Yoko Watanabe

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Kanagawa, JP

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Patents Grantslast 30 patents

Information Patent Grant
Antireflection film and exposure method
- Patent number 7,655,377
- Issue date Feb 2, 2010
- Sony Corporation
- Nobuyuki Matsuzawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Antireflective film and exposure method
- Patent number 7,582,411
- Issue date Sep 1, 2009
- Sony Corporation
- Nobuyuki Matsuzawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Complementary division mask, method of producing mask, and program
- Patent number 7,247,410
- Issue date Jul 24, 2007
- Sony Corporation
- Yoko Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
ANTIREFLECTIVE FILM AND EXPOSURE METHOD
- Publication number 20070097514
- Publication date May 3, 2007
- Nobuyuki Matsuzawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Antireflection film and exposure method
- Publication number 20060194125
- Publication date Aug 31, 2006
- Nobuyuki Matsuzawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask and inspection method therefor and production method for semic...
- Publication number 20060008707
- Publication date Jan 12, 2006
- Yoko Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Complementary division mask, method of producing mask, and program
- Publication number 20050008948
- Publication date Jan 13, 2005
- Yoko Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY