Yiming GU

Person

Shanghai, CN

People

Patents Grantslast 30 patents

Information Patent Grant
Cylindrical reticle system, exposure apparatus and exposure method
- Patent number 9,323,163
- Issue date Apr 26, 2016
- Semiconductor Manufacturing International (Shanghai) Corporation
- Qiang Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus and exposure method thereof
- Patent number 9,298,099
- Issue date Mar 29, 2016
- Semiconductor Manufacturing International (Shanghai) Corporation
- Qiang Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure device and exposure method
- Patent number 9,223,229
- Issue date Dec 29, 2015
- Semiconductor Manufacturing International Corp
- Qiang Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography machine and scanning and exposing method thereof
- Patent number 9,134,624
- Issue date Sep 15, 2015
- Semiconductor Manufacturing International Corp
- Qiang Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method, optical module and auto-focusing system for wafer edge expo...
- Patent number 9,081,149
- Issue date Jul 14, 2015
- Semiconductor Manufacturing International (Beijing) Corporation
- Qiang Wu
- G02 - OPTICS
Information Patent Grant
Method of forming double pattern in a structure
- Patent number 9,070,557
- Issue date Jun 30, 2015
- Semiconductor Manufacturing International Corp
- Daniel Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photolithographic apparatus
- Patent number 8,982,314
- Issue date Mar 17, 2015
- Semiconductor Manufacturing International (Beijing) Corporation
- Qiang Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming double patterned structure
- Patent number 8,853,093
- Issue date Oct 7, 2014
- Semiconductor Manufacturing International Corp
- Daniel Hu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
DEEP-SEA SOUND SOURCE LOCALIZATION METHOD, COMPUTER DEVICE, AND STO...
- Publication number 20250147145
- Publication date May 8, 2025
- INSTITUTE OF ACOUSTICS, CHINESE ACADEMY OF SCIENCES
- Jixing QIN
- G01 - MEASURING TESTING
Information Patent Application
CYLINDRICAL RETICLE SYSTEM, EXPOSURE APPARATUS AND EXPOSURE METHOD
- Publication number 20140253895
- Publication date Sep 11, 2014
- Semiconductor Manufacturing International (Shanghai) Corporation
- QIANG WU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS AND EXPOSURE METHOD THEREOF
- Publication number 20140253896
- Publication date Sep 11, 2014
- Semiconductor Manufacturing International (Shanghai) Corporation
- QIANG WU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE DEVICE AND EXPOSURE METHOD
- Publication number 20140063480
- Publication date Mar 6, 2014
- SEMICONDUCTOR MANUFACTURING INTERNATIONAL CORP.
- Qiang WU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR STRUCTURE AND FABRICATION METHOD
- Publication number 20130234302
- Publication date Sep 12, 2013
- SEMICONDUCTOR MANUFACTURING INTERNATIONAL CORP.
- DANIEL HU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE AND FABRICATION METHOD
- Publication number 20130234294
- Publication date Sep 12, 2013
- SEMICONDUCTOR MANUFACTURING INTERNATIONAL CORP.
- DANIEL HU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LITHOGRAPHY MACHINE AND SCANNING AND EXPOSING METHOD THEREOF
- Publication number 20130169946
- Publication date Jul 4, 2013
- SEMICONDUCTOR MANUFACTURING INTERNATIONAL CORP.
- Qiang WU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTO-RESIST AND METHOD OF PHOTOLITHOGRAPHY
- Publication number 20130084526
- Publication date Apr 4, 2013
- Semiconductor Manufacturing International (Beijing) Corporaiton
- Qiang Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD, OPTICAL MODULE AND AUTO-FOCUSING SYSTEM FOR WAFER EDGE EXPO...
- Publication number 20130083305
- Publication date Apr 4, 2013
- Semiconductor Manufacturing International (Beijing) Corporation
- Qiang WU
- G02 - OPTICS
Information Patent Application
PHOTOLITHOGRAPHIC APPARATUS
- Publication number 20130083302
- Publication date Apr 4, 2013
- Semiconductor Manufacturing International (Beijing) Corporation
- Qiang WU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Person

Patents Grantslast 30 patents

Cylindrical reticle system, exposure apparatus and exposure method

Exposure apparatus and exposure method thereof

Exposure device and exposure method

Lithography machine and scanning and exposing method thereof

Method, optical module and auto-focusing system for wafer edge expo...

Method of forming double pattern in a structure

Photolithographic apparatus

Method for forming double patterned structure

Patents Applicationslast 30 patents

DEEP-SEA SOUND SOURCE LOCALIZATION METHOD, COMPUTER DEVICE, AND STO...

CYLINDRICAL RETICLE SYSTEM, EXPOSURE APPARATUS AND EXPOSURE METHOD

EXPOSURE APPARATUS AND EXPOSURE METHOD THEREOF

EXPOSURE DEVICE AND EXPOSURE METHOD

SEMICONDUCTOR STRUCTURE AND FABRICATION METHOD

SEMICONDUCTOR STRUCTURE AND FABRICATION METHOD

LITHOGRAPHY MACHINE AND SCANNING AND EXPOSING METHOD THEREOF

PHOTO-RESIST AND METHOD OF PHOTOLITHOGRAPHY

METHOD, OPTICAL MODULE AND AUTO-FOCUSING SYSTEM FOR WAFER EDGE EXPO...

PHOTOLITHOGRAPHIC APPARATUS