YOICHIRO NUMASAWA

Person

KAWASAKI-SHI, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Photoelectric conversion device
- Patent number 9,437,768
- Issue date Sep 6, 2016
- Semiconductor Energy Laboratory Co., Ltd.
- Yoichiro Numasawa
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Plasma treatment system and cleaning method of the same
- Patent number 8,002,947
- Issue date Aug 23, 2011
- Sanyo Electric Co., LTD
- Yoichiro Numasawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Nanosilicon semiconductor substrate manufacturing method and semico...
- Patent number 7,666,763
- Issue date Feb 23, 2010
- Canon Anelva Corporation
- Yukinobu Murao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming an oxygen- or nitrogen-terminated silicon nanocry...
- Patent number 7,589,002
- Issue date Sep 15, 2009
- Anelva Corporation
- Yoichiro Numasawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma treatment system and cleaning method of the same
- Patent number 7,530,359
- Issue date May 12, 2009
- Canon Anelva Corporation
- Yoichiro Numasawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Forming method and a forming apparatus of nanocrystalline silicon s...
- Patent number 7,091,138
- Issue date Aug 15, 2006
- Anelva Corporation
- Yoichiro Numasawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing system
- Patent number 6,664,496
- Issue date Dec 16, 2003
- Anelva Corporation
- Yoshimi Watabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sputter device
- Patent number 6,083,361
- Issue date Jul 4, 2000
- Anelva Corporation
- Masahiko Kobayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus
- Patent number 6,070,552
- Issue date Jun 6, 2000
- Anelva Corporation
- Shigeru Mizuno
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of processing a substrate and apparatus for the method
- Patent number 6,059,985
- Issue date May 9, 2000
- Anelva Corporation
- Takanori Yoshimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 6,016,765
- Issue date Jan 25, 2000
- Anelva Corporation
- Yoichiro Numasawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of depositing thin films by plasma-enhanced chemical vapor d...
- Patent number 5,956,616
- Issue date Sep 21, 1999
- Anelva Corporation
- Shigeru Mizuno
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA TREATMENT APPARATUS AND PLASMA CVD APPARATUS
- Publication number 20120100309
- Publication date Apr 26, 2012
- Semiconductor Energy Laboratory Co., Ltd.
- Hidekazu MIYAIRI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Apparatus and method for manufacturing halogen gas and halogen gas...
- Publication number 20090260974
- Publication date Oct 22, 2009
- Yoichiro Numasawa
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
Plasma treatment system and cleaning method of the same
- Publication number 20090095217
- Publication date Apr 16, 2009
- Canon ANELVA Corporation
- Yoichiro Numasawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
NANOSILICON SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD AND SEMICO...
- Publication number 20080296579
- Publication date Dec 4, 2008
- Canon ANELVA Corporation
- YUKINOBU MURAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming an oxygen- or nitrogen-terminated silicon nanocry...
- Publication number 20080230781
- Publication date Sep 25, 2008
- Yoichiro Numasawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of forming an oxygen- or nitrogen-terminated silicon nanocry...
- Publication number 20070262307
- Publication date Nov 15, 2007
- Yoichiro Numasawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Apparatus and method for manufacturing halogen gas and halogen gas...
- Publication number 20070086939
- Publication date Apr 19, 2007
- Yoichiro Numasawa
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
Method of forming an oxygen- or nitrogen-terminated silicon nanocry...
- Publication number 20060276055
- Publication date Dec 7, 2006
- Yoichiro Numasawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Forming method and a forming apparatus of nanocrystalline silicon s...
- Publication number 20050048796
- Publication date Mar 3, 2005
- ANELVA CORPORATION
- Yoichiro Numasawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing device and method of cleaning the same
- Publication number 20040149386
- Publication date Aug 5, 2004
- Yoichiro Numasawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Apparatus and method for manufacturing halogen gas and halogen gas...
- Publication number 20040035691
- Publication date Feb 26, 2004
- Yoichiro Numasawa
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
Plasma processing system
- Publication number 20020144980
- Publication date Oct 10, 2002
- ANELVA CORPORATION
- Yoshimi Watabe
- H01 - BASIC ELECTRIC ELEMENTS

YOICHIRO NUMASAWA

Person

Patents Grantslast 30 patents

Photoelectric conversion device

Plasma treatment system and cleaning method of the same

Nanosilicon semiconductor substrate manufacturing method and semico...

Method of forming an oxygen- or nitrogen-terminated silicon nanocry...

Plasma treatment system and cleaning method of the same

Forming method and a forming apparatus of nanocrystalline silicon s...

Plasma processing system

Sputter device

Substrate processing apparatus

Method of processing a substrate and apparatus for the method

Plasma processing apparatus

Method of depositing thin films by plasma-enhanced chemical vapor d...

Patents Applicationslast 30 patents

PLASMA TREATMENT APPARATUS AND PLASMA CVD APPARATUS

Apparatus and method for manufacturing halogen gas and halogen gas...

Plasma treatment system and cleaning method of the same

NANOSILICON SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD AND SEMICO...

Method of forming an oxygen- or nitrogen-terminated silicon nanocry...

Method of forming an oxygen- or nitrogen-terminated silicon nanocry...

Apparatus and method for manufacturing halogen gas and halogen gas...

Method of forming an oxygen- or nitrogen-terminated silicon nanocry...

Forming method and a forming apparatus of nanocrystalline silicon s...

Plasma processing device and method of cleaning the same

Apparatus and method for manufacturing halogen gas and halogen gas...

Plasma processing system