Yong Wang

Person

Yokkaichi-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Radiation-sensitive resin composition
- Patent number 9,348,226
- Issue date May 24, 2016
- JSR Corporation
- Isao Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Filler for affinity chromatography
- Patent number 9,162,161
- Issue date Oct 20, 2015
- JSR Corporation
- Kouji Tamori
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Filler for affinity chromatography
- Patent number 9,090,665
- Issue date Jul 28, 2015
- JSR Corporation
- Kouji Tamori
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Filler for affinity chromatography and method for isolating immunog...
- Patent number 9,051,355
- Issue date Jun 9, 2015
- JSR Corporation
- Kouji Tamori
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Packing material for affinity chromatography
- Patent number 8,846,877
- Issue date Sep 30, 2014
- JSR Corporation
- Kouji Tamori
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Acid generators, sulfonic acids, sulfonyl halides, and radiation se...
- Patent number 8,043,786
- Issue date Oct 25, 2011
- JSR Corporation
- Satoshi Ebata
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Liquid for immersion exposure and immersion exposure method
- Patent number 7,580,111
- Issue date Aug 25, 2009
- JSR Corporation
- Takashi Miyamatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist polymers
- Patent number 7,517,634
- Issue date Apr 14, 2009
- JSR Corporation
- Didier Benoit
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist polymer compositions
- Patent number 7,510,817
- Issue date Mar 31, 2009
- JSR Corporation
- Didier Benoit
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Synthesis of photoresist polymers
- Patent number 7,399,806
- Issue date Jul 15, 2008
- Symyx Technologies, Inc.
- Didier Benoit
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Sulfonium salt compound, photoacid generator, and positive-tone rad...
- Patent number 7,371,503
- Issue date May 13, 2008
- JSR Corporation
- Takashi Miyamatsu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Synthesis of photoresist polymers
- Patent number 7,250,475
- Issue date Jul 31, 2007
- Symyx Technologies, Inc.
- Didier Benoit
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Onium salt compound and radiation-sensitive resin composition
- Patent number 7,217,492
- Issue date May 15, 2007
- JSR Corporation
- Eiji Yoneda
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Acid generator, sulfonic acid, sulfonic acid derivatives and radiat...
- Patent number 6,908,722
- Issue date Jun 21, 2005
- JSR Corporation
- Satoshi Ebata
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Sulfonyloxime compound, and radiation sensitive acid generator, pos...
- Patent number 6,824,954
- Issue date Nov 30, 2004
- JSR Corporation
- Eiji Yoneda
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Vinylphenylpropionic acid derivatives, production process therefor,...
- Patent number 6,770,780
- Issue date Aug 3, 2004
- JSR Corporation
- Yong Wang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
N-sulfonyloxyimide compound and radiation-sensitive resin compositi...
- Patent number 6,517,992
- Issue date Feb 11, 2003
- JSR Corporation
- Yong Wang
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Negative radiation-sensitive resin composition
- Patent number 6,468,714
- Issue date Oct 22, 2002
- JSR Corporation
- Toshiyuki Kai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Diazodisulfone compound and radiation-sensitive resin composition
- Patent number 6,143,460
- Issue date Nov 7, 2000
- JSR Corporation
- Eiichi Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation sensitive resin composition
- Patent number 5,952,150
- Issue date Sep 14, 1999
- JSR Corporation
- Yoshihisa Ohta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
FILLER FOR AFFINITY CHROMATOGRAPHY
- Publication number 20130085199
- Publication date Apr 4, 2013
- JSR Corporation
- Kouji Tamori
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
FILLER FOR AFFINITY CHROMATOGRAPHY AND METHOD FOR ISOLATING IMMUNOG...
- Publication number 20130041135
- Publication date Feb 14, 2013
- JSR Corporation
- Kouji Tamori
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
FILLER FOR AFFINITY CHROMATOGRAPHY
- Publication number 20130023650
- Publication date Jan 24, 2013
- JSR Corporation
- Kouji Tamori
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
PACKING MATERIAL FOR AFFINITY CHROMATOGRAPHY
- Publication number 20110262748
- Publication date Oct 27, 2011
- JSR Corporation
- Kouji Tamori
- C07 - ORGANIC CHEMISTRY
Information Patent Application
LIQUID IMMERSION LITHOGRAPHY
- Publication number 20090305161
- Publication date Dec 10, 2009
- JSR Corporation
- Atsushi Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Immersion Exposure System, and Recycle Method and Supply Method of...
- Publication number 20080129970
- Publication date Jun 5, 2008
- Taiichi Furukawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Dye and Dye-Sensitized Solar Cell
- Publication number 20070209695
- Publication date Sep 13, 2007
- JSR Corporation
- Yong Wang
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Synthesis of Photresist Polymers
- Publication number 20070185276
- Publication date Aug 9, 2007
- Symyx Technologies, Inc.
- Didier Benoit
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Liquid for immersion exposure and immersion exposure method
- Publication number 20070164261
- Publication date Jul 19, 2007
- Takashi Miyamatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for producing saturated hydrocarbon compound
- Publication number 20070156003
- Publication date Jul 5, 2007
- Taiichi Furukawa
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Acid generators, sulfonic acids, sulfonyl halides, and radiation se...
- Publication number 20070054214
- Publication date Mar 8, 2007
- Satoshi Ebata
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Photoresist polymer compositions
- Publication number 20060257781
- Publication date Nov 16, 2006
- Didier Benoit
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Radiation-sensitive resin composition
- Publication number 20060234154
- Publication date Oct 19, 2006
- Isao Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist polymers
- Publication number 20060217519
- Publication date Sep 28, 2006
- Didier Benoit
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Sulfonium salts, radiation- sensitive acid generators, and positive...
- Publication number 20060141383
- Publication date Jun 29, 2006
- Takashi Miyamatsu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Synthesis of photoresist polymers
- Publication number 20060122346
- Publication date Jun 8, 2006
- Didier Benoit
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Synthesis of photoresist polymers
- Publication number 20050059787
- Publication date Mar 17, 2005
- Didier Benoit
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Onium salt compound and radiation-sensitive resin composition
- Publication number 20050053861
- Publication date Mar 10, 2005
- Eiji Yoneda
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Sulfonyloxime compound, and radiation sensitive acid generator, pos...
- Publication number 20030113660
- Publication date Jun 19, 2003
- Eiji Yoneda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Acid generator, sulfonic acid, sulfonic acid derivatives and radiat...
- Publication number 20030113658
- Publication date Jun 19, 2003
- Satoshi Ebata
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Negative radiation-sensitive resin composition
- Publication number 20010006758
- Publication date Jul 5, 2001
- Toshiyuki Kai
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Person

Patents Grantslast 30 patents

Radiation-sensitive resin composition

Filler for affinity chromatography

Filler for affinity chromatography

Filler for affinity chromatography and method for isolating immunog...

Packing material for affinity chromatography

Acid generators, sulfonic acids, sulfonyl halides, and radiation se...

Liquid for immersion exposure and immersion exposure method

Photoresist polymers

Photoresist polymer compositions

Synthesis of photoresist polymers

Sulfonium salt compound, photoacid generator, and positive-tone rad...

Synthesis of photoresist polymers

Onium salt compound and radiation-sensitive resin composition

Acid generator, sulfonic acid, sulfonic acid derivatives and radiat...

Sulfonyloxime compound, and radiation sensitive acid generator, pos...

Vinylphenylpropionic acid derivatives, production process therefor,...

N-sulfonyloxyimide compound and radiation-sensitive resin compositi...

Negative radiation-sensitive resin composition

Diazodisulfone compound and radiation-sensitive resin composition

Radiation sensitive resin composition

Patents Applicationslast 30 patents

FILLER FOR AFFINITY CHROMATOGRAPHY

FILLER FOR AFFINITY CHROMATOGRAPHY AND METHOD FOR ISOLATING IMMUNOG...

FILLER FOR AFFINITY CHROMATOGRAPHY

PACKING MATERIAL FOR AFFINITY CHROMATOGRAPHY

LIQUID IMMERSION LITHOGRAPHY

Immersion Exposure System, and Recycle Method and Supply Method of...

Dye and Dye-Sensitized Solar Cell

Synthesis of Photresist Polymers

Liquid for immersion exposure and immersion exposure method

Method for producing saturated hydrocarbon compound

Acid generators, sulfonic acids, sulfonyl halides, and radiation se...

Photoresist polymer compositions

Radiation-sensitive resin composition

Photoresist polymers

Sulfonium salts, radiation- sensitive acid generators, and positive...

Synthesis of photoresist polymers

Synthesis of photoresist polymers

Onium salt compound and radiation-sensitive resin composition

Sulfonyloxime compound, and radiation sensitive acid generator, pos...

Acid generator, sulfonic acid, sulfonic acid derivatives and radiat...

Negative radiation-sensitive resin composition