Yiwen FAN

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Photoresist development with halide chemistries
- Patent number 12,105,422
- Issue date Oct 1, 2024
- Lam Research Corporation
- Samantha Siamhwa Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Atomic layer etching for subtractive metal etch
- Patent number 11,935,758
- Issue date Mar 19, 2024
- Lam Research Corporation
- Wenbing Yang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES
- Publication number 20240419078
- Publication date Dec 19, 2024
- LAM RESEARCH CORPORATION
- Samantha SiamHwa Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES
- Publication number 20240361696
- Publication date Oct 31, 2024
- LAM RESEARCH CORPORATION
- Samantha SiamHwa Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ATOMIC LAYER ETCHING FOR SUBTRACTIVE METAL ETCH
- Publication number 20240186150
- Publication date Jun 6, 2024
- LAM RESEARCH CORPORATION
- Wenbing YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL ETCH
- Publication number 20240021435
- Publication date Jan 18, 2024
- LAM RESEARCH CORPORATION
- Yiwen FAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CLEANING A CHAMBER
- Publication number 20230230819
- Publication date Jul 20, 2023
- LAM RESEARCH CORPORATION
- Ran LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL ETCH NONVOLATILE MATERIALS FOR MRAM PATTERNING
- Publication number 20220376174
- Publication date Nov 24, 2022
- LAM RESEARCH CORPORATION
- Wenbing YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES
- Publication number 20220244645
- Publication date Aug 4, 2022
- LAM RESEARCH CORPORATION
- Samantha SiamHwa Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ATOMIC LAYER ETCHING FOR SUBTRACTIVE METAL ETCH
- Publication number 20220199422
- Publication date Jun 23, 2022
- LAM RESEARCH CORPORATION
- Wenbing YANG
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Photoresist development with halide chemistries

Atomic layer etching for subtractive metal etch

Patents Applicationslast 30 patents

PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES

PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES

ATOMIC LAYER ETCHING FOR SUBTRACTIVE METAL ETCH

METAL ETCH

METHOD FOR CLEANING A CHAMBER

CHEMICAL ETCH NONVOLATILE MATERIALS FOR MRAM PATTERNING

PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES

ATOMIC LAYER ETCHING FOR SUBTRACTIVE METAL ETCH