Yongmei CHEN

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method for forming a layer
- Patent number 10,957,590
- Issue date Mar 23, 2021
- Applied Materials, Inc.
- Wenhui Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Extension of PVD chamber with multiple reaction gases, high bias po...
- Patent number 10,927,449
- Issue date Feb 23, 2021
- Applied Materials, Inc.
- Jingjing Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned interconnects formed using subtractive techniques
- Patent number 10,643,895
- Issue date May 5, 2020
- Applied Materials, Inc.
- Bencherki Mebarki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nanocrystalline diamond carbon film for 3D NAND hardmask application
- Patent number 9,865,464
- Issue date Jan 9, 2018
- Applied Materials, Inc.
- Yongmei Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Self-aligned interconnects formed using substractive techniques
- Patent number 9,761,489
- Issue date Sep 12, 2017
- Applied Materials, Inc.
- Bencherki Mebarki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High power impulse magnetron sputtering process to achieve a high d...
- Patent number 9,695,503
- Issue date Jul 4, 2017
- Applied Materials, Inc.
- Michael W. Stowell
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Nanocrystalline diamond carbon film for 3D NAND hardmask application
- Patent number 9,502,262
- Issue date Nov 22, 2016
- Applied Materials, Inc.
- Yongmei Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Development of high etch selective hardmask material by ion implant...
- Patent number 9,412,613
- Issue date Aug 9, 2016
- Applied Materials, Inc.
- Pramit Manna
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Remote plasma source based cyclic CVD process for nanocrystalline d...
- Patent number 9,382,625
- Issue date Jul 5, 2016
- Applied Materials, Inc.
- Jun Xue
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Double exposure patterning with carbonaceous hardmask
- Patent number 8,293,460
- Issue date Oct 23, 2012
- Applied Materials, Inc.
- Hui W. Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Boron nitride and boron-nitride derived materials deposition method
- Patent number 8,148,269
- Issue date Apr 3, 2012
- Applied Materials, Inc.
- Mihaela Balseanu
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SURFACE TREATMENT METHOD TO REMOVE CONTAMINATED AND IMPLANTED WAVEG...
- Publication number 20240101937
- Publication date Mar 28, 2024
- Applied Materials, Inc.
- Wei WU
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
OPTICAL DEVICE IMPROVEMENT
- Publication number 20230360890
- Publication date Nov 9, 2023
- Applied Materials, Inc.
- Yue CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING A LAYER
- Publication number 20200161181
- Publication date May 21, 2020
- Applied Materials, Inc.
- Wenhui WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ARCING TEST VEHICLE AND METHOD OF USE THEREOF
- Publication number 20200105626
- Publication date Apr 2, 2020
- Applied Materials, Inc.
- MINGDONG LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXTENSION OF PVD CHAMBER WITH MULTIPLE REACTION GASES, HIGH BIAS PO...
- Publication number 20180209035
- Publication date Jul 26, 2018
- Applied Materials, Inc.
- Jingjing LIU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELF-ALIGNED INTERCONNECTS FORMED USING SUBTRACTIVE TECHNIQUES
- Publication number 20170372960
- Publication date Dec 28, 2017
- Applied Materials, Inc.
- Bencherki Mebarki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NANOCRYSTALINE DIAMOND CARBON FILM FOR 3D NAND HARDMASK APPLICATION
- Publication number 20170062216
- Publication date Mar 2, 2017
- Applied Materials, Inc.
- Yongmei CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NANOCRYSTALINE DIAMOND CARBON FILM FOR 3D NAND HARDMASK APPLICATION
- Publication number 20160064500
- Publication date Mar 3, 2016
- Applied Materials, Inc.
- Yongmei CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH POWER IMPULSE MAGNETRON SPUTTERING PROCESS TO ACHIEVE A HIGH D...
- Publication number 20160053366
- Publication date Feb 25, 2016
- Applied Materials, Inc.
- Michael W. STOWELL
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
REMOTE PLASMA SOURCE BASED CYCLIC CVD PROCESS FOR NANOCRYSTALLINE D...
- Publication number 20150315707
- Publication date Nov 5, 2015
- Applied Materials, Inc.
- Jun XUE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEVELOPMENT OF HIGH ETCH SELECTIVE HARDMASK MATERIAL BY ION IMPLANT...
- Publication number 20150194317
- Publication date Jul 9, 2015
- Applied Materials, Inc.
- PRAMIT MANNA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR PATTERNING A HARDMASK LAYER FOR AN ION IMPLANTATION PRO...
- Publication number 20150118832
- Publication date Apr 30, 2015
- Applied Materials, Inc.
- Bingxi Sun WOOD
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Self-aligned interconnects formed using substractive techniques
- Publication number 20150056800
- Publication date Feb 26, 2015
- Bencherki Mebarki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dry Etch Processes
- Publication number 20130115778
- Publication date May 9, 2013
- Applied Materials, Inc.
- Jun Xue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF ALIGNED TRIPLE PATTERNING
- Publication number 20120085733
- Publication date Apr 12, 2012
- Applied Materials, Inc.
- Bencherki Mebarki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DOUBLE EXPOSURE PATTERNING WITH CARBONACEOUS HARDMASK
- Publication number 20090311635
- Publication date Dec 17, 2009
- HUI W. CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BORON NITRIDE AND BORON-NITRIDE DERIVED MATERIALS DEPOSITION METHOD
- Publication number 20090263972
- Publication date Oct 22, 2009
- Applied Materials, Inc.
- Mihaela Balseanu
- H01 - BASIC ELECTRIC ELEMENTS

Yongmei CHEN

Person

Patents Grantslast 30 patents

Method for forming a layer

Extension of PVD chamber with multiple reaction gases, high bias po...

Self-aligned interconnects formed using subtractive techniques

Nanocrystalline diamond carbon film for 3D NAND hardmask application

Self-aligned interconnects formed using substractive techniques

High power impulse magnetron sputtering process to achieve a high d...

Nanocrystalline diamond carbon film for 3D NAND hardmask application

Development of high etch selective hardmask material by ion implant...

Remote plasma source based cyclic CVD process for nanocrystalline d...

Double exposure patterning with carbonaceous hardmask

Boron nitride and boron-nitride derived materials deposition method

Patents Applicationslast 30 patents

SURFACE TREATMENT METHOD TO REMOVE CONTAMINATED AND IMPLANTED WAVEG...

OPTICAL DEVICE IMPROVEMENT

METHOD FOR FORMING A LAYER

ARCING TEST VEHICLE AND METHOD OF USE THEREOF

EXTENSION OF PVD CHAMBER WITH MULTIPLE REACTION GASES, HIGH BIAS PO...

SELF-ALIGNED INTERCONNECTS FORMED USING SUBTRACTIVE TECHNIQUES

NANOCRYSTALINE DIAMOND CARBON FILM FOR 3D NAND HARDMASK APPLICATION

NANOCRYSTALINE DIAMOND CARBON FILM FOR 3D NAND HARDMASK APPLICATION

HIGH POWER IMPULSE MAGNETRON SPUTTERING PROCESS TO ACHIEVE A HIGH D...

REMOTE PLASMA SOURCE BASED CYCLIC CVD PROCESS FOR NANOCRYSTALLINE D...

DEVELOPMENT OF HIGH ETCH SELECTIVE HARDMASK MATERIAL BY ION IMPLANT...

METHODS FOR PATTERNING A HARDMASK LAYER FOR AN ION IMPLANTATION PRO...

Self-aligned interconnects formed using substractive techniques

Dry Etch Processes

SELF ALIGNED TRIPLE PATTERNING

DOUBLE EXPOSURE PATTERNING WITH CARBONACEOUS HARDMASK

BORON NITRIDE AND BORON-NITRIDE DERIVED MATERIALS DEPOSITION METHOD