Yongan Xu

Person

Albany, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Methods of greytone imprint lithography to fabricate optical devices
- Patent number 12,111,572
- Issue date Oct 8, 2024
- Applied Materials, Inc.
- Hao Tang
- G02 - OPTICS
Information Patent Grant
Back-end-of-line single damascene top via spacer defined by pillar...
- Patent number 12,094,774
- Issue date Sep 17, 2024
- International Business Machines Corporation
- Yann Mignot
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to determine line angle and rotation of multiple patterning
- Patent number 12,085,475
- Issue date Sep 10, 2024
- Applied Materials, Inc.
- Yongan Xu
- G01 - MEASURING TESTING
Information Patent Grant
Reducing line edge roughness and mitigating defects by wafer freezing
- Patent number 12,087,601
- Issue date Sep 10, 2024
- International Business Machines Corporation
- Karen E. Petrillo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus of processing transparent substrates
- Patent number 12,060,297
- Issue date Aug 13, 2024
- Applied Materials, Inc.
- Yongan Xu
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Imaging system and method of creating composite images
- Patent number 12,021,102
- Issue date Jun 25, 2024
- Applied Materials, Inc.
- Jinxin Fu
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Mask orientation
- Patent number 11,977,246
- Issue date May 7, 2024
- Applied Materials, Inc.
- Yongan Xu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Two-color self-aligned double patterning (SADP) to yield static ran...
- Patent number 11,978,639
- Issue date May 7, 2024
- TESSERA LLC
- Fee Li Lie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Alignment mark for front to back side alignment and lithography for...
- Patent number 11,815,823
- Issue date Nov 14, 2023
- Applied Materials, Inc.
- Yongan Xu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metal via structure
- Patent number 11,784,120
- Issue date Oct 10, 2023
- International Business Machines Corporation
- Yann Mignot
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithography method to form structures with slanted angle
- Patent number 11,754,919
- Issue date Sep 12, 2023
- Applied Materials, Inc.
- Yongan Xu
- G02 - OPTICS
Information Patent Grant
Methods of greytone imprint lithography to fabricate optical devices
- Patent number 11,709,423
- Issue date Jul 25, 2023
- Applied Materials, Inc.
- Hao Tang
- G02 - OPTICS
Information Patent Grant
Two-color self-aligned double patterning (SADP) to yield static ran...
- Patent number 11,699,591
- Issue date Jul 11, 2023
- TESSERA LLC
- Fee Li Lie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Maskless lithography method to fabricate topographic substrate
- Patent number 11,669,012
- Issue date Jun 6, 2023
- Applied Materials, Inc.
- Yongan Xu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask orientation
- Patent number 11,630,251
- Issue date Apr 18, 2023
- Applied Materials, Inc.
- Yongan Xu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imaging system and method of creating composite images
- Patent number 11,610,925
- Issue date Mar 21, 2023
- Applied Materials, Inc.
- Jinxin Fu
- G02 - OPTICS
Information Patent Grant
Method of thin film deposition in trenches
- Patent number 11,572,619
- Issue date Feb 7, 2023
- Applied Materials, Inc.
- Jinrui Guo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Developer critical dimension control with pulse development
- Patent number 11,543,793
- Issue date Jan 3, 2023
- International Business Machines Corporation
- Richard C. Johnson
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Direct extreme ultraviolet lithography on hard mask with reverse tone
- Patent number 11,501,969
- Issue date Nov 15, 2022
- International Business Machines Corporation
- Yann Mignot
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a BEOL interconnect structure using a subtractive...
- Patent number 11,398,409
- Issue date Jul 26, 2022
- International Business Machines Corporation
- Yann Mignot
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective gas etching for self-aligned pattern transfer
- Patent number 11,302,533
- Issue date Apr 12, 2022
- Tessera, Inc.
- John Christopher Arnold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cut integration for subtractive first metal line with bottom up sec...
- Patent number 11,302,571
- Issue date Apr 12, 2022
- International Business Machines Corporation
- Somnath Ghosh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System, software application, and method for lithography stitching
- Patent number 11,237,485
- Issue date Feb 1, 2022
- Applied Materials, Inc.
- Yongan Xu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask orientation
- Patent number 11,226,440
- Issue date Jan 18, 2022
- Applied Materials, Inc.
- Yongan Xu
- G02 - OPTICS
Information Patent Grant
Multiple patterning scheme integration with planarized cut patterning
- Patent number 11,171,001
- Issue date Nov 9, 2021
- International Business Machines Corporation
- Hsueh-Chung Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal via structure
- Patent number 11,152,298
- Issue date Oct 19, 2021
- International Business Machines Corporation
- Yann Mignot
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Extreme ultraviolet (EUV) mask stack processing
- Patent number 11,131,919
- Issue date Sep 28, 2021
- International Business Machines Corporation
- Yongan Xu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and apparatus of processing transparent substrates
- Patent number 11,111,176
- Issue date Sep 7, 2021
- Applied Materials, Inc.
- Yongan Xu
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Double metal patterning
- Patent number 11,069,564
- Issue date Jul 20, 2021
- International Business Machines Corporation
- Hsueh-Chung Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Two-color self-aligned double patterning (SADP) to yield static ran...
- Patent number 11,062,911
- Issue date Jul 13, 2021
- Tessera, Inc.
- Fee Li Lie
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
TWO-COLOR SELF-ALIGNED DOUBLE PATTERNING (SADP) TO YIELD STATIC RAN...
- Publication number 20240258113
- Publication date Aug 1, 2024
- Adeia Semiconductor Solutions LLC
- Fee Li Lie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRANSITION METAL DICHALCOGENIDE COATED FLAT OPTICAL DEVICES HAVING...
- Publication number 20240111075
- Publication date Apr 4, 2024
- Applied Materials, Inc.
- Russell Chin Yee TEO
- G02 - OPTICS
Information Patent Application
TWO-COLOR SELF-ALIGNED DOUBLE PATTERNING (SADP) TO YIELD STATIC RAN...
- Publication number 20240079247
- Publication date Mar 7, 2024
- TESSERA LLC
- Fee Li Lie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LITHOGRAPHY METHOD TO FORM STRUCTURES WITH SLANTED ANGLE
- Publication number 20230408913
- Publication date Dec 21, 2023
- Applied Materials, Inc.
- Yongan XU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
AUTOMATED METROLOGY METHOD FOR LARGE DEVICES
- Publication number 20230408928
- Publication date Dec 21, 2023
- Applied Materials, Inc.
- Yongan XU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF GREYTONE IMPRINT LITHOGRAPHY TO FABRICATE OPTICAL DEVICES
- Publication number 20230341769
- Publication date Oct 26, 2023
- Applied Materials, Inc.
- Hao TANG
- G02 - OPTICS
Information Patent Application
LITHOGRAPHY STITCHING
- Publication number 20230324805
- Publication date Oct 12, 2023
- Applied Materials, Inc.
- Yongan XU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LOW COST FABRICATION OF OPTICAL DEVICE USING DISCRETE GRATING MODUL...
- Publication number 20230305203
- Publication date Sep 28, 2023
- Applied Materials, Inc.
- Hao TANG
- G02 - OPTICS
Information Patent Application
RESIST MODELING METHOD FOR ANGLED GRATINGS
- Publication number 20230296880
- Publication date Sep 21, 2023
- Applied Materials, Inc.
- Yongan XU
- G02 - OPTICS
Information Patent Application
METHODS FOR PREPARING SMALL FEATURES ON A SUBSTRATE
- Publication number 20230253206
- Publication date Aug 10, 2023
- Applied Materials, Inc.
- Yongan XU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMAGING SYSTEM AND METHOD OF CREATING COMPOSITE IMAGES
- Publication number 20230230991
- Publication date Jul 20, 2023
- Applied Materials, Inc.
- Jinxin FU
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
MASK ORIENTATION
- Publication number 20230213693
- Publication date Jul 6, 2023
- Applied Materials, Inc.
- Yongan XU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
STAMP TREATMENT TO GUIDE SOLVENT REMOVAL DIRECTION AND MAINTAIN CRI...
- Publication number 20230194982
- Publication date Jun 22, 2023
- Applied Materials, Inc.
- Yingdong LUO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF THIN FILM DEPOSITION IN TRENCHES
- Publication number 20230151479
- Publication date May 18, 2023
- Applied Materials, Inc.
- Jinrui GUO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ALIGNMENT MARK FOR FRONT TO BACK SIDE ALIGNMENT AND LITHOGRAPHY FOR...
- Publication number 20230123356
- Publication date Apr 20, 2023
- Applied Materials, Inc.
- Yongan XU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BACK-END-OF-LINE SINGLE DAMASCENE TOP VIA SPACER DEFINED BY PILLAR...
- Publication number 20230085494
- Publication date Mar 16, 2023
- International Business Machines Corporation
- Yann Mignot
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIE SYSTEM AND METHOD OF COMPARING ALIGNMENT VECTORS
- Publication number 20220392053
- Publication date Dec 8, 2022
- Applied Materials, Inc.
- Yongan XU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
A METHOD TO DETERMINE LINE ANGEL AND ROTATION OF MULTPLE PATTERNING
- Publication number 20220364951
- Publication date Nov 17, 2022
- Applied Materials, Inc.
- Yongan XU
- G01 - MEASURING TESTING
Information Patent Application
METHODS OF GREYTONE IMPRINT LITHOGRAPHY TO FABRICATE OPTICAL DEVICES
- Publication number 20220357656
- Publication date Nov 10, 2022
- Applied Materials, Inc.
- Hao TANG
- G02 - OPTICS
Information Patent Application
METHOD AND APPARATUS FOR GREYSCALE LITHOGRAPHY
- Publication number 20220357668
- Publication date Nov 10, 2022
- Applied Materials, Inc.
- Ludovic GODET
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD TO FABRICATE LARGE SCALE FLAT OPTICS LENSES
- Publication number 20220308460
- Publication date Sep 29, 2022
- Applied Materials, Inc.
- Yongan XU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SELECTIVE GAS ETCHING FOR SELF-ALIGNED PATTERN TRANSFER
- Publication number 20220262636
- Publication date Aug 18, 2022
- TESSERA LLC
- John Christopher Arnold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LITHOGRAPHY METHOD TO FORM STRUCTURES WITH SLANTED ANGLE
- Publication number 20220171283
- Publication date Jun 2, 2022
- Applied Materials, Inc.
- Yongan XU
- G02 - OPTICS
Information Patent Application
MASK ORIENTATION
- Publication number 20220128745
- Publication date Apr 28, 2022
- Applied Materials, Inc.
- Yongan XU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING A BEOL INTERCONNECT STRUCTURE USING A SUBTRACTIVE...
- Publication number 20220093459
- Publication date Mar 24, 2022
- International Business Machines Corporation
- Yann Mignot
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL VIA STRUCTURE
- Publication number 20220005762
- Publication date Jan 6, 2022
- International Business Machines Corporation
- Yann Mignot
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS OF PROCESSING TRANSPARENT SUBSTRATES
- Publication number 20210395139
- Publication date Dec 23, 2021
- Applied Materials, Inc.
- Yongan XU
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
TWO-COLOR SELF-ALIGNED DOUBLE PATTERNING (SADP) TO YIELD STATIC RAN...
- Publication number 20210343536
- Publication date Nov 4, 2021
- Tessera, Inc.
- Fee Li Lie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS OF PROCESSING TRANSPARENT SUBSTRATES
- Publication number 20210269355
- Publication date Sep 2, 2021
- Applied Materials, Inc.
- Yongan XU
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
MASKLESS LITHOGRAPHY METHOD TO FABRICATE TOPOGRAPHIC SUBSTRATE
- Publication number 20210263410
- Publication date Aug 26, 2021
- Applied Materials, Inc.
- Yongan XU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Person

Patents Grantslast 30 patents

Methods of greytone imprint lithography to fabricate optical devices

Back-end-of-line single damascene top via spacer defined by pillar...

Method to determine line angle and rotation of multiple patterning

Reducing line edge roughness and mitigating defects by wafer freezing

Methods and apparatus of processing transparent substrates

Imaging system and method of creating composite images

Mask orientation

Two-color self-aligned double patterning (SADP) to yield static ran...

Alignment mark for front to back side alignment and lithography for...

Metal via structure

Lithography method to form structures with slanted angle

Methods of greytone imprint lithography to fabricate optical devices

Two-color self-aligned double patterning (SADP) to yield static ran...

Maskless lithography method to fabricate topographic substrate

Mask orientation

Imaging system and method of creating composite images

Method of thin film deposition in trenches

Developer critical dimension control with pulse development

Direct extreme ultraviolet lithography on hard mask with reverse tone

Method of forming a BEOL interconnect structure using a subtractive...

Selective gas etching for self-aligned pattern transfer

Cut integration for subtractive first metal line with bottom up sec...

System, software application, and method for lithography stitching

Mask orientation

Multiple patterning scheme integration with planarized cut patterning

Metal via structure

Extreme ultraviolet (EUV) mask stack processing

Methods and apparatus of processing transparent substrates

Double metal patterning

Two-color self-aligned double patterning (SADP) to yield static ran...

Patents Applicationslast 30 patents

TWO-COLOR SELF-ALIGNED DOUBLE PATTERNING (SADP) TO YIELD STATIC RAN...

TRANSITION METAL DICHALCOGENIDE COATED FLAT OPTICAL DEVICES HAVING...

TWO-COLOR SELF-ALIGNED DOUBLE PATTERNING (SADP) TO YIELD STATIC RAN...

LITHOGRAPHY METHOD TO FORM STRUCTURES WITH SLANTED ANGLE

AUTOMATED METROLOGY METHOD FOR LARGE DEVICES

METHODS OF GREYTONE IMPRINT LITHOGRAPHY TO FABRICATE OPTICAL DEVICES

LITHOGRAPHY STITCHING

LOW COST FABRICATION OF OPTICAL DEVICE USING DISCRETE GRATING MODUL...

RESIST MODELING METHOD FOR ANGLED GRATINGS

METHODS FOR PREPARING SMALL FEATURES ON A SUBSTRATE

IMAGING SYSTEM AND METHOD OF CREATING COMPOSITE IMAGES

MASK ORIENTATION

STAMP TREATMENT TO GUIDE SOLVENT REMOVAL DIRECTION AND MAINTAIN CRI...

METHOD OF THIN FILM DEPOSITION IN TRENCHES

ALIGNMENT MARK FOR FRONT TO BACK SIDE ALIGNMENT AND LITHOGRAPHY FOR...

BACK-END-OF-LINE SINGLE DAMASCENE TOP VIA SPACER DEFINED BY PILLAR...

DIE SYSTEM AND METHOD OF COMPARING ALIGNMENT VECTORS

A METHOD TO DETERMINE LINE ANGEL AND ROTATION OF MULTPLE PATTERNING

METHODS OF GREYTONE IMPRINT LITHOGRAPHY TO FABRICATE OPTICAL DEVICES

METHOD AND APPARATUS FOR GREYSCALE LITHOGRAPHY

METHOD TO FABRICATE LARGE SCALE FLAT OPTICS LENSES

SELECTIVE GAS ETCHING FOR SELF-ALIGNED PATTERN TRANSFER

LITHOGRAPHY METHOD TO FORM STRUCTURES WITH SLANTED ANGLE

MASK ORIENTATION

METHOD OF FORMING A BEOL INTERCONNECT STRUCTURE USING A SUBTRACTIVE...

METAL VIA STRUCTURE

METHODS AND APPARATUS OF PROCESSING TRANSPARENT SUBSTRATES

TWO-COLOR SELF-ALIGNED DOUBLE PATTERNING (SADP) TO YIELD STATIC RAN...

METHODS AND APPARATUS OF PROCESSING TRANSPARENT SUBSTRATES

MASKLESS LITHOGRAPHY METHOD TO FABRICATE TOPOGRAPHIC SUBSTRATE