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Yingfang WANG

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  • Shanghai, CN
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Patents Grantslast 30 patents

  • Information Patent Grant

    Mask and method for correcting mask patterns
    • Patent number 11,520,225
    • Issue date Dec 6, 2022
    • Semiconductor Manufacturing International (Shanghai) Corporation
    • Feng Bai
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

  • Information Patent Application

    OPC MODELING METHOD
    • Publication number 20240192609
    • Publication date Jun 13, 2024
    • HeFeChip Corporation Limited
    • Yinuo PAN
    • G06 - COMPUTING CALCULATING COUNTING
  • Information Patent Application

    MASK AND METHOD FOR CORRECTING MASK PATTERNS
    • Publication number 20210208499
    • Publication date Jul 8, 2021
    • Semiconductor Manufacturing International (Shanghai) Corporation
    • Feng BAI
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY