick Kwan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical arrangement and microlithographic projection exposure appar...
- Patent number 9,436,101
- Issue date Sep 6, 2016
- Carl Zeiss SMT GmbH
- Armin Schoeppach
- G02 - OPTICS
Information Patent Grant
Optical system for semiconductor lithography
- Patent number 9,383,544
- Issue date Jul 5, 2016
- Carl Zeiss SMT GmbH
- Frank Melzer
- G02 - OPTICS
Information Patent Grant
Optical element with low surface figure deformation
- Patent number 9,366,976
- Issue date Jun 14, 2016
- Carl Zeiss SMT GmbH
- Yim-Bun Patrick Kwan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV exposure apparatus with reflective elements having reduced infl...
- Patent number 9,316,929
- Issue date Apr 19, 2016
- Carl Zeiss SMT GmbH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Low-contamination optical arrangement
- Patent number 9,316,930
- Issue date Apr 19, 2016
- Carl Zeiss SMT GmbH
- Yim-Bun Patrick Kwan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical arrangement in a projection exposure apparatus for EUV lith...
- Patent number 9,298,111
- Issue date Mar 29, 2016
- Carl Zeiss SMT GmbH
- Viktor Kulitzki
- G02 - OPTICS
Information Patent Grant
Method and device for monitoring multiple mirror arrays in an illum...
- Patent number 9,239,229
- Issue date Jan 19, 2016
- Carl Zeiss SMT GmbH
- Stefan Xalter
- G01 - MEASURING TESTING
Information Patent Grant
Lens comprising a plurality of optical element disposed in a housing
- Patent number 9,097,985
- Issue date Aug 4, 2015
- Carl Zeiss SMT GmbH
- Yim-Bun Patrick Kwan
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
COMPENSATION OF CREEP EFFECTS IN AN IMAGING DEVICE
- Publication number 20210405359
- Publication date Dec 30, 2021
- Carl Zeiss SMT GMBH
- Eylem Bektas Knauf
- G02 - OPTICS
Information Patent Application
OPTICAL IMAGING ARRANGEMENT WITH A PIEZOELECTRIC DEVICE
- Publication number 20200363628
- Publication date Nov 19, 2020
- Carl Zeiss SMT GMBH
- Yim-Bun Patrick Kwan
- G02 - OPTICS
Information Patent Application
EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...
- Publication number 20190310555
- Publication date Oct 10, 2019
- Carl Zeiss SMT GMBH
- Norman Baer
- G02 - OPTICS
Information Patent Application
OPTICAL MODULE FOR A MICROLITHOGRAPHY OBJECTIVE HOLDING OPTICAL ELE...
- Publication number 20180373007
- Publication date Dec 27, 2018
- Carl Zeiss SMT GMBH
- Jens Kugler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...
- Publication number 20180299784
- Publication date Oct 18, 2018
- Carl Zeiss SMT GMBH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Application
OPTICAL APPARATUS FOR USE IN PHOTOLITHOGRAPHY
- Publication number 20180275526
- Publication date Sep 27, 2018
- Carl Zeiss SMT GMBH
- Yim-Bun Patrick Kwan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...
- Publication number 20180246415
- Publication date Aug 30, 2018
- Carl Zeiss SMT GMBH
- Stefan Xalter
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
OPTICAL IMAGING ARRANGEMENT WITH A PIEZOELECTRIC DEVICE
- Publication number 20180196253
- Publication date Jul 12, 2018
- Carl Zeiss SMT GMBH
- Yim-Bun Patrick Kwan
- G02 - OPTICS
Information Patent Application
OPTICAL APPARATUS WITH ADJUSTABLE ACTION OF FORCE ON AN OPTICAL MODULE
- Publication number 20180129138
- Publication date May 10, 2018
- Carl Zeiss SMT GMBH
- Yim-Bun Patrick Kwan
- G02 - OPTICS
Information Patent Application
EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...
- Publication number 20170315449
- Publication date Nov 2, 2017
- Carl Zeiss SMT GMBH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Application
LENS COMPRISING A PLURALITY OF OPTICAL ELEMENT DISPOSED IN A HOUSING
- Publication number 20170199465
- Publication date Jul 13, 2017
- Carl Zeiss SMT GMBH
- Yim-Bun Patrick Kwan
- G02 - OPTICS
Information Patent Application
PROJECTION EXPOSURE APPARATUS WITH NEAR-FIELD MANIPULATOR
- Publication number 20170052453
- Publication date Feb 23, 2017
- Carl Zeiss SMT GMBH
- Peter Deufel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL IMAGING ARRANGEMENT WITH MULTIPLE METROLOGY SUPPORT UNITS
- Publication number 20170017164
- Publication date Jan 19, 2017
- Carl Zeiss SMT GMBH
- Yim-Bun Patrick Kwan
- G02 - OPTICS
Information Patent Application
VIBRATION-COMPENSATED OPTICAL SYSTEM, LITHOGRAPHY APPARATUS AND METHOD
- Publication number 20160349623
- Publication date Dec 1, 2016
- Carl Zeiss SMT GMBH
- Yim-Bun Patrick Kwan
- G02 - OPTICS
Information Patent Application
DIAPHRAGM CHANGING DEVICE
- Publication number 20160282724
- Publication date Sep 29, 2016
- Carl Zeiss SMT GMBH
- Hermann Bieg
- G02 - OPTICS
Information Patent Application
METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...
- Publication number 20160266502
- Publication date Sep 15, 2016
- Carl Zeiss SMT GMBH
- Stefan Xalter
- G01 - MEASURING TESTING
Information Patent Application
EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...
- Publication number 20160195818
- Publication date Jul 7, 2016
- Carl Zeiss SMT GMBH
- Norman Baer
- G02 - OPTICS
Information Patent Application
LENS COMPRISING A PLURALITY OF OPTICAL ELEMENT DISPOSED IN A HOUSING
- Publication number 20160041473
- Publication date Feb 11, 2016
- Carl Zeiss SMT GMBH
- Yim-Bun Patrick Kwan
- G02 - OPTICS
Information Patent Application
METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...
- Publication number 20150300807
- Publication date Oct 22, 2015
- Carl Zeiss SMT GMBH
- Stefan Xalter
- G01 - MEASURING TESTING
Information Patent Application
OPTICAL APPARATUS WITH ADJUSTABLE ACTION OF FORCE ON AN OPTICAL MODULE
- Publication number 20150227055
- Publication date Aug 13, 2015
- Carl Zeiss SMT GMBH
- Yim-Bun Patrick Kwan
- G02 - OPTICS
Information Patent Application
OPTICAL IMAGING ARRANGEMENT WITH MULTIPLE METROLOGY SUPPORT UNITS
- Publication number 20150062596
- Publication date Mar 5, 2015
- Carl Zeiss SMT GMBH
- Yim-Bun Patrick Kwan
- G01 - MEASURING TESTING
Information Patent Application
MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20140333912
- Publication date Nov 13, 2014
- Carl Zeiss SMT GMBH
- Sascha Bleidistel
- G02 - OPTICS
Information Patent Application
LENS COMPRISING A PLURALITY OF OPTICAL ELEMENT DISPOSED IN A HOUSING
- Publication number 20140293253
- Publication date Oct 2, 2014
- Carl Zeiss SMT GMBH
- Yim-Bun Patrick Kwan
- G02 - OPTICS
Information Patent Application
OPTICAL MODULE FOR A MICROLITHOGRAPHY OBJECTIVE HOLDING AND SUPPORT...
- Publication number 20140268381
- Publication date Sep 18, 2014
- Carl Zeiss SMT GMBH
- Jens Kugler
- G02 - OPTICS
Information Patent Application
OPTICAL MODULE FOR AN OBJECTIVE
- Publication number 20140254036
- Publication date Sep 11, 2014
- Carl Zeiss SMT GMBH
- Jens Kugler
- G02 - OPTICS
Information Patent Application
METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...
- Publication number 20140233006
- Publication date Aug 21, 2014
- Stefan Xalter
- G02 - OPTICS
Information Patent Application
METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...
- Publication number 20140226141
- Publication date Aug 14, 2014
- Carl Zeiss SMT GMBH
- Stefan Xalter
- G02 - OPTICS
Information Patent Application
METHOD FOR CONTROLLING A MOTION OF OPTICAL ELEMENTS IN LITHOGRAPHY...
- Publication number 20140204354
- Publication date Jul 24, 2014
- Yim-Bun Patrick Kwan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL IMAGING ARRANGEMENT WITH VIBRATION DECOUPLED SUPPORT UNITS
- Publication number 20140185029
- Publication date Jul 3, 2014
- Yim-Bun Patrick Kwan
- G02 - OPTICS
Information Patent Application
EUV Exposure Apparatus
- Publication number 20130141707
- Publication date Jun 6, 2013
- ASML NETHERLANDS B.V.
- Norman Baer
- B82 - NANO-TECHNOLOGY

Yim-Bun Patrick Kwan

Person

Patents Grantslast 30 patents

Compensation of creep effects in an imaging device

Optical imaging arrangement with a piezoelectric device

Optical imaging arrangement with a piezoelectric device

EUV exposure apparatus with reflective elements having reduced infl...

EUV exposure apparatus with reflective elements having reduced infl...

Optical module for a microlithography objective holding optical ele...

Optical apparatus with adjustable action of force on an optical module

Diaphragm changing device

Projection exposure apparatus with near-field manipulator

Vibration-compensated optical system, lithography apparatus and method

EUV exposure apparatus with reflective elements having reduced infl...

Optical imaging arrangement with multiple metrology support units

Optical module for a microlithography objective holding optical ele...

Optical apparatus for use in photolithography

Method and device for monitoring multiple mirror arrays in an illum...

Optical imaging arrangement with multiple metrology support units

Method for controlling a motion of optical elements in lithography...

Optical apparatus with adjustable action of force on an optical module

EUV exposure apparatus with reflective elements having reduced infl...

Lens comprising a plurality of optical element disposed in a housing

Microlithographic projection exposure apparatus

Optical imaging arrangement with individually actively supported co...

Optical arrangement and microlithographic projection exposure appar...

Optical system for semiconductor lithography

Optical element with low surface figure deformation

EUV exposure apparatus with reflective elements having reduced infl...

Low-contamination optical arrangement

Optical arrangement in a projection exposure apparatus for EUV lith...

Method and device for monitoring multiple mirror arrays in an illum...

Lens comprising a plurality of optical element disposed in a housing

Patents Applicationslast 30 patents

COMPENSATION OF CREEP EFFECTS IN AN IMAGING DEVICE

OPTICAL IMAGING ARRANGEMENT WITH A PIEZOELECTRIC DEVICE

EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...

OPTICAL MODULE FOR A MICROLITHOGRAPHY OBJECTIVE HOLDING OPTICAL ELE...

EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...

OPTICAL APPARATUS FOR USE IN PHOTOLITHOGRAPHY

METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...

OPTICAL IMAGING ARRANGEMENT WITH A PIEZOELECTRIC DEVICE

OPTICAL APPARATUS WITH ADJUSTABLE ACTION OF FORCE ON AN OPTICAL MODULE

EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...

LENS COMPRISING A PLURALITY OF OPTICAL ELEMENT DISPOSED IN A HOUSING

PROJECTION EXPOSURE APPARATUS WITH NEAR-FIELD MANIPULATOR

OPTICAL IMAGING ARRANGEMENT WITH MULTIPLE METROLOGY SUPPORT UNITS

VIBRATION-COMPENSATED OPTICAL SYSTEM, LITHOGRAPHY APPARATUS AND METHOD

DIAPHRAGM CHANGING DEVICE

METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...

EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...

LENS COMPRISING A PLURALITY OF OPTICAL ELEMENT DISPOSED IN A HOUSING

METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...

OPTICAL APPARATUS WITH ADJUSTABLE ACTION OF FORCE ON AN OPTICAL MODULE

OPTICAL IMAGING ARRANGEMENT WITH MULTIPLE METROLOGY SUPPORT UNITS

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

LENS COMPRISING A PLURALITY OF OPTICAL ELEMENT DISPOSED IN A HOUSING

OPTICAL MODULE FOR A MICROLITHOGRAPHY OBJECTIVE HOLDING AND SUPPORT...

OPTICAL MODULE FOR AN OBJECTIVE

METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...

METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...

METHOD FOR CONTROLLING A MOTION OF OPTICAL ELEMENTS IN LITHOGRAPHY...

OPTICAL IMAGING ARRANGEMENT WITH VIBRATION DECOUPLED SUPPORT UNITS

EUV Exposure Apparatus