Yohei IKEBE

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Reflective mask blank and reflective mask
- Patent number 12,135,496
- Issue date Nov 5, 2024
- Hoya Corporation
- Yohei Ikebe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, reflective mask and manufacturing method the...
- Patent number 12,111,566
- Issue date Oct 8, 2024
- Hoya Corporation
- Yohei Ikebe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, reflective mask, method of manufacturing ref...
- Patent number 12,105,413
- Issue date Oct 1, 2024
- Hoya Corporation
- Yohei Ikebe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, reflective mask, and method for manufacturin...
- Patent number 11,914,281
- Issue date Feb 27, 2024
- Hoya Corporation
- Yohei Ikebe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, reflective mask and method of manufacturing...
- Patent number 11,892,768
- Issue date Feb 6, 2024
- Hoya Corporation
- Mizuki Kataoka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, reflective mask and method of manufacturing...
- Patent number 11,880,130
- Issue date Jan 23, 2024
- Hoya Corporation
- Yohei Ikebe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, reflective mask and manufacturing method the...
- Patent number 11,815,806
- Issue date Nov 14, 2023
- Hoya Corporation
- Yohei Ikebe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, reflective mask, method of manufacturing ref...
- Patent number 11,815,807
- Issue date Nov 14, 2023
- Hoya Corporation
- Yohei Ikebe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, reflective mask, method of manufacturing ref...
- Patent number 11,550,215
- Issue date Jan 10, 2023
- Hoya Corporation
- Yohei Ikebe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, reflective mask and manufacturing method the...
- Patent number 11,531,264
- Issue date Dec 20, 2022
- Hoya Corporation
- Yohei Ikebe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, reflective mask and method of manufacturing...
- Patent number 11,480,867
- Issue date Oct 25, 2022
- Hoya Corporation
- Yohei Ikebe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate with a multilayer reflective film, reflective mask blank,...
- Patent number 11,281,090
- Issue date Mar 22, 2022
- Hoya Corporation
- Kazuhiro Hamamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, reflective mask, method of manufacturing sam...
- Patent number 11,249,385
- Issue date Feb 15, 2022
- Hoya Corporation
- Yohei Ikebe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, reflective mask and manufacturing method the...
- Patent number 11,237,472
- Issue date Feb 1, 2022
- Hoya Corporation
- Yohei Ikebe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, method of manufacturing reflective mask and...
- Patent number 11,187,972
- Issue date Nov 30, 2021
- Hoya Corporation
- Yohei Ikebe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for manufacturing reflective mask blank, and method for manu...
- Patent number 11,131,921
- Issue date Sep 28, 2021
- Hoya Corporation
- Tsutomu Shoki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Reflective mask blank, reflective mask and method of manufacturing...
- Patent number 11,003,068
- Issue date May 11, 2021
- Hoya Corporation
- Yohei Ikebe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank substrate, substrate with multilayer reflective film, re...
- Patent number 10,921,705
- Issue date Feb 16, 2021
- Hoya Corporation
- Yohei Ikebe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, reflective mask and method of manufacturing...
- Patent number 10,871,707
- Issue date Dec 22, 2020
- Hoya Corporation
- Yohei Ikebe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, reflective mask and method of manufacturing...
- Patent number 10,642,149
- Issue date May 5, 2020
- Hoya Corporation
- Kazuhiro Hamamoto
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Mask blank substrate, multi-layer reflective film coated substrate,...
- Patent number 10,578,961
- Issue date Mar 3, 2020
- Hoya Corporation
- Yohei Ikebe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reflective mask blank, reflective mask, method for manufacturing re...
- Patent number 10,481,484
- Issue date Nov 19, 2019
- Hoya Corporation
- Yohei Ikebe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Reflective mask blank, reflective mask and method of manufacturing...
- Patent number 10,394,113
- Issue date Aug 27, 2019
- Hoya Corporation
- Kazuhiro Hamamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for manufacturing reflective mask blank, and method for manu...
- Patent number 10,067,419
- Issue date Sep 4, 2018
- Hoya Corporation
- Tsutomu Shoki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Reflective mask blank, reflective mask, and method for manufacturin...
- Patent number 9,864,267
- Issue date Jan 9, 2018
- Hoya Corporation
- Yohei Ikebe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...
- Publication number 20240393675
- Publication date Nov 28, 2024
- HOYA CORPORATION
- Yohei IKEBE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE WITH MULTILAYER REFLECTIVE FILM REFLECTIVE MASK BLANK, RE...
- Publication number 20240377719
- Publication date Nov 14, 2024
- HOYA CORPORATION
- Teiichiro UMEZAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD OF MANUFACTURING...
- Publication number 20240319577
- Publication date Sep 26, 2024
- HOYA CORPORATION
- Hitoshi MAEDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, REFLECTIVE MASK, AND METHOD FOR PRODUCING SEMICONDUCTOR...
- Publication number 20240231216
- Publication date Jul 11, 2024
- HOYA CORPORATION
- Takuro ONO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, REFLECTIVE MASK, AND METHOD FOR PRODUCING SEMICONDUCTOR...
- Publication number 20240184193
- Publication date Jun 6, 2024
- HOYA CORPORATION
- Yohei IKEBE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK AND REFLECTIVE MASK
- Publication number 20240103354
- Publication date Mar 28, 2024
- HOYA CORPORATION
- Yohei IKEBE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK AND METHOD FOR MANUFACTURING...
- Publication number 20240103355
- Publication date Mar 28, 2024
- HOYA CORPORATION
- Yohei IKEBE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, REFLECTIVE MASK MANUFACTURI...
- Publication number 20240069428
- Publication date Feb 29, 2024
- HOYA CORPORATION
- Yohei IKEBE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...
- Publication number 20240036458
- Publication date Feb 1, 2024
- HOYA CORPORATION
- Yohei IKEBE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK AND MANUFACTURING METHOD THE...
- Publication number 20240036457
- Publication date Feb 1, 2024
- HOYA CORPORATION
- Yohei IKEBE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURIN...
- Publication number 20230333459
- Publication date Oct 19, 2023
- HOYA CORPORATION
- Yohei IKEBE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK AND METHOD OF MANUFACTURING...
- Publication number 20230244135
- Publication date Aug 3, 2023
- HOYA CORPORATION
- Yohei IKEBE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK AND MANUFACTURING METHOD THE...
- Publication number 20230168575
- Publication date Jun 1, 2023
- HOYA CORPORATION
- Yohei IKEBE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...
- Publication number 20230087016
- Publication date Mar 23, 2023
- HOYA CORPORATION
- Yohei IKEBE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD OF MANUFACTURING...
- Publication number 20230076438
- Publication date Mar 9, 2023
- HOYA CORPORATION
- Ikuya FUKASAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURIN...
- Publication number 20220390826
- Publication date Dec 8, 2022
- HOYA CORPORATION
- Yohei IKEBE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD FOR PRODUCING SAME,...
- Publication number 20220121102
- Publication date Apr 21, 2022
- HOYA CORPORATION
- Tsutomu SHOKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK AND METHOD FOR PRODUCING SEM...
- Publication number 20220107557
- Publication date Apr 7, 2022
- HOYA CORPORATION
- Yohei IKEBE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK AND METHOD FOR MANUFACTURING...
- Publication number 20210311382
- Publication date Oct 7, 2021
- HOYA CORPORATION
- Mizuki KATAOKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK AND METHOD OF MANUFACTURING...
- Publication number 20210255536
- Publication date Aug 19, 2021
- HOYA CORPORATION
- Yohei IKEBE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHODS FOR PRODUCING R...
- Publication number 20210223681
- Publication date Jul 22, 2021
- HOYA CORPORATION
- Yohei IKEBE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, PRODUCTION METHOD THEREFOR,...
- Publication number 20210208498
- Publication date Jul 8, 2021
- HOYA CORPORATION
- Yohei IKEBE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK AND METHOD FOR PRODUCING SAM...
- Publication number 20200371421
- Publication date Nov 26, 2020
- HOYA CORPORATION
- Yohei IKEBE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE EQUIPPED WITH MULTI-LAYER REFLECTION FILM, REFLECTION-TYP...
- Publication number 20200310239
- Publication date Oct 1, 2020
- HOYA CORPORATION
- Kazuhiro HAMAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK AND MANUFACTURING METHOD THE...
- Publication number 20190384157
- Publication date Dec 19, 2019
- HOYA CORPORATION
- Yohei IKEBE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK AND METHOD OF MANUFACTURING...
- Publication number 20190384158
- Publication date Dec 19, 2019
- HOYA CORPORATION
- Yohei IKEBE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE WITH CONDUCTIVE FILM, SUBSTRATE WITH MULTILAYER REFLECTIV...
- Publication number 20190369483
- Publication date Dec 5, 2019
- HOYA CORPORATION
- Yohei IKEBE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING SAM...
- Publication number 20190361338
- Publication date Nov 28, 2019
- HOYA CORPORATION
- Yohei IKEBE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK AND METHOD OF MANUFACTURING...
- Publication number 20190339608
- Publication date Nov 7, 2019
- HOYA CORPORATION
- Kazuhiro HAMAMOTO
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
REFLECTIVE MASK BLANK, METHOD OF MANUFACTURING REFLECTIVE MASK AND...
- Publication number 20190265585
- Publication date Aug 29, 2019
- HOYA CORPORATION
- Yohei IKEBE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Yohei IKEBE

Person

Patents Grantslast 30 patents

Reflective mask blank and reflective mask

Reflective mask blank, reflective mask and manufacturing method the...

Reflective mask blank, reflective mask, method of manufacturing ref...

Reflective mask blank, reflective mask, and method for manufacturin...

Reflective mask blank, reflective mask and method of manufacturing...

Reflective mask blank, reflective mask and method of manufacturing...

Reflective mask blank, reflective mask and manufacturing method the...

Reflective mask blank, reflective mask, method of manufacturing ref...

Reflective mask blank, reflective mask, method of manufacturing ref...

Reflective mask blank, reflective mask and manufacturing method the...

Reflective mask blank, reflective mask and method of manufacturing...

Substrate with a multilayer reflective film, reflective mask blank,...

Reflective mask blank, reflective mask, method of manufacturing sam...

Reflective mask blank, reflective mask and manufacturing method the...

Reflective mask blank, method of manufacturing reflective mask and...

Method for manufacturing reflective mask blank, and method for manu...

Reflective mask blank, reflective mask and method of manufacturing...

Mask blank substrate, substrate with multilayer reflective film, re...

Reflective mask blank, reflective mask and method of manufacturing...

Reflective mask blank, reflective mask and method of manufacturing...

Mask blank substrate, multi-layer reflective film coated substrate,...

Reflective mask blank, reflective mask, method for manufacturing re...

Reflective mask blank, reflective mask and method of manufacturing...

Method for manufacturing reflective mask blank, and method for manu...

Reflective mask blank, reflective mask, and method for manufacturin...

Patents Applicationslast 30 patents

REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...

SUBSTRATE WITH MULTILAYER REFLECTIVE FILM REFLECTIVE MASK BLANK, RE...

REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD OF MANUFACTURING...

MASK BLANK, REFLECTIVE MASK, AND METHOD FOR PRODUCING SEMICONDUCTOR...

MASK BLANK, REFLECTIVE MASK, AND METHOD FOR PRODUCING SEMICONDUCTOR...

REFLECTIVE MASK BLANK AND REFLECTIVE MASK

REFLECTIVE MASK BLANK, REFLECTIVE MASK AND METHOD FOR MANUFACTURING...

REFLECTIVE MASK BLANK, REFLECTIVE MASK, REFLECTIVE MASK MANUFACTURI...

REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...

REFLECTIVE MASK BLANK, REFLECTIVE MASK AND MANUFACTURING METHOD THE...

REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURIN...

REFLECTIVE MASK BLANK, REFLECTIVE MASK AND METHOD OF MANUFACTURING...

REFLECTIVE MASK BLANK, REFLECTIVE MASK AND MANUFACTURING METHOD THE...

REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...

REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD OF MANUFACTURING...

REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURIN...

REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD FOR PRODUCING SAME,...

REFLECTIVE MASK BLANK, REFLECTIVE MASK AND METHOD FOR PRODUCING SEM...

REFLECTIVE MASK BLANK, REFLECTIVE MASK AND METHOD FOR MANUFACTURING...

REFLECTIVE MASK BLANK, REFLECTIVE MASK AND METHOD OF MANUFACTURING...

REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHODS FOR PRODUCING R...

REFLECTIVE MASK BLANK, REFLECTIVE MASK, PRODUCTION METHOD THEREFOR,...

REFLECTIVE MASK BLANK, REFLECTIVE MASK AND METHOD FOR PRODUCING SAM...

SUBSTRATE EQUIPPED WITH MULTI-LAYER REFLECTION FILM, REFLECTION-TYP...

REFLECTIVE MASK BLANK, REFLECTIVE MASK AND MANUFACTURING METHOD THE...

REFLECTIVE MASK BLANK, REFLECTIVE MASK AND METHOD OF MANUFACTURING...

SUBSTRATE WITH CONDUCTIVE FILM, SUBSTRATE WITH MULTILAYER REFLECTIV...

REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING SAM...

REFLECTIVE MASK BLANK, REFLECTIVE MASK AND METHOD OF MANUFACTURING...

REFLECTIVE MASK BLANK, METHOD OF MANUFACTURING REFLECTIVE MASK AND...