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Patents Grants
last 30 patents
Information
Patent Grant
Resist composition and method of forming resist pattern
Patent number
11,934,099
Issue date
Mar 19, 2024
Tokyo Ohka Kogyo Co., Ltd.
Yoichi Hori
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist composition and method of forming resist pattern
Patent number
11,822,240
Issue date
Nov 21, 2023
Tokyo Ohka Kogyo Co., Ltd.
Yasuhiro Yoshii
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist composition and method of forming resist pattern
Patent number
11,747,726
Issue date
Sep 5, 2023
Tokyo Ohka Kogyo Co., Ltd.
Yuki Fukumura
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist composition and method of forming resist pattern
Patent number
11,656,549
Issue date
May 23, 2023
Tokyo Ohka Kogyo Co., Ltd.
Masahito Yahagi
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Resist composition and method of forming resist pattern
Patent number
11,650,497
Issue date
May 16, 2023
Tokyo Ohka Kogyo Co., Ltd.
Yasuhiro Yoshii
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist composition and method of forming resist pattern
Patent number
11,586,111
Issue date
Feb 21, 2023
Tokyo Ohka Kogyo Co., Ltd.
Yasuhiro Yoshii
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist composition and method of forming resist pattern
Patent number
11,392,033
Issue date
Jul 19, 2022
Tokyo Ohka Kogyo Co., Ltd.
Hitoshi Yamano
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Grant
Resist composition and method of forming resist pattern
Patent number
11,372,329
Issue date
Jun 28, 2022
Tokyo Ohka Kogyo Co., Ltd.
Masahito Yahagi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist composition and method of forming resist pattern
Patent number
11,275,306
Issue date
Mar 15, 2022
Tokyo Ohka Kogyo Co., Ltd.
Takahiro Kojima
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist composition and method of forming resist pattern
Patent number
11,187,981
Issue date
Nov 30, 2021
Tokyo Ohka Kogyo Co., Ltd.
Yoichi Hori
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method for forming resist pattern
Patent number
10,503,068
Issue date
Dec 10, 2019
Tokyo Ohka Kogyo Co., Ltd.
Takayoshi Mori
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist pattern formation method and resist composition
Patent number
9,740,105
Issue date
Aug 22, 2017
Tokyo Ohka Kogyo Co., Ltd.
Yoichi Hori
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method for forming resist pattern, resist pattern splitting agent,...
Patent number
9,618,845
Issue date
Apr 11, 2017
Tokyo Ohka Kogyo Co., Ltd.
Yoichi Hori
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method of trimming resist pattern
Patent number
9,581,909
Issue date
Feb 28, 2017
Tokyo Ohka Kogyo Co., Ltd.
Rikita Tsunoda
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method of producing polymeric compound, resist composition and meth...
Patent number
9,469,712
Issue date
Oct 18, 2016
Tokyo Ohka Kogyo Co., Ltd.
Tomoyuki Hirano
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Resist composition and resist pattern forming method
Patent number
9,274,424
Issue date
Mar 1, 2016
Tokyo Ohka Kogyo Co., Ltd.
Tsuyoshi Nakamura
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Patents Applications
last 30 patents
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20210405531
Publication date
Dec 30, 2021
Tokyo Ohka Kogyo Co., Ltd.
Yoichi HORI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20210200086
Publication date
Jul 1, 2021
Tokyo Ohka Kogyo Co., Ltd.
Mari MURATA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20210200087
Publication date
Jul 1, 2021
Tokyo Ohka Kogyo Co., Ltd.
Yoichi HORI
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20210191262
Publication date
Jun 24, 2021
Tokyo Ohka Kogyo Co., Ltd.
Yasuhiro YOSHII
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20210165324
Publication date
Jun 3, 2021
Tokyo Ohka Kogyo Co., Ltd.
Yosuke SUZUKI
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20210132495
Publication date
May 6, 2021
Tokyo Ohka Kogyo Co., Ltd.
Masahito Yahagi
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20200409262
Publication date
Dec 31, 2020
Tokyo Ohka Kogyo Co., Ltd.
Yuki FUKUMURA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20200183275
Publication date
Jun 11, 2020
Tokyo Ohka Kogyo Co., Ltd.
Takahiro KOJIMA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20200174369
Publication date
Jun 4, 2020
Tokyo Ohka Kogyo Co., Ltd.
Yasuhiro YOSHII
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20200166837
Publication date
May 28, 2020
Tokyo Ohka Kogyo Co., Ltd.
Yasuhiro YOSHII
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20200159118
Publication date
May 21, 2020
Tokyo Ohka Kogyo Co., Ltd.
Tatsuya FUJII
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20200150531
Publication date
May 14, 2020
Tokyo Ohka Kogyo Co., Ltd.
Yoichi HORI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20200142303
Publication date
May 7, 2020
Tokyo Ohka Kogyo Co., Ltd.
Masahito YAHAGI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20190204738
Publication date
Jul 4, 2019
Tokyo Ohka Kogyo Co., Ltd.
Hitoshi YAMANO
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20190196330
Publication date
Jun 27, 2019
Tokyo Ohka Kogyo Co., Ltd.
Yoichi HORI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHOD FOR FORMING RESIST PATTERN
Publication number
20170168396
Publication date
Jun 15, 2017
Tokyo Ohka Kogyo Co., Ltd.
Takayoshi MORI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHOD OF TRIMMING RESIST PATTERN
Publication number
20160097979
Publication date
Apr 7, 2016
Tokyo Ohka Kogyo Co., Ltd.
Rikita TSUNODA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHOD FOR FORMING RESIST PATTERN, RESIST PATTERN SPLITTING AGENT,...
Publication number
20160091790
Publication date
Mar 31, 2016
Tokyo Ohka Kogyo Co., Ltd.
Yoichi Hori
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD
Publication number
20140287362
Publication date
Sep 25, 2014
Tokyo Ohka Kogyo Co., Ltd.
Tsuyoshi Nakamura
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHOD OF PRODUCING POLYMERIC COMPOUND, RESIST COMPOSITION AND METH...
Publication number
20140272727
Publication date
Sep 18, 2014
Tokyo Ohka Kogyo Co., Ltd.
Tomoyuki Hirano
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RESIST PATTERN FORMATION METHOD AND RESIST COMPOSITION
Publication number
20140093827
Publication date
Apr 3, 2014
Tokyo Ohka Kogyo Co., Ltd.
Yoichi Hori
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY