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Yoko Yamaguchi Adams
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Fremont, CA, US
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Patents Grants
last 30 patents
Information
Patent Grant
Organic line width roughness with H2 plasma treatment
Patent number
8,298,958
Issue date
Oct 30, 2012
Lam Research Corporation
Yoko Y. Adams
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Dual doped polysilicon and silicon germanium etch
Patent number
7,682,985
Issue date
Mar 23, 2010
Lam Research Corporation
C. Robert Koemtzopoulos
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Line end shortening reduction during etch
Patent number
7,491,343
Issue date
Feb 17, 2009
Lam Research Corporation
Yoko Yamaguchi Adams
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Methods and apparatus for the optimization of etch resistance in a...
Patent number
7,316,785
Issue date
Jan 8, 2008
Lam Research Corporation
Yoko Yamaguchi Adams
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
Information
Patent Application
ORGANIC LINE WIDTH ROUGHNESS WITH H2 PLASMA TREATMENT
Publication number
20130087284
Publication date
Apr 11, 2013
LAM RESEARCH CORPORATION
Yoko Y. Adams
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
ORGANIC LINE WIDTH ROUGHNESS WITH H2 PLASMA TREATMENT
Publication number
20100015809
Publication date
Jan 21, 2010
LAM RESEARCH CORPORATION
Yoko Y. Adams
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
LINE END SHORTENING REDUCTION DURING ETCH
Publication number
20080087639
Publication date
Apr 17, 2008
Lam Research Corporation
Yoko Yamaguchi Adams
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Methods and apparatus for the optimization of etch resistance in a...
Publication number
20060000797
Publication date
Jan 5, 2006
Yoko Yamaguchi Adams
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Dual doped polysilicon and silicon germanium etch
Publication number
20050205862
Publication date
Sep 22, 2005
Lam Research Corporation
C. Robert Koemtzopoulos
H01 - BASIC ELECTRIC ELEMENTS