Yohei Kinoshita

Person

Sagamihara-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Silicon-containing polymer, film-forming composition, method for fo...
- Patent number 11,377,522
- Issue date Jul 5, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Kunihiro Noda
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Base material for pattern-forming material, positive resist composi...
- Patent number 7,923,192
- Issue date Apr 12, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 7,919,227
- Issue date Apr 5, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Yohei Kinoshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and method for forming resist pattern
- Patent number 7,858,286
- Issue date Dec 28, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Yohei Kinoshita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive resist composition and method for forming resist pattern
- Patent number 7,816,066
- Issue date Oct 19, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Yohei Kinoshita
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 7,803,512
- Issue date Sep 28, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Yohei Kinoshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and resist pattern forming method
- Patent number 7,781,144
- Issue date Aug 24, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Yohei Kinoshita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymer compound, photoresist composition including the polymer com...
- Patent number 7,723,007
- Issue date May 25, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Toshiyuki Ogata
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymer compound, positive resist composition and process for formi...
- Patent number 7,608,381
- Issue date Oct 27, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Yohei Kinoshita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for the preparation of a semiconductor device
- Patent number 6,818,380
- Issue date Nov 16, 2004
- Tokyo Ohka Kogyo Co., Ltd.
- Satoshi Maemori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for the preparation of a semiconductor device
- Patent number 6,777,158
- Issue date Aug 17, 2004
- Tokyo Ohka Kogyo Co., Ltd.
- Satoshi Maemori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Crosslinked positive-working photoresist composition
- Patent number 6,630,282
- Issue date Oct 7, 2003
- Tokyo Ohka Kogyo Co., Ltd.
- Katsumi Oomori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working photoresist composition
- Patent number 6,485,887
- Issue date Nov 26, 2002
- Tokyo Ohka Kogyo Co., Ltd.
- Katsumi Oomori
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive-working photoresist composition
- Patent number 6,340,553
- Issue date Jan 22, 2002
- Tokyo Ohka Kogyo Co., Ltd.
- Katsumi Oomori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
SILICON-CONTAINING POLYMER, FILM-FORMING COMPOSITION, METHOD FOR FO...
- Publication number 20200362115
- Publication date Nov 19, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Kunihiro NODA
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20100040970
- Publication date Feb 18, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Yohei Kinoshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
- Publication number 20090098483
- Publication date Apr 16, 2009
- TOKYO OHA KOGYO CO., LTD.
- Yohei Kinoshita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
- Publication number 20090068583
- Publication date Mar 12, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Yohei Kinoshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20090068588
- Publication date Mar 12, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Yohei Kinoshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD
- Publication number 20090035698
- Publication date Feb 5, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Yohei Kinoshita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Polymer Compound, Photoresist Composition Including the Polymer Com...
- Publication number 20080166655
- Publication date Jul 10, 2008
- Toshiyuki Ogata
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Polymer Compound, Positive Resist Composition and Process for Formi...
- Publication number 20080096126
- Publication date Apr 24, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Yohei Kinoshita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Method for the preparation of a semiconductor device
- Publication number 20040067615
- Publication date Apr 8, 2004
- Satoshi Maemori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for the preparation of a semiconductor device
- Publication number 20020045133
- Publication date Apr 18, 2002
- Satoshi Maemori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Crosslinked positive-working photoresist composition
- Publication number 20020034704
- Publication date Mar 21, 2002
- Katsumi Oomori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive-working photoresist composition
- Publication number 20020031722
- Publication date Mar 14, 2002
- Katsumi Oomori
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Yohei Kinoshita

Person

Patents Grantslast 30 patents

Silicon-containing polymer, film-forming composition, method for fo...

Base material for pattern-forming material, positive resist composi...

Positive resist composition and method of forming resist pattern

Positive resist composition and method for forming resist pattern

Positive resist composition and method for forming resist pattern

Positive resist composition and method of forming resist pattern

Positive resist composition and resist pattern forming method

Polymer compound, photoresist composition including the polymer com...

Polymer compound, positive resist composition and process for formi...

Method for the preparation of a semiconductor device

Method for the preparation of a semiconductor device

Crosslinked positive-working photoresist composition

Positive-working photoresist composition

Positive-working photoresist composition

Patents Applicationslast 30 patents

SILICON-CONTAINING POLYMER, FILM-FORMING COMPOSITION, METHOD FOR FO...

POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

POSITIVE RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

POSITIVE RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD

Polymer Compound, Photoresist Composition Including the Polymer Com...

Polymer Compound, Positive Resist Composition and Process for Formi...

Method for the preparation of a semiconductor device

Method for the preparation of a semiconductor device

Crosslinked positive-working photoresist composition

Positive-working photoresist composition