Yongzhang Huang

Person

Hamilton, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
High mass resolution low aberration analyzer magnet for ribbon beam...
- Patent number 8,183,539
- Issue date May 22, 2012
- Yongzhang Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low contamination, low energy beamline architecture for high curren...
- Patent number 7,994,488
- Issue date Aug 9, 2011
- Axcelis Technologies, Inc.
- Yongzhang Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Extraction electrode system for high current ion implanter
- Patent number 7,915,597
- Issue date Mar 29, 2011
- Axcelis Technologies, Inc.
- Yongzhang Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for ion beam profiling
- Patent number 7,701,230
- Issue date Apr 20, 2010
- Axcelis Technologies, Inc.
- John Zheng Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion source arc chamber seal
- Patent number 7,655,930
- Issue date Feb 2, 2010
- Axcelis Technologies, Inc.
- Yongzhang Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam stop and beam tuning methods
- Patent number 7,579,604
- Issue date Aug 25, 2009
- Axcelis Technologies. Inc.
- John W. Vanderpot
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of reducing particle contamination for ion implanters
- Patent number 7,566,887
- Issue date Jul 28, 2009
- Axcelis Technologies. Inc.
- Yongzhang Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Closed loop dose control for ion implantation
- Patent number 7,557,363
- Issue date Jul 7, 2009
- Axcelis Technologies, Inc.
- Yongzhang Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged beam dump and particle attractor
- Patent number 7,547,899
- Issue date Jun 16, 2009
- Axcelis Technologies, Inc.
- John W. Vanderpot
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method of ion beam control in response to a beam glitch
- Patent number 7,507,977
- Issue date Mar 24, 2009
- Axcelis Technologies, Inc.
- Que Weiguo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High conductance ion source
- Patent number 7,488,958
- Issue date Feb 10, 2009
- Axcelis Technologies, Inc.
- Yongzhang Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam tuning with automatic magnet pole rotation for ion implanters
- Patent number 7,476,855
- Issue date Jan 13, 2009
- Axcelis Technologies, Inc.
- Yongzhang Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hybrid magnetic/electrostatic deflector for ion implantation systems
- Patent number 6,881,966
- Issue date Apr 19, 2005
- Axcelis Technologies, Inc.
- Victor M. Benveniste
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High mass resolution magnet for ribbon beam ion implanters
- Patent number 6,835,930
- Issue date Dec 28, 2004
- Axcelis Technologies, Inc.
- Victor M. Benveniste
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deflecting acceleration/deceleration gap
- Patent number 6,777,696
- Issue date Aug 17, 2004
- Axcelis Technologies, Inc.
- Robert D. Rathmell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of tuning electrostatic quadrupole electrodes of an ion beam...
- Patent number 6,774,378
- Issue date Aug 10, 2004
- Axcelis Technologies, Inc.
- Yongzhang Huang
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
High mass resolution magnet for ribbon beam ion implanters
- Patent number 6,770,888
- Issue date Aug 3, 2004
- Axcelis Technologies, Inc.
- Victor M. Benveniste
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
High mass resolution low aberration analyzer magnet for ribbon beam...
- Publication number 20100243879
- Publication date Sep 30, 2010
- Yongzhang Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW CONTAMINATION, LOW ENERGY BEAMLINE ARCHITECTURE FOR HIGH CURREN...
- Publication number 20090267001
- Publication date Oct 29, 2009
- Axcelis Technologies, Inc.
- Yongzhang Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXTRACTION ELECTRODE SYSTEM FOR HIGH CURRENT ION IMPLANTER
- Publication number 20090236547
- Publication date Sep 24, 2009
- Axcelis Technologies, Inc.
- Yongzhang Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR ION BEAM PROFILING
- Publication number 20080265866
- Publication date Oct 30, 2008
- John Zheng Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION SOURCE ARC CHAMBER SEAL
- Publication number 20080230713
- Publication date Sep 25, 2008
- Axcelis Technologies, Inc.
- Yongzhang Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of reducing particle contamination for ion implanters
- Publication number 20080157681
- Publication date Jul 3, 2008
- Axcelis Technologies, Inc.
- Yongzhang Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and method of ion beam control in response to a beam glitch
- Publication number 20080067433
- Publication date Mar 20, 2008
- Axcelis Technologies, Inc.
- Que Weiguo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Beam tuning with automatic magnet pole rotation for ion implanters
- Publication number 20080067435
- Publication date Mar 20, 2008
- Axcelis Technologies Inc.
- Yongzhang Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Closed loop dose control for ion implantation
- Publication number 20070278427
- Publication date Dec 6, 2007
- Axcelis Technologies, Inc.
- Yongzhang Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged beam dump and particle attractor
- Publication number 20060284117
- Publication date Dec 21, 2006
- John W. Vanderpot
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Beam stop and beam tuning methods
- Publication number 20060284071
- Publication date Dec 21, 2006
- John W. Vanderpot
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High conductance ion source
- Publication number 20060219938
- Publication date Oct 5, 2006
- Axcelis Technologies, Inc.
- Yongzhang Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYBRID MAGNETIC/ELECTROSTATIC DEFLECTOR FOR ION IMPLANTATION SYSTEMS
- Publication number 20040227105
- Publication date Nov 18, 2004
- Victor M. Benveniste
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High mass resolution magnet for ribbon beam ion implanters
- Publication number 20040227074
- Publication date Nov 18, 2004
- Victor M. Benveniste
- H01 - BASIC ELECTRIC ELEMENTS

Yongzhang Huang

Person

Patents Grantslast 30 patents

High mass resolution low aberration analyzer magnet for ribbon beam...

Low contamination, low energy beamline architecture for high curren...

Extraction electrode system for high current ion implanter

Method and system for ion beam profiling

Ion source arc chamber seal

Beam stop and beam tuning methods

Method of reducing particle contamination for ion implanters

Closed loop dose control for ion implantation

Charged beam dump and particle attractor

System and method of ion beam control in response to a beam glitch

High conductance ion source

Beam tuning with automatic magnet pole rotation for ion implanters

Hybrid magnetic/electrostatic deflector for ion implantation systems

High mass resolution magnet for ribbon beam ion implanters

Deflecting acceleration/deceleration gap

Method of tuning electrostatic quadrupole electrodes of an ion beam...

High mass resolution magnet for ribbon beam ion implanters

Patents Applicationslast 30 patents

High mass resolution low aberration analyzer magnet for ribbon beam...

LOW CONTAMINATION, LOW ENERGY BEAMLINE ARCHITECTURE FOR HIGH CURREN...

EXTRACTION ELECTRODE SYSTEM FOR HIGH CURRENT ION IMPLANTER

METHOD AND SYSTEM FOR ION BEAM PROFILING

ION SOURCE ARC CHAMBER SEAL

Method of reducing particle contamination for ion implanters

System and method of ion beam control in response to a beam glitch

Beam tuning with automatic magnet pole rotation for ion implanters

Closed loop dose control for ion implantation

Charged beam dump and particle attractor

Beam stop and beam tuning methods

High conductance ion source

HYBRID MAGNETIC/ELECTROSTATIC DEFLECTOR FOR ION IMPLANTATION SYSTEMS

High mass resolution magnet for ribbon beam ion implanters