Yool Kang

Person

Yongin-si, KR

People

Patents Grantslast 30 patents

Information Patent Grant
Method of forming mask pattern and method of fabricating semiconduc...
- Patent number 11,189,491
- Issue date Nov 30, 2021
- Samsung Electronics Co., Ltd.
- Chul-Ho Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming patterns using compositions for an underlayer of...
- Patent number 10,712,662
- Issue date Jul 14, 2020
- Samsung Electronics Co., Ltd.
- Jin-A Ryu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method of forming patterns for semiconductor device
- Patent number 10,236,185
- Issue date Mar 19, 2019
- Samsung Electronics Co., Ltd.
- Yool Kang
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Hard mask composition, carbon nanotube layer structure, pattern for...
- Patent number 9,892,915
- Issue date Feb 13, 2018
- Samsung Electronics Co., Ltd.
- Seung Yun Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming patterns and method of manufacturing integrated c...
- Patent number 9,613,821
- Issue date Apr 4, 2017
- Samsung Electronics Co., Ltd.
- Yool Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming pattern of semiconductor device
- Patent number 9,337,032
- Issue date May 10, 2016
- Samsung Electronics Co., Ltd.
- Hyung-Rae Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of fabricating semiconductor device
- Patent number 8,987,118
- Issue date Mar 24, 2015
- Samsung Electronics Co., Ltd.
- Hyung-Rae Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming fine patterns of semiconductor device by using do...
- Patent number 8,778,598
- Issue date Jul 15, 2014
- Samsung Electronics Co., Ltd.
- Yool Kang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of forming photoresist patterns
- Patent number 8,735,053
- Issue date May 27, 2014
- Samsung Electronics Co., Ltd.
- Subramanya Mayya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing semiconductor device using acid diffusion
- Patent number 8,623,739
- Issue date Jan 7, 2014
- Samsung Electronics Co., Ltd.
- Hyung-rae Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoacid generator, chemically amplified resist composition includ...
- Patent number 8,536,347
- Issue date Sep 17, 2013
- Samsung Electronics Co., Ltd.
- Yool Kang
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method of forming fine patterns of semiconductor device by using do...
- Patent number 8,431,331
- Issue date Apr 30, 2013
- Samsung Electronics Co., Ltd.
- Yool Kang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of forming fine patterns of semiconductor device
- Patent number 8,314,036
- Issue date Nov 20, 2012
- Samsung Electronics Co., Ltd.
- Seongho Moon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming a mask pattern, method of forming a minute patter...
- Patent number 8,227,349
- Issue date Jul 24, 2012
- Samsung Electronics Co., Ltd.
- Hyoung-Hee Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming fine patterns of a semiconductor device
- Patent number 8,173,358
- Issue date May 8, 2012
- Samsung Electronics Co., Ltd.
- Hyoung-hee Kim
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method for forming patterns of semiconductor device
- Patent number 7,862,988
- Issue date Jan 4, 2011
- Samsung Electronics Co., Ltd.
- Cha-Won Koh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming a semiconductor device
- Patent number 7,842,450
- Issue date Nov 30, 2010
- Samsung Electronics Co., Ltd.
- Doo-youl Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nonvolatile memory device and method of manufacturing the same
- Patent number 7,678,650
- Issue date Mar 16, 2010
- Samsung Electronics Co., Ltd.
- Cha-Won Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nonvolatile memory device and method of manufacturing the same
- Patent number 7,560,768
- Issue date Jul 14, 2009
- Samsung Electronics Co., Ltd.
- Cha-Won Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming line patterns in semiconductor substrates
- Patent number 6,803,176
- Issue date Oct 12, 2004
- Samsung Electronics Co., Ltd.
- Sang-jun Choi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive polymers and resist compositions comprising the phot...
- Patent number 6,787,287
- Issue date Sep 7, 2004
- Samsung Electronics Co., Ltd.
- Hyun-woo Kim
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photosensitive polymer having fused aromatic ring and photoresist c...
- Patent number 6,753,125
- Issue date Jun 22, 2004
- Samsung Electronics, Co. LTD
- Sang-jun Choi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Methods for forming line patterns in semiconductor substrates
- Patent number 6,485,895
- Issue date Nov 26, 2002
- Samsung Electronics Co., Ltd.
- Sang-jun Choi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive polymers and chemically amplified photoresist compos...
- Patent number 6,300,036
- Issue date Oct 9, 2001
- Samsung Electronics Co., Ltd.
- Sang-Jun Choi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for manufacturing a photoresist pattern defining a small ope...
- Patent number 6,284,438
- Issue date Sep 4, 2001
- Samsung Electronics Co., Ltd.
- Sang-jun Choi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified resist composition
- Patent number 6,280,903
- Issue date Aug 28, 2001
- Samsung Electronics Co., Ltd.
- Yool Kang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified resist composition
- Patent number 6,114,084
- Issue date Sep 5, 2000
- Samsung Electronics Co. Ltd.
- Yool Kang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF FORMING MASK PATTERN AND METHOD OF FABRICATING SEMICONDUC...
- Publication number 20200234947
- Publication date Jul 23, 2020
- Samsung Electronics Co., Ltd.
- Chul-Ho KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING PATTERNS FOR SEMICONDUCTOR DEVICE
- Publication number 20180151362
- Publication date May 31, 2018
- Samsung Electronics Co., Ltd.
- Yool KANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF FORMING PATTERNS USING COMPOSITIONS FOR AN UNDERLAYER OF...
- Publication number 20170199459
- Publication date Jul 13, 2017
- Samsung Electronics Co., Ltd.
- Jin-A RYU
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
HARD MASK COMPOSITION, CARBON NANOTUBE LAYER STRUCTURE, PATTERN FOR...
- Publication number 20170186602
- Publication date Jun 29, 2017
- Pusan National University Industry-University Cooperation Foundation
- Seung Yun YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING PATTERNS AND METHOD OF MANUFACTURING INTEGRATED C...
- Publication number 20150364334
- Publication date Dec 17, 2015
- Yool Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING PATTERN OF SEMICONDUCTOR DEVICE
- Publication number 20150118852
- Publication date Apr 30, 2015
- Samsung Electronics Co., Ltd.
- Hyung-Rae LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FABRICATING SEMICONDUCTOR DEVICE
- Publication number 20140124834
- Publication date May 8, 2014
- FUJIFILM CORPORATION
- Hyung-Rae Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING FINE PATTERNS OF SEMICONDUCTOR DEVICE BY USING DO...
- Publication number 20140004705
- Publication date Jan 2, 2014
- Samsung Electronics Co., Ltd.
- Yool Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF FORMING METAL OR METAL NITRIDE PATTERNS AND METHODS OF M...
- Publication number 20130040448
- Publication date Feb 14, 2013
- Samsung Electronics Co., Ltd.
- Joo-Hyung Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF FORMING FINE PATTERNS USING DRY ETCH-BACK PROCESSES
- Publication number 20130034965
- Publication date Feb 7, 2013
- SAMSUNG ELECTRONICS CO., LTD.
- Hyoung-Hee KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING ACID DIFFUSION
- Publication number 20120028434
- Publication date Feb 2, 2012
- Hyung-rae LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods Of Forming Photoresist Patterns
- Publication number 20110275020
- Publication date Nov 10, 2011
- Samsung Electronics Co., Ltd.
- Subramanya Mayya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20110244689
- Publication date Oct 6, 2011
- Samsung Electronics Co., Ltd.
- So-ra Han
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING A MASK PATTERN, METHOD OF FORMING A MINUTE PATTER...
- Publication number 20110053362
- Publication date Mar 3, 2011
- Hyoung-Hee KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF FORMING FINE PATTERNS OF SEMICONDUCTOR DEVICE
- Publication number 20110027993
- Publication date Feb 3, 2011
- Seongho Moon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING FINE PATTERNS OF A SEMICONDUCTOR DEVICE
- Publication number 20100093172
- Publication date Apr 15, 2010
- Hyoung-hee KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING FINE PATTERNS OF SEMICONDUCTOR DEVICE BY USING DO...
- Publication number 20090274980
- Publication date Nov 5, 2009
- SAMSUNG ELECTRONICS CO., LTD.
- Yool Kang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Nonvolatile memory device and method of manufacturing the same
- Publication number 20090258473
- Publication date Oct 15, 2009
- Cha-Won Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Photoacid generator, chemically amplified resist composition includ...
- Publication number 20090131684
- Publication date May 21, 2009
- Yool Kang
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Methods of Forming Fine Patterns In Integrated Circuits Using Atomi...
- Publication number 20080076070
- Publication date Mar 27, 2008
- SAMSUNG ELECTRONICS CO., LTD.
- Cha-won Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming a semiconductor device
- Publication number 20070287299
- Publication date Dec 13, 2007
- Doo-youl Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Nonvolatile memory device and method of manufacturing the same
- Publication number 20070111441
- Publication date May 17, 2007
- SAMSUNG ELECTRONICS CO., LTD.
- Cha-Won Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for forming patterns of semiconductor device
- Publication number 20070077524
- Publication date Apr 5, 2007
- SAMSUNG ELECTRONICS CO., LTD.
- Cha-Won Koh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of forming fine patterns of a semiconductor device
- Publication number 20060160028
- Publication date Jul 20, 2006
- Hyung-Rae Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Double photolithography methods with reduced intermixing of solvents
- Publication number 20060127816
- Publication date Jun 15, 2006
- SAMSUNG ELECTRONICS CO., LTD.
- Yool Kang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Polymeric tetrahedral carbon films, methods of forming the same and...
- Publication number 20060115772
- Publication date Jun 1, 2006
- SAMSUNG ELECTRONICS CO., LTD.
- Jung-Hwan Hah
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Bottom layer resist polymers for photolithography and methods of ma...
- Publication number 20060111547
- Publication date May 25, 2006
- Mitsuhiro Hata
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Resist compositions including thermal crosslinking agents
- Publication number 20050026078
- Publication date Feb 3, 2005
- Sang-Jun Choi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods for forming line patterns in semiconductor substrates
- Publication number 20030054292
- Publication date Mar 20, 2003
- Sang-Jun Choi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photosensitive polymers and resist compositions comprising the phot...
- Publication number 20020146642
- Publication date Oct 10, 2002
- Hyun-woo Kim
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Person

Patents Grantslast 30 patents

Method of forming mask pattern and method of fabricating semiconduc...

Methods of forming patterns using compositions for an underlayer of...

Method of forming patterns for semiconductor device

Hard mask composition, carbon nanotube layer structure, pattern for...

Method of forming patterns and method of manufacturing integrated c...

Method of forming pattern of semiconductor device

Method of fabricating semiconductor device

Method of forming fine patterns of semiconductor device by using do...

Methods of forming photoresist patterns

Method of manufacturing semiconductor device using acid diffusion

Photoacid generator, chemically amplified resist composition includ...

Method of forming fine patterns of semiconductor device by using do...

Methods of forming fine patterns of semiconductor device

Method of forming a mask pattern, method of forming a minute patter...

Method of forming fine patterns of a semiconductor device

Method for forming patterns of semiconductor device

Method of forming a semiconductor device

Nonvolatile memory device and method of manufacturing the same

Nonvolatile memory device and method of manufacturing the same

Methods for forming line patterns in semiconductor substrates

Photosensitive polymers and resist compositions comprising the phot...

Photosensitive polymer having fused aromatic ring and photoresist c...

Methods for forming line patterns in semiconductor substrates

Photosensitive polymers and chemically amplified photoresist compos...

Method for manufacturing a photoresist pattern defining a small ope...

Chemically amplified resist composition

Chemically amplified resist composition

Patents Applicationslast 30 patents

METHOD OF FORMING MASK PATTERN AND METHOD OF FABRICATING SEMICONDUC...

METHOD OF FORMING PATTERNS FOR SEMICONDUCTOR DEVICE

METHODS OF FORMING PATTERNS USING COMPOSITIONS FOR AN UNDERLAYER OF...

HARD MASK COMPOSITION, CARBON NANOTUBE LAYER STRUCTURE, PATTERN FOR...

METHOD OF FORMING PATTERNS AND METHOD OF MANUFACTURING INTEGRATED C...

METHOD OF FORMING PATTERN OF SEMICONDUCTOR DEVICE

METHOD OF FABRICATING SEMICONDUCTOR DEVICE

METHOD OF FORMING FINE PATTERNS OF SEMICONDUCTOR DEVICE BY USING DO...

METHODS OF FORMING METAL OR METAL NITRIDE PATTERNS AND METHODS OF M...

METHODS OF FORMING FINE PATTERNS USING DRY ETCH-BACK PROCESSES

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING ACID DIFFUSION

Methods Of Forming Photoresist Patterns

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

METHOD OF FORMING A MASK PATTERN, METHOD OF FORMING A MINUTE PATTER...

METHODS OF FORMING FINE PATTERNS OF SEMICONDUCTOR DEVICE

METHOD OF FORMING FINE PATTERNS OF A SEMICONDUCTOR DEVICE

METHOD OF FORMING FINE PATTERNS OF SEMICONDUCTOR DEVICE BY USING DO...

Nonvolatile memory device and method of manufacturing the same

Photoacid generator, chemically amplified resist composition includ...

Methods of Forming Fine Patterns In Integrated Circuits Using Atomi...

Method of forming a semiconductor device

Nonvolatile memory device and method of manufacturing the same

Method for forming patterns of semiconductor device

Method of forming fine patterns of a semiconductor device

Double photolithography methods with reduced intermixing of solvents

Polymeric tetrahedral carbon films, methods of forming the same and...

Bottom layer resist polymers for photolithography and methods of ma...

Resist compositions including thermal crosslinking agents

Methods for forming line patterns in semiconductor substrates

Photosensitive polymers and resist compositions comprising the phot...