Yixiong Zheng

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Amherst, NY, US

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Patents Grantslast 30 patents

Information Patent Grant
Deep etching substrates using a bi-layer etch mask
- Patent number 11,886,122
- Issue date Jan 30, 2024
- Fraunhofer USA, Inc.
- Jung-Hun Seo
- B81 - MICRO-STRUCTURAL TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
DEEP ETCHING SUBSTRATES USING A BI-LAYER ETCH MASK
- Publication number 20220413389
- Publication date Dec 29, 2022
- Fraunhofer USA, Inc.
- Jung-Hun Seo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY