Yohei Yamazawa

Person

Nirasaki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Radio frequency (RF) system with embedded RF signal pickups
- Patent number 12,224,164
- Issue date Feb 11, 2025
- Tokyo Electron Limited
- Chelsea Dubose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF voltage and current (V-I) sensors and measurement methods
- Patent number 12,176,183
- Issue date Dec 24, 2024
- Tokyo Electron Limited
- Barton Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Filter circuit
- Patent number 11,990,318
- Issue date May 21, 2024
- Tokyo Electron Limited
- Yohei Yamazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,832,373
- Issue date Nov 28, 2023
- Tokyo Electron Limited
- Yohei Yamazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF voltage and current (V-I) sensors and measurement methods
- Patent number 11,817,296
- Issue date Nov 14, 2023
- Tokyo Electron Limited
- Barton Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF voltage and current (V-I) sensors and measurement methods
- Patent number 11,600,474
- Issue date Mar 7, 2023
- Tokyo Electron Limited
- Barton Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,470,712
- Issue date Oct 11, 2022
- Tokyo Electron Limited
- Yohei Yamazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF measurement system and method
- Patent number 11,410,832
- Issue date Aug 9, 2022
- Tokyo Electron Limited
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,037,762
- Issue date Jun 15, 2021
- Tokyo Electron Limited
- Yohei Yamazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 10,916,410
- Issue date Feb 9, 2021
- Tokyo Electron Limited
- Yohei Yamazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 10,854,431
- Issue date Dec 1, 2020
- Tokyo Electron Limited
- Akira Koshiishi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,804,076
- Issue date Oct 13, 2020
- Tokyo Electron Limited
- Yohei Yamazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 10,679,867
- Issue date Jun 9, 2020
- Tokyo Electron Limited
- Yohei Yamazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 10,593,517
- Issue date Mar 17, 2020
- Tokyo Electron Limited
- Yohei Yamazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 10,546,727
- Issue date Jan 28, 2020
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 10,529,539
- Issue date Jan 7, 2020
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Transformer, plasma processing apparatus, and plasma processing method
- Patent number 10,381,197
- Issue date Aug 13, 2019
- Tokyo Electron Limited
- Yohei Yamazawa
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Plasma processing apparatus
- Patent number 10,020,167
- Issue date Jul 10, 2018
- Tokyo Electron Limited
- Yohei Yamazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 9,997,332
- Issue date Jun 12, 2018
- Tokyo Electron Limited
- Yohei Yamazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 9,953,811
- Issue date Apr 24, 2018
- Tokyo Electron Limited
- Yohei Yamazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 9,941,097
- Issue date Apr 10, 2018
- Tokyo Electron Limited
- Yohei Yamazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 9,899,191
- Issue date Feb 20, 2018
- Tokyo Electron Limited
- Yohei Yamazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 9,627,181
- Issue date Apr 18, 2017
- Tokyo Electron Limited
- Yohei Yamazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film formation device, substrate processing device, and film format...
- Patent number 9,583,312
- Issue date Feb 28, 2017
- Tokyo Electron Limited
- Jun Yamawaku
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 9,502,215
- Issue date Nov 22, 2016
- Tokyo Electron Limited
- Hitoshi Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 9,490,105
- Issue date Nov 8, 2016
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 9,351,389
- Issue date May 24, 2016
- Tokyo Electron Limited
- Yohei Yamazawa
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 9,313,872
- Issue date Apr 12, 2016
- Tokyo Electron Limited
- Yohei Yamazawa
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma processing apparatus
- Patent number 9,293,299
- Issue date Mar 22, 2016
- Tokyo Electron Limited
- Yohei Yamazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 9,275,837
- Issue date Mar 1, 2016
- Tokyo Electron Limited
- Yohei Yamazawa
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents

Information Patent Application
DATA CALCULATION METHOD AND SUBSTRATE PROCESSING DEVICE
- Publication number 20240395517
- Publication date Nov 28, 2024
- TOKYO ELECTRON LIMITED
- Yohei YAMAZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILTER CIRCUIT
- Publication number 20240304421
- Publication date Sep 12, 2024
- TOKYO ELECTRON LIMITED
- Yohei YAMAZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and Method for Plasma Processing
- Publication number 20240213005
- Publication date Jun 27, 2024
- TOKYO ELECTRON LIMITED
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU DIAGNOSIS OF PLASMA SYSTEM
- Publication number 20240203713
- Publication date Jun 20, 2024
- TOKYO ELECTRON LIMITED
- Barton Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILTER CIRCUIT AND PLASMA PROCESSING APPARATUS
- Publication number 20240154594
- Publication date May 9, 2024
- TOKYO ELECTRON LIMITED
- Yohei YAMAZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240049379
- Publication date Feb 8, 2024
- TOKYO ELECTRON LIMITED
- Yohei YAMAZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF Voltage and Current (V-I) Sensors and Measurement Methods
- Publication number 20240038496
- Publication date Feb 1, 2024
- TOKYO ELECTRON LIMITED
- Barton Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANTENNA FOR INDUCTIVELY COUPLED PLASMA EXCITATION, ANTENNA UNIT FOR...
- Publication number 20230343553
- Publication date Oct 26, 2023
- TOKYO ELECTRON LIMITED
- Yohei YAMAZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR PLASMA PROCESSING
- Publication number 20230282446
- Publication date Sep 7, 2023
- TOKYO ELECTRON LIMITED
- Yohei Yamazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20230260752
- Publication date Aug 17, 2023
- TOKYO ELECTRON LIMITED
- Yohei YAMAZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADIO FREQUENCY (RF) SYSTEM WITH EMBEDDED RF SIGNAL PICKUPS
- Publication number 20230132660
- Publication date May 4, 2023
- TOKYO ELECTRON LIMITED
- Chelsea Dubose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus for Plasma Processing
- Publication number 20230054430
- Publication date Feb 23, 2023
- TOKYO ELECTRON LIMITED
- Barton Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20230021588
- Publication date Jan 26, 2023
- TOKYO ELECTRON LIMITED
- Yohei YAMAZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILTER CIRCUIT
- Publication number 20220148854
- Publication date May 12, 2022
- TOKYO ELECTRON LIMITED
- Yohei YAMAZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING COIL
- Publication number 20220108871
- Publication date Apr 7, 2022
- TOKYO ELECTRON LIMITED
- Yohei Yamazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF Voltage and Current (V-I) Sensors and Measurement Methods
- Publication number 20210407775
- Publication date Dec 30, 2021
- TOKYO ELECTRON LIMITED
- Justin Moses
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF Voltage and Current (V-I) Sensors and Measurement Methods
- Publication number 20210407770
- Publication date Dec 30, 2021
- TOKYO ELECTRON LIMITED
- Justin Moses
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF Measurement System and Method
- Publication number 20210407771
- Publication date Dec 30, 2021
- TOKYO ELECTRON LIMITED
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20210082669
- Publication date Mar 18, 2021
- TOKYO ELECTRON LIMITED
- Akira KOSHIISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20200357606
- Publication date Nov 12, 2020
- TOKYO ELECTRON LIMITED
- Yohei YAMAZAWA
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20200111645
- Publication date Apr 9, 2020
- TOKYO ELECTRON LIMITED
- Akira KOSHIISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20200058467
- Publication date Feb 20, 2020
- TOKYO ELECTRON LIMITED
- Yohei YAMAZAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20190098740
- Publication date Mar 28, 2019
- TOKYO ELECTRON LIMITED
- Yohei YAMAZAWA
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20190019653
- Publication date Jan 17, 2019
- TOKYO ELECTRON LIMITED
- Yohei YAMAZAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20180308662
- Publication date Oct 25, 2018
- TOKYO ELECTRON LIMITED
- Yohei YAMAZAWA
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20180053635
- Publication date Feb 22, 2018
- TOKYO ELECTRON LIMITED
- Yohei Yamazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20170338081
- Publication date Nov 23, 2017
- TOKYO ELECTRON LIMITED
- Yohei YAMAZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20170330772
- Publication date Nov 16, 2017
- TOKYO ELECTRON LIMITED
- Yohei YAMAZAWA
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
TRANSFORMER, PLASMA PROCESSING APPARATUS, AND PLASMA PROCESSING METHOD
- Publication number 20170316948
- Publication date Nov 2, 2017
- TOKYO ELECTRON LIMITED
- Yohei YAMAZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20170032936
- Publication date Feb 2, 2017
- TOKYO ELECTRON LIMITED
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS

Yohei Yamazawa

Person

Patents Grantslast 30 patents

Radio frequency (RF) system with embedded RF signal pickups

RF voltage and current (V-I) sensors and measurement methods

Filter circuit

Plasma processing apparatus

RF voltage and current (V-I) sensors and measurement methods

RF voltage and current (V-I) sensors and measurement methods

Plasma processing apparatus

RF measurement system and method

Plasma processing apparatus

Plasma processing apparatus

Plasma processing apparatus and method

Plasma processing apparatus and plasma processing method

Plasma processing apparatus

Plasma processing apparatus

Plasma processing apparatus and method

Plasma processing apparatus and method

Transformer, plasma processing apparatus, and plasma processing method

Plasma processing apparatus

Plasma processing apparatus and plasma processing method

Plasma processing method

Plasma processing apparatus

Plasma processing apparatus

Plasma processing apparatus

Film formation device, substrate processing device, and film format...

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and method

Plasma processing apparatus

Plasma processing apparatus and plasma processing method

Plasma processing apparatus

Plasma processing apparatus

Patents Applicationslast 30 patents

DATA CALCULATION METHOD AND SUBSTRATE PROCESSING DEVICE

FILTER CIRCUIT

System and Method for Plasma Processing

IN-SITU DIAGNOSIS OF PLASMA SYSTEM

FILTER CIRCUIT AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

RF Voltage and Current (V-I) Sensors and Measurement Methods

ANTENNA FOR INDUCTIVELY COUPLED PLASMA EXCITATION, ANTENNA UNIT FOR...

APPARATUS FOR PLASMA PROCESSING

PLASMA PROCESSING APPARATUS

RADIO FREQUENCY (RF) SYSTEM WITH EMBEDDED RF SIGNAL PICKUPS

Apparatus for Plasma Processing

PLASMA PROCESSING APPARATUS

FILTER CIRCUIT

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING COIL

RF Voltage and Current (V-I) Sensors and Measurement Methods

RF Voltage and Current (V-I) Sensors and Measurement Methods

RF Measurement System and Method

PLASMA PROCESSING APPARATUS AND METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND METHOD

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

TRANSFORMER, PLASMA PROCESSING APPARATUS, AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND METHOD