Yongqing LAN

Person

Ludwigshafen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Chemical mechanical polishing composition
- Patent number 11,993,729
- Issue date May 28, 2024
- BASF SE
- Christian Daeschlein
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Use of a chemical mechanical polishing (CMP) composition for polish...
- Patent number 11,286,402
- Issue date Mar 29, 2022
- BASF SE
- Robert Reichardt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Use of a chemical mechanical polishing (CMP) composition for polish...
- Patent number 11,264,250
- Issue date Mar 1, 2022
- BASF SE
- Robert Reichardt
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Use of a chemical mechanical polishing (CMP) composition for polish...
- Patent number 10,899,945
- Issue date Jan 26, 2021
- BASF SE
- Robert Reichardt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Use of a chemical mechanical polishing (CMP) composition for polish...
- Patent number 10,738,219
- Issue date Aug 11, 2020
- BASF SE
- Robert Reichardt
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Chemical mechanical polishing (CMP) composition
- Patent number 10,570,316
- Issue date Feb 25, 2020
- BASF SE
- Robert Reichardt
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Use of a chemical mechanical polishing (CMP) composition for polish...
- Patent number 10,385,236
- Issue date Aug 20, 2019
- BASF SE
- Robert Reichardt
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing (CMP) composition for high effective...
- Patent number 10,227,506
- Issue date Mar 12, 2019
- BASF SE
- Max Siebert
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical-mechanical polishing composition comprising organic/inorga...
- Patent number 10,214,663
- Issue date Feb 26, 2019
- ST. LAWRENCE NANOTECHNOLOGY
- Yongqing Lan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical-mechanical polishing compositions comprising one or more p...
- Patent number 10,090,159
- Issue date Oct 2, 2018
- BASF SE
- Yongqing Lan
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Chemical-mechanical polishing compositions comprising polyethylene...
- Patent number 9,862,862
- Issue date Jan 9, 2018
- BASF SE
- Yongqing Lan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical-mechanical polishing compositions comprising N,N,N′,N′-tet...
- Patent number 9,828,527
- Issue date Nov 28, 2017
- BASF SE
- Yongqing Lan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Use of a chemical-mechanical polishing (CMP) composition for polish...
- Patent number 9,765,239
- Issue date Sep 19, 2017
- BASF SE
- Yongqing Lan
- B24 - GRINDING POLISHING
Information Patent Grant
Aqueous metal polishing agent comprising a polymeric abrasiv contai...
- Patent number 8,679,980
- Issue date Mar 25, 2014
- BASF SE
- Vijay Immanuel Raman
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Patents Applicationslast 30 patents

Information Patent Application
USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISH...
- Publication number 20210102093
- Publication date Apr 8, 2021
- BASF SE
- Robert REICHARDT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL MECHANICAL POLISHING COMPOSITION
- Publication number 20200299547
- Publication date Sep 24, 2020
- BASF SE
- Christian DAESCHLEIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISH...
- Publication number 20200294813
- Publication date Sep 17, 2020
- BASF SE
- Robert REICHARDT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISH...
- Publication number 20180230333
- Publication date Aug 16, 2018
- BASF SE
- Robert REICHARDT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISH...
- Publication number 20180016468
- Publication date Jan 18, 2018
- BASF SE
- Robert REICHARDT
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR HIGH EFFECTIVE...
- Publication number 20170369743
- Publication date Dec 28, 2017
- BASF SE
- Max SIEBERT
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISH...
- Publication number 20170369741
- Publication date Dec 28, 2017
- BASF SE
- Robert REICHARDT
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISH...
- Publication number 20170362464
- Publication date Dec 21, 2017
- BASF SE
- Robert REICHARDT
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHEMICAL-MECHANICAL POLISHING COMPOSITION COMPRISING ORGANIC/INORGA...
- Publication number 20170226381
- Publication date Aug 10, 2017
- BASF SE
- Yongqing LAN
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION
- Publication number 20170158913
- Publication date Jun 8, 2017
- BASF SE
- Robert REICHARDT
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CHEMICAL-MECHANICAL POLISHING COMPOSITIONS COMPRISING N,N,N′,N′-TET...
- Publication number 20170044402
- Publication date Feb 16, 2017
- BASF SE
- Yongqing LAN
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CMP COMPOSITION COMPRISING ABRASIVE PARTICLES CONTAINING CERIA
- Publication number 20160160083
- Publication date Jun 9, 2016
- BASF SE
- Michael LAUTER
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
USE OF A CHEMICAL-MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISH...
- Publication number 20160096979
- Publication date Apr 7, 2016
- BASF SE
- Yongqing LAN
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CHEMICAL-MECHANICAL POLISHING COMPOSITIONS COMPRISING POLYETHYLENE...
- Publication number 20160068712
- Publication date Mar 10, 2016
- BASF SE
- Yongqing LAN
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CHEMICAL-MECHANICAL POLISHING COMPOSITIONS COMPRISING N,N,N',N'-TET...
- Publication number 20160009955
- Publication date Jan 14, 2016
- BASF SE
- Yongqing LAN
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CHEMICAL-MECHANICAL POLISHING COMPOSITIONS COMPRISING ONE OR MORE P...
- Publication number 20150380263
- Publication date Dec 31, 2015
- BASF SE
- Yongqing LAN
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Yongqing LAN

Person

Patents Grantslast 30 patents

Chemical mechanical polishing composition

Use of a chemical mechanical polishing (CMP) composition for polish...

Use of a chemical mechanical polishing (CMP) composition for polish...

Use of a chemical mechanical polishing (CMP) composition for polish...

Use of a chemical mechanical polishing (CMP) composition for polish...

Chemical mechanical polishing (CMP) composition

Use of a chemical mechanical polishing (CMP) composition for polish...

Chemical mechanical polishing (CMP) composition for high effective...

Chemical-mechanical polishing composition comprising organic/inorga...

Chemical-mechanical polishing compositions comprising one or more p...

Chemical-mechanical polishing compositions comprising polyethylene...

Chemical-mechanical polishing compositions comprising N,N,N′,N′-tet...

Use of a chemical-mechanical polishing (CMP) composition for polish...

Aqueous metal polishing agent comprising a polymeric abrasiv contai...

Patents Applicationslast 30 patents

USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISH...

CHEMICAL MECHANICAL POLISHING COMPOSITION

USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISH...

USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISH...

USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISH...

CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR HIGH EFFECTIVE...

USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISH...

USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISH...

CHEMICAL-MECHANICAL POLISHING COMPOSITION COMPRISING ORGANIC/INORGA...

CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION

CHEMICAL-MECHANICAL POLISHING COMPOSITIONS COMPRISING N,N,N′,N′-TET...

CMP COMPOSITION COMPRISING ABRASIVE PARTICLES CONTAINING CERIA

USE OF A CHEMICAL-MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISH...

CHEMICAL-MECHANICAL POLISHING COMPOSITIONS COMPRISING POLYETHYLENE...

CHEMICAL-MECHANICAL POLISHING COMPOSITIONS COMPRISING N,N,N',N'-TET...

CHEMICAL-MECHANICAL POLISHING COMPOSITIONS COMPRISING ONE OR MORE P...