Yoojeong CHOI

Person

Suwon-si, KR

People

Patents Grantslast 30 patents

Information Patent Grant
Composition for resist underlayer, and pattern forming method using...
- Patent number 12,130,552
- Issue date Oct 29, 2024
- Samsung SDI Co., Ltd.
- Yoojeong Choi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist underlayer composition, and method of forming patterns using...
- Patent number 11,987,561
- Issue date May 21, 2024
- Samsung SDI Co., Ltd.
- Yoojeong Choi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method of forming patterns using resist underlayer composition
- Patent number 11,982,943
- Issue date May 14, 2024
- Samsung SDI Co., Ltd.
- Jaeyeol Baek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist underlayer composition, and method of forming patterns using...
- Patent number 11,698,587
- Issue date Jul 11, 2023
- Samsung SDI Co., Ltd.
- Shinhyo Bae
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist underlayer composition, and method of forming patterns using...
- Patent number 11,675,271
- Issue date Jun 13, 2023
- Samsung SDI Co., Ltd.
- Jaeyeol Baek
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist underlayer composition, and method of forming patterns using...
- Patent number 11,493,848
- Issue date Nov 8, 2022
- Samsung SDI Co., Ltd.
- Soonhyung Kwon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist underlayer composition, and method of forming patterns using...
- Patent number 11,385,545
- Issue date Jul 12, 2022
- Samsung SDI Co., Ltd.
- Jaeyeol Baek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist underlayer composition, and method of forming patterns using...
- Patent number 11,249,396
- Issue date Feb 15, 2022
- Samsung SDI Co., Ltd.
- Hyeon Park
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist underlayer composition, and method of forming patterns using...
- Patent number 10,732,504
- Issue date Aug 4, 2020
- Samsung SDI Co., Ltd.
- Shinhyo Bae
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METAL CONTAINING PHOTORESIST DEVELOPER COMPOSITION, AND METHOD OF F...
- Publication number 20240329537
- Publication date Oct 3, 2024
- Samsung SDI Co., Ltd.
- Taegeun SEONG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST UNDERLAYER COMPOSITION AND METHOD OF FORMING PATTERNS USING...
- Publication number 20240061338
- Publication date Feb 22, 2024
- SAMSUNG SDI CO., LTD.
- Yoojeong CHOI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR RESIST UNDERLAYER AND PATTERN FORMATION METHOD USIN...
- Publication number 20230288809
- Publication date Sep 14, 2023
- Samsung SDI Co., Ltd.
- Yoojeong CHOI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST UNDERLAYER COMPOSITION, AND METHOD OF FORMING PATTERNS USING...
- Publication number 20230273523
- Publication date Aug 31, 2023
- Samsung SDI Co., Ltd.
- Jaeyeol BAEK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST UNDERLAYER COMPOSITION AND METHOD OF FORMING PATTERNS USING...
- Publication number 20230103089
- Publication date Mar 30, 2023
- Samsung SDI Co., Ltd.
- Yoojeong CHOI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING PATTERNS USING RESIST UNDERLAYER COMPOSITION
- Publication number 20220260914
- Publication date Aug 18, 2022
- Samsung SDI Co., Ltd.
- Jaeyeol BAEK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR RESIST UNDERLAYER, AND PATTERN FORMING METHOD USING...
- Publication number 20220075266
- Publication date Mar 10, 2022
- Samsung SDI Co., Ltd.
- Yoojeong CHOI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST UNDERLAYER COMPOSITION, AND METHOD OF FORMING PATTERNS USING...
- Publication number 20210240082
- Publication date Aug 5, 2021
- Samsung SDI Co., Ltd.
- Jaeyeol BAEK
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST UNDERLAYER COMPOSITION, AND METHOD OF FORMING PATTERNS USING...
- Publication number 20210230127
- Publication date Jul 29, 2021
- Samsung SDI Co., Ltd.
- Yoojeong CHOI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST UNDERLAYER COMPOSITION, AND METHOD OF FORMING PATTERNS USING...
- Publication number 20200285153
- Publication date Sep 10, 2020
- Samsung SDI Co., Ltd.
- Hyeon PARK
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST UNDERLAYER COMPOSITION, AND METHOD OF FORMING PATTERNS USING...
- Publication number 20200081346
- Publication date Mar 12, 2020
- Samsung SDI Co., Ltd.
- Jaeyeol BAEK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST UNDERLAYER COMPOSITION, AND METHOD OF FORMING PATTERNS USING...
- Publication number 20190377262
- Publication date Dec 12, 2019
- Samsung SDI Co., Ltd.
- Shinhyo BAE
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST UNDERLAYER COMPOSITION, AND METHOD OF FORMING PATTERNS USING...
- Publication number 20190129307
- Publication date May 2, 2019
- Samsung SDI Co., Ltd.
- Soonhyung KWON
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST UNDERLAYER COMPOSITION, AND METHOD OF FORMING PATTERNS USING...
- Publication number 20180224744
- Publication date Aug 9, 2018
- Samsung SDI Co., Ltd.
- Shinhyo BAE
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Yoojeong CHOI

Person

Patents Grantslast 30 patents

Composition for resist underlayer, and pattern forming method using...

Resist underlayer composition, and method of forming patterns using...

Method of forming patterns using resist underlayer composition

Resist underlayer composition, and method of forming patterns using...

Resist underlayer composition, and method of forming patterns using...

Resist underlayer composition, and method of forming patterns using...

Resist underlayer composition, and method of forming patterns using...

Resist underlayer composition, and method of forming patterns using...

Resist underlayer composition, and method of forming patterns using...

Patents Applicationslast 30 patents

METAL CONTAINING PHOTORESIST DEVELOPER COMPOSITION, AND METHOD OF F...

RESIST UNDERLAYER COMPOSITION AND METHOD OF FORMING PATTERNS USING...

COMPOSITION FOR RESIST UNDERLAYER AND PATTERN FORMATION METHOD USIN...

RESIST UNDERLAYER COMPOSITION, AND METHOD OF FORMING PATTERNS USING...

RESIST UNDERLAYER COMPOSITION AND METHOD OF FORMING PATTERNS USING...

METHOD OF FORMING PATTERNS USING RESIST UNDERLAYER COMPOSITION

COMPOSITION FOR RESIST UNDERLAYER, AND PATTERN FORMING METHOD USING...

RESIST UNDERLAYER COMPOSITION, AND METHOD OF FORMING PATTERNS USING...

RESIST UNDERLAYER COMPOSITION, AND METHOD OF FORMING PATTERNS USING...

RESIST UNDERLAYER COMPOSITION, AND METHOD OF FORMING PATTERNS USING...

RESIST UNDERLAYER COMPOSITION, AND METHOD OF FORMING PATTERNS USING...

RESIST UNDERLAYER COMPOSITION, AND METHOD OF FORMING PATTERNS USING...

RESIST UNDERLAYER COMPOSITION, AND METHOD OF FORMING PATTERNS USING...

RESIST UNDERLAYER COMPOSITION, AND METHOD OF FORMING PATTERNS USING...