YoonKi Min

Person

Seoul, KR

People

Patents Grantslast 30 patents

Information Patent Grant
Method for forming silicon nitride film selectively on top/bottom p...
- Patent number 11,676,812
- Issue date Jun 13, 2023
- ASM IP Holding B.V.
- Dai Ishikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method
- Patent number 11,562,901
- Issue date Jan 24, 2023
- ASM IP Holding B.V.
- HeeSung Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing a semiconductor device
- Patent number 11,551,925
- Issue date Jan 10, 2023
- ASM IP Holding B.V.
- HeeSung Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing system
- Patent number 11,530,483
- Issue date Dec 20, 2022
- ASM IP Holding B.V.
- YoonKi Min
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for forming silicon nitride film selectively on top surface
- Patent number 10,720,322
- Issue date Jul 21, 2020
- ASM IP Holding B.V.
- Dai Ishikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming silicon nitride film selectively on sidewalls or...
- Patent number 10,529,554
- Issue date Jan 7, 2020
- ASM IP Holding B.V.
- Dai Ishikawa
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20230323534
- Publication date Oct 12, 2023
- ASM IP HOLDING B.V.
- DooHyun La
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20230110980
- Publication date Apr 13, 2023
- ASM IP HOLDING B.V.
- DooHyun La
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20210090878
- Publication date Mar 25, 2021
- ASM IP HOLDING B.V.
- HeeSung Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING SILICON NITRIDE FILM SELECTIVELY ON TOP/BOTTOM P...
- Publication number 20200321209
- Publication date Oct 8, 2020
- ASM IP HOLDING B.V.
- Dai Ishikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE
- Publication number 20200312652
- Publication date Oct 1, 2020
- ASM IP HOLDING B.V.
- HeeSung Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM
- Publication number 20190390343
- Publication date Dec 26, 2019
- ASM IP HOLDING B.V.
- YoonKi Min
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FORMING SILICON NITRIDE FILM SELECTIVELY ON SIDEWALLS OF...
- Publication number 20190057857
- Publication date Feb 21, 2019
- ASM IP HOLDING B.V.
- Dai Ishikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING SILICON NITRIDE FILM SELECTIVELY ON SIDEWALLS OR...
- Publication number 20170250068
- Publication date Aug 31, 2017
- ASM IP HOLDING B.V.
- Dai Ishikawa
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Method for forming silicon nitride film selectively on top/bottom p...

Substrate processing method

Method for manufacturing a semiconductor device

Substrate processing system

Method for forming silicon nitride film selectively on top surface

Method for forming silicon nitride film selectively on sidewalls or...

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING METHOD

METHOD FOR FORMING SILICON NITRIDE FILM SELECTIVELY ON TOP/BOTTOM P...

METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE

SUBSTRATE PROCESSING SYSTEM

METHOD FOR FORMING SILICON NITRIDE FILM SELECTIVELY ON SIDEWALLS OF...

METHOD FOR FORMING SILICON NITRIDE FILM SELECTIVELY ON SIDEWALLS OR...