Yogananda Sarode Vishwanath

Person

Karnataka, IN

People

Patents Grantslast 30 patents

Information Patent Grant
Metal oxide preclean chamber with improved selectivity and flow con...
- Patent number 12,100,576
- Issue date Sep 24, 2024
- Applied Materials, Inc.
- Andrew Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Detector for process kit ring wear
- Patent number 11,913,777
- Issue date Feb 27, 2024
- Applied Materials, Inc.
- Yogananda Sarode Vishwanath
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric flow valve for flow conductance control
- Patent number 11,835,146
- Issue date Dec 5, 2023
- Applied Materials, Inc.
- Andrew Nguyen
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Grant
Symmetric flow valve for higher flow conductance
- Patent number 11,199,267
- Issue date Dec 14, 2021
- Applied Materials, Inc.
- Andrew Nguyen
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Grant
Apparatus for removing particles from a twin chamber processing system
- Patent number 10,672,591
- Issue date Jun 2, 2020
- Applied Materials, Inc.
- Andrew Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Symmetrical inductively coupled plasma source with side RF feeds an...
- Patent number 9,449,794
- Issue date Sep 20, 2016
- Applied Materials, Inc.
- Andrew Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor system assemblies and methods of operation
- Patent number 9,287,095
- Issue date Mar 15, 2016
- Applied Materials, Inc.
- Andrew Nguyen
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR PROCESSING CHAMBER LID AND COATING
- Publication number 20240344199
- Publication date Oct 17, 2024
- Applied Materials, Inc.
- Yogananda Sarode Vishwanath
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DETECTOR FOR PROCESS KIT RING WEAR
- Publication number 20240183656
- Publication date Jun 6, 2024
- Applied Materials, Inc.
- Yogananda Sarode Vishwanath
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYMMETRIC FLOW VALVE FOR FLOW CONDUCTANCE CONTROL
- Publication number 20220090686
- Publication date Mar 24, 2022
- Andrew NGUYEN
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Application
METAL OXIDE PRECLEAN CHAMBER WITH IMPROVED SELECTIVITY AND FLOW CON...
- Publication number 20210343508
- Publication date Nov 4, 2021
- Applied Materials, Inc.
- Andrew NGUYEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
IN SITU FAILURE DETECTION IN SEMICONDUCTOR PROCESSING CHAMBERS
- Publication number 20210175103
- Publication date Jun 10, 2021
- Applied Materials, Inc.
- Srivatsa Madananth
- G01 - MEASURING TESTING
Information Patent Application
SYMMETRIC FLOW VALVE FOR HIGHER FLOW CONDUCTANCE
- Publication number 20210048108
- Publication date Feb 18, 2021
- Applied Materials, Inc.
- Andrew Nguyen
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Application
DETECTOR FOR PROCESS KIT RING WEAR
- Publication number 20200393242
- Publication date Dec 17, 2020
- Applied Materials, Inc.
- Yogananda Sarode Vishwanath
- G01 - MEASURING TESTING
Information Patent Application
SEMICONDUCTOR PLASMA PROCESSING EQUIPMENT WITH WAFER EDGE PLASMA SH...
- Publication number 20200234928
- Publication date Jul 23, 2020
- Applied Materials, Inc.
- Yogananda Sarode VISHWANATH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR SUBSTRATE PROCESSING APPARATUS AND METHOD
- Publication number 20190341233
- Publication date Nov 7, 2019
- Applied Materials, Inc.
- Andrew Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR SYSTEM ASSEMBLIES AND METHODS OF OPERATION
- Publication number 20160217981
- Publication date Jul 28, 2016
- Applied Materials, Inc.
- Andrew Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR SYSTEM ASSEMBLIES AND METHODS OF OPERATION
- Publication number 20150170924
- Publication date Jun 18, 2015
- Applied Materials, Inc.
- Andrew Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR SYSTEM ASSEMBLIES AND METHODS OF OPERATION
- Publication number 20150170879
- Publication date Jun 18, 2015
- Applied Materials, Inc.
- Andrew Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR REMOVING PARTICLES FROM A TWIN CHAMBER PROCESSING SYSTEM
- Publication number 20140374024
- Publication date Dec 25, 2014
- Applied Materials, Inc.
- ANDREW NGUYEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND METHODS FOR REDUCING PARTICLES IN SEMICONDUCTOR PROCE...
- Publication number 20140272211
- Publication date Sep 18, 2014
- Andrew NGUYEN
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
SYMMETRICAL INDUCTIVELY COUPLED PLASMA SOURCE WITH SIDE RF FEEDS AN...
- Publication number 20140232263
- Publication date Aug 21, 2014
- Applied Materials, Inc.
- Andrew Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Yogananda Sarode Vishwanath

Person

Patents Grantslast 30 patents

Metal oxide preclean chamber with improved selectivity and flow con...

Detector for process kit ring wear

Symmetric flow valve for flow conductance control

Symmetric flow valve for higher flow conductance

Apparatus for removing particles from a twin chamber processing system

Symmetrical inductively coupled plasma source with side RF feeds an...

Semiconductor system assemblies and methods of operation

Patents Applicationslast 30 patents

SEMICONDUCTOR PROCESSING CHAMBER LID AND COATING

DETECTOR FOR PROCESS KIT RING WEAR

SYMMETRIC FLOW VALVE FOR FLOW CONDUCTANCE CONTROL

METAL OXIDE PRECLEAN CHAMBER WITH IMPROVED SELECTIVITY AND FLOW CON...

IN SITU FAILURE DETECTION IN SEMICONDUCTOR PROCESSING CHAMBERS

SYMMETRIC FLOW VALVE FOR HIGHER FLOW CONDUCTANCE

DETECTOR FOR PROCESS KIT RING WEAR

SEMICONDUCTOR PLASMA PROCESSING EQUIPMENT WITH WAFER EDGE PLASMA SH...

SEMICONDUCTOR SUBSTRATE PROCESSING APPARATUS AND METHOD

SEMICONDUCTOR SYSTEM ASSEMBLIES AND METHODS OF OPERATION

SEMICONDUCTOR SYSTEM ASSEMBLIES AND METHODS OF OPERATION

SEMICONDUCTOR SYSTEM ASSEMBLIES AND METHODS OF OPERATION

APPARATUS FOR REMOVING PARTICLES FROM A TWIN CHAMBER PROCESSING SYSTEM

APPARATUS AND METHODS FOR REDUCING PARTICLES IN SEMICONDUCTOR PROCE...

SYMMETRICAL INDUCTIVELY COUPLED PLASMA SOURCE WITH SIDE RF FEEDS AN...