Yoichi Nakamura

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Hiratsuka, JP

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Patents Grantslast 30 patents

Information Patent Grant
Method of forming a positive resist pattern in photoresist of o-nap...
- Patent number 4,797,348
- Issue date Jan 10, 1989
- Tokyo Ohka Kogyo Co., Ltd.
- Yoichi Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Light sensitive compositions of polymethyl isopropenyl ketone
- Patent number 4,297,433
- Issue date Oct 27, 1981
- Tokyo Ohka Kogyo Kabushiki Kaisha
- Minoru Tsuda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photo--imaging a polymethyl isopropenyl ketone (PMIPK) composition
- Patent number 4,276,369
- Issue date Jun 30, 1981
- Tokyo Ohka Kogyo Kabushiki Kaisha
- Minoru Tsuda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Light sensitive compositions of polymethyl isopropenyl ketone
- Patent number 4,243,740
- Issue date Jan 6, 1981
- Tokyo Ohka Kogyo Kabushiki Kaisha
- Minoru Tsuda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY